Thickness Dependence of H Radical Treatment of Si Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition Using SiF_4/SiH_4/H_2 Gases
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-04-15
著者
-
Tachibana Kunihide
Department Of Electronic Science And Engineering Kyoto University
-
SHIRAFUJI Tatsuru
Department of Electronics and Information Science, Kyoto Institute of Technology
-
KONDO Hisao
Department of Materials Science and Engineering, Nagoya Institute of Technology
-
Tachibana Kunihide
Department Of Electronics And Information Science Kyoto Institute Of Technology:(present Address) De
-
Shirafuji Tatsuru
Department Of Electrical Engineering Kyoto University
-
Kondo Hisao
Department Of Electronics And Information Science Kyoto Institute Of Technology
関連論文
- Two-Dimensional Melting in a Coulomb Crystal of Dusty Plasmas
- Observations of Silicon Surfaces Exposed to Inductively Coupled CHF_3 and C_4F_8/H_2 Plasmas Using Fourier Transform Infrared Ellipsometry
- Reaction Mechanism of Alkoxy Derivatives of Titanium Diketonates as Source Molecules in Liquid Source Metalorganic Chemical Vapor Deposition of (Ba,Sr)TiO_3 Films : A Study by In Situ Infrared Absorption Spectroscopy
- Effects of O_2 Gas on Reaction Mechanisms in the Chemical Vapor Deposition of (Ba, Sr)TiO_3 Thin Film
- Film Precursor Formation in Metalorganic Chemical Vapor Deposition of Barium Strontium Titanate Films : A Study by Microdischarge Optical Emission Spectroscopy
- Formation Mechanism of Strontium and Titaniuln Oxide Fillns by Metalorganlc Chemlcal Vapor Deposition: An Isotopic Labeling Study Using ^O_2 : Atoms, Molecules, and Chemical Physics
- Diagnosis of Oxidation Reactions in Metalorganic Chemical Vapor Deposition of (Ba,Sr)TiO_3 Films by In Situ Fourier Transform Infrared Spectroscopy
- Effects of Gas-Phase Thermal Decompositions of Chemical Vapor Deposition Source Molecules on the Deposition of(Ba, Sr)TiO_3 Films : A Study by In Situ Fourier Transform Infared Spectroscopy
- Gas Phase Reactions in the MOCVD of (Ba, Sr)TiO_3 Films : A Study by Microdischarge Optical Emission Spectroscopy
- Microdischarge Optical Emission Spectroscopy as a Novel Diagnostic Tool for Metalorganic Chemical Vapor Deposition of(Ba, Sr)TiO_3 Films
- Investigation of Discharge Phenomena in a Cell of Color Plasma Display Panel I. : One-Dimensional Model and Numerical Method
- Plasma Production and Wave Propagation in a Plasma Source Using Lower Hybrid Waves
- Measurement and Calculation of SiH_2 Radical Density in SiH_4 and Si_2H_6 Plasma for the Deposition of Hydrogenated Amorphous Silicon Thin Films
- In Situ Monitoring of Selective Copper Deposition Processes in a Metal-Organic Chemical Vapor Depositiorn Using Fourier-Transform Infrared Reflectiorn-Absorptiorn Spectroscopy
- Diffusion and Quenching of Metastable Xe Atoms in Mixtures of Xe and Rare Gases
- In Situ Measurement of Gas-Phase Reactions in Metal-Organic Chemical Vapor Deposition of Copper Films by Fourier Transform Infrared Spectroscopy
- Measurement of SiH_2 Densities in an RF-Discharge Silane Plasma Used in the Chemical Vapor Deporsition of Hydrogenated Amorphous Silicon Film
- An IR Study on the Stability of Y(DPM)_3, Ba(DPM)_2 and Cu(CPM)_2 for UV Irradiation
- Influence of Ozone Concentration on the Preparation of Stoichiometric Superconducting Y-Ba-Cu-O Films by a Metalorganic Chemical Vapor Deposition Technique
- Measurement of Absolute Densities and Spatial Distributions of Si and SiH in an RF-Discharge Silane Plasma for the Chemical Vapor Deposition of a-Si:H Films
- Preparation of Nearly Stoichiometric Superconducting Y-Ba-Cu-O Films by an MOCVD Technique Using Ozone
- Spectroscopic Measurements of the Production and the Transport of CH Radicals in a Methane Plasma Used for the CVD of a-C:H
- Spectroscopic Study on a Discharge Plasma of MOCVD Source Gases for High-T_C Superconducting Films
- Preparation and Characterization of Superconducting Y-Ba-Cu-O Films by the MOCVD Technique
- On the Reaction Kinetics in a Mercury Photosensitized CVD of a-Si:H Films
- A Numerical Study on Gaseous Reactions in Silane Pyrolysis
- Experimental Verification of Complex Dispersion Relation in Lossy Photonic Crystals
- A Two-Dimensional Simulation of Pulsed Discharge for a Color DC-Type Plasma Display Panel
- Superconducting Bi_2Sr_2Ca_1Cu_2O_ Glass-Ceramics with Different Melting Histories
- Direct Photochemical Vapor Deposition of Hydrogenated Amorphous Silicon : Effects of Excitation Wavelengths and Source Gases
- Measurement of Collision Broadening of Resonance Lines of Calcium Ion by a Low-Resolution Spectrometer
- Behavior of F Atoms and CF_2 Radicals in Fluorocarbon Plasmas for SiO_2/Si Etching
- Observation of Coulomb-Crystal Formation from Carbon Particles Grown in a Methane Plasma
- Electron Attachment Mass Spectrometry for the Detection of Electronegative Species in a Plasma
- Angle Resolved Mass Spectrometry of Positive Ions Transmitted through High Aspect Ratio Channels in a Radio Frequency Discharge
- Sample Preparation and Photoluminescence of ZnO Particles Embedded in Thin Alkali Halide Crystals
- Calculation of the Output Power of the Argon-Ion Laser Superimposed by a Magnetic Field
- Population Density and LTE of Excited Atoms in a Positive-Column Plasma I. : Calculation on Hydroegn
- Diamond Nucleation on Singlecrystalline 6H-SiC Substrates by Bias-Enhanced Nucleation in Hot Filament Chemical Vapor Deposition
- Monte-Carlo Simulation of Surface Reactions in Plasma-Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Thin Films
- Interaction between Dielectric Barrier Discharge and Positive Streamer in Helium Plasma Jet at Atmospheric Pressure
- Plasma Copolymerization of Tetratluoroethylene/Hexamethyldisiloxane and In Situ Fourier Transform Infrared Spectroscopy of Its Gas Phase
- Low Density of Gap States in a-Si:H Deposited by Vacuum UV Direct Photochemical Vapor Deposition Method
- Mode Change Observed on Spatial Distribution of Microplasma Emission in a Microdischarge Cell with a Floating Electrode
- Ion Impact Energy Distributions and Properties of Amorphous Hydrogenated Carbon Thin Films Deposited in a Self-Biased RF Discharge
- High Speed Deposition of SiO2 Films with Plasma Jet Based on Capillary Dielectric Barrier Discharge at Atmospheric Pressure
- Behavior of N2+ Ions in He Microplasma Jet at Atmospheric Pressure Measured by Laser Induced Fluorescence Spectroscopy
- Current Status of Microplasma Research
- Analysis of Product Species in Capacitively Coupled C_5F_8 Plasma by Electron Attachment Mass Spectroscopy
- Analysis of Spherical Carbon Particle Growth in Methane Plasma by Mie-Scattering Ellipsometry ( Plasma Processing)
- Mie-Scattering Ellipsometry for Analysis of Particle Behaviors in Processing Plasmas
- PE-CVD of Thermally Stable Low-k IMD Films Using Low-GWPC_5F_8
- In Situ Ellipsometric Monitoring of the Growth of Polycrystalline Silicon Thin Films by RF Plasma Chemical Vapor Deposition ( Plasma Processing)
- Reduction of Copper Oxide Thin Films with Hydrogen Plasma Generated by a Dielectric-Barrier Glow Discharge
- Plasma Copolymerization of C6F6/C5F8 for Application of Low-Dielectric-Constant Fluorinated Amorphous Carbon Films and Its Gas-Phase Diagnostics Using In Situ Fourier Transform Infrared Spectroscopy
- Rotational Analysis of Second-Positive Emissions in a N_2-SF_6 Laser
- 材料プロセス用フルオロカーボンプラズマに関する基礎研究の進展 5.Polymerization in Fluorocarbon Plasmas
- Measurement of the Formation and Dissociation Rates of CsXe Excimers
- Detection of H Atoms in RF-Discharge SiH_4, CH_4 and H_2 Plasmas by Two-Photon Absorption Laser-Induced Fluorescence Spectroscopy ( Plasma Processing)
- Thickness Dependence of H Radical Treatment of Si Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition Using SiF_4/SiH_4/H_2 Gases
- Population Density and LTE of Excited Atoms in a Positive-Column Plasma. : II. Measurement on Argon
- Construction and Performance of a Fourier-Transform Infrared Phase-Modulated Ellipsometer for In-Process Surface Diagnostics
- Preparation of Stable F-Doped SiO 2 Thin Films from Si(NCO) 4/SiF 4/O 2 Gas Mixtures Using a Conventional Capacitively Coupled RF Plasma Source
- Plasma Enhanced Chemical Vapor Deposition of Fluorinated Amorphous Carbon Films on the Surface with Reverse Tapered Microstructures
- Microplasma-Induced Deformation of an Anomalous Response Spectrum of Electromagnetic Waves Propagating along Periodically Perforated Metal Plates
- Enhancement of Optical Emission by Floating Electrodes in a Planar Microdischarge Cell
- Spatiotemporal Surface Charge Measurement in Two Types of Dielectric Barrier Discharges Using Pockels Effect
- Quantum Chemical Study on Decomposition and Polymer Deposition in Perfluorocarbon Plasmas: Molecular Orbital Calculations of Excited States of Perfluorocarbons
- A Plasma Source Using Waves in a Lower Hybrid Frequency Range
- A Set of De-Excitation Rate Coefficients for the 3s ^3P_2 and ^3P_1 Levels of Neon
- Modification of Semianalytical Finite Element Model for Radio Frequency Sheaths in Single- and Dual-Frequency Capacitively Coupled Plasmas: Incorporating Ion Density Oscillation at Low Frequency
- Angle Resolved Mass Spectrometry of Positive Ions Transmitted through High Aspect Ratio Channels in a Radio Frequency Discharge
- Functionalization of Multiwalled Carbon Nanotubes by Solution Plasma Processing in Ammonia Aqueous Solution and Preparation of Composite Material with Polyamide 6
- Generation of Three-Dimensionally Integrated Micro-Solution Plasma and Its Application to Decomposition of Methylene Blue Molecules in Water
- Generation of Three-Dimensionally Integrated Micro-Solution Plasma and Its Application to Decomposition of Methylene Blue Molecules in Water (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
- Cavity Polaritons in a Single-Crystalline Organic Microcavity Prepared at Room Temperature Using a Simple Solution Technique
- Gold Nanoparticle Synthesis Using Three-Dimensionally Integrated Micro-Solution Plasmas
- Functionalization of Multiwalled Carbon Nanotubes by Solution Plasma Processing in Ammonia Aqueous Solution and Preparation of Composite Material with Polyamide 6
- Cavity Polaritons in a Single-Crystalline Organic Microcavity Prepared at Room Temperature Using a Simple Solution Technique
- Microplasma Array Serving as Photonic Crystals and Plasmon Chains
- A Study on Radical Fluxes in Silane Plasma CVD from Trench Coverage Analysis
- The Necessity of Radicals for Gene Transfection by Discharge Plasma Irradiation