Generation of Three-Dimensionally Integrated Micro-Solution Plasma and Its Application to Decomposition of Methylene Blue Molecules in Water (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
スポンサーリンク
概要
著者
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Shirafuji Tatsuru
Department Of Electrical Engineering Kyoto University
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Shirafuji Tatsuru
Department of Physical Electronics and Informatics, Osaka City University, Osaka 558-8585, Japan
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Himeno Yuta
Department of Physical Electronics and Informatics, Osaka City University, Osaka 558-8585, Japan
関連論文
- Measurement and Calculation of SiH_2 Radical Density in SiH_4 and Si_2H_6 Plasma for the Deposition of Hydrogenated Amorphous Silicon Thin Films
- Measurement of SiH_2 Densities in an RF-Discharge Silane Plasma Used in the Chemical Vapor Deporsition of Hydrogenated Amorphous Silicon Film
- Direct Photochemical Vapor Deposition of Hydrogenated Amorphous Silicon : Effects of Excitation Wavelengths and Source Gases
- Diamond Nucleation on Singlecrystalline 6H-SiC Substrates by Bias-Enhanced Nucleation in Hot Filament Chemical Vapor Deposition
- Monte-Carlo Simulation of Surface Reactions in Plasma-Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Thin Films
- Plasma Copolymerization of Tetratluoroethylene/Hexamethyldisiloxane and In Situ Fourier Transform Infrared Spectroscopy of Its Gas Phase
- Low Density of Gap States in a-Si:H Deposited by Vacuum UV Direct Photochemical Vapor Deposition Method
- PE-CVD of Thermally Stable Low-k IMD Films Using Low-GWPC_5F_8
- In Situ Ellipsometric Monitoring of the Growth of Polycrystalline Silicon Thin Films by RF Plasma Chemical Vapor Deposition ( Plasma Processing)
- Thickness Dependence of H Radical Treatment of Si Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition Using SiF_4/SiH_4/H_2 Gases
- Construction and Performance of a Fourier-Transform Infrared Phase-Modulated Ellipsometer for In-Process Surface Diagnostics
- Preparation of Stable F-Doped SiO 2 Thin Films from Si(NCO) 4/SiF 4/O 2 Gas Mixtures Using a Conventional Capacitively Coupled RF Plasma Source
- Modification of Semianalytical Finite Element Model for Radio Frequency Sheaths in Single- and Dual-Frequency Capacitively Coupled Plasmas: Incorporating Ion Density Oscillation at Low Frequency
- Functionalization of Multiwalled Carbon Nanotubes by Solution Plasma Processing in Ammonia Aqueous Solution and Preparation of Composite Material with Polyamide 6
- Generation of Three-Dimensionally Integrated Micro-Solution Plasma and Its Application to Decomposition of Methylene Blue Molecules in Water
- Generation of Three-Dimensionally Integrated Micro-Solution Plasma and Its Application to Decomposition of Methylene Blue Molecules in Water (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
- Gold Nanoparticle Synthesis Using Three-Dimensionally Integrated Micro-Solution Plasmas
- Functionalization of Multiwalled Carbon Nanotubes by Solution Plasma Processing in Ammonia Aqueous Solution and Preparation of Composite Material with Polyamide 6