Reduction of Copper Oxide Thin Films with Hydrogen Plasma Generated by a Dielectric-Barrier Glow Discharge
スポンサーリンク
概要
- 論文の詳細を見る
The reduction behavior of sputtered thin Cu_2O films with hydrogen plasma generated by a dielectric-barrier glow discharge was investigated by means of surface characterization and hydrogen plasma diagnosis using the vacuum ultraviolet (VUV) line absorption technique. The reduction model was derived by assuming that the diffusion of atomic hydrogen in the reduced layer is the rate-determining step. This reduction model provides a good approximation of the Cu_2O reduction process. The surface hydrogen concentration estimated from this model is higher by an order of 10^5-10^6 than the hydrogen atom concentration in the plasma phase measured by means of the plasma diagnosis. It is verified that the number of hydrogen atoms transported onto the solid surface satisfactorily agrees with that consumed in the Cu_2O layer.
- 社団法人応用物理学会の論文
- 1999-11-15
著者
-
Tachibana Kunihide
Department Of Electronic Science And Engineering Kyoto University
-
Sawada Yasushi
Advanced Technology Research Laboratory Matsushita Electric Works Ltd.
-
TAGUCHI Noriyuki
Advanced Technology Research Laboratory, Matsushita Electric Works, Ltd.
-
Taguchi Noriyuki
Advanced Technology Research Laboratory Matsushita Electric Works Ltd.
関連論文
- Two-Dimensional Melting in a Coulomb Crystal of Dusty Plasmas
- Observations of Silicon Surfaces Exposed to Inductively Coupled CHF_3 and C_4F_8/H_2 Plasmas Using Fourier Transform Infrared Ellipsometry
- Reaction Mechanism of Alkoxy Derivatives of Titanium Diketonates as Source Molecules in Liquid Source Metalorganic Chemical Vapor Deposition of (Ba,Sr)TiO_3 Films : A Study by In Situ Infrared Absorption Spectroscopy
- Effects of O_2 Gas on Reaction Mechanisms in the Chemical Vapor Deposition of (Ba, Sr)TiO_3 Thin Film
- Film Precursor Formation in Metalorganic Chemical Vapor Deposition of Barium Strontium Titanate Films : A Study by Microdischarge Optical Emission Spectroscopy
- Formation Mechanism of Strontium and Titaniuln Oxide Fillns by Metalorganlc Chemlcal Vapor Deposition: An Isotopic Labeling Study Using ^O_2 : Atoms, Molecules, and Chemical Physics
- Diagnosis of Oxidation Reactions in Metalorganic Chemical Vapor Deposition of (Ba,Sr)TiO_3 Films by In Situ Fourier Transform Infrared Spectroscopy
- Effects of Gas-Phase Thermal Decompositions of Chemical Vapor Deposition Source Molecules on the Deposition of(Ba, Sr)TiO_3 Films : A Study by In Situ Fourier Transform Infared Spectroscopy
- Gas Phase Reactions in the MOCVD of (Ba, Sr)TiO_3 Films : A Study by Microdischarge Optical Emission Spectroscopy
- Microdischarge Optical Emission Spectroscopy as a Novel Diagnostic Tool for Metalorganic Chemical Vapor Deposition of(Ba, Sr)TiO_3 Films
- Investigation of Discharge Phenomena in a Cell of Color Plasma Display Panel I. : One-Dimensional Model and Numerical Method
- Plasma Production and Wave Propagation in a Plasma Source Using Lower Hybrid Waves
- Measurement and Calculation of SiH_2 Radical Density in SiH_4 and Si_2H_6 Plasma for the Deposition of Hydrogenated Amorphous Silicon Thin Films
- In Situ Monitoring of Selective Copper Deposition Processes in a Metal-Organic Chemical Vapor Depositiorn Using Fourier-Transform Infrared Reflectiorn-Absorptiorn Spectroscopy
- Diffusion and Quenching of Metastable Xe Atoms in Mixtures of Xe and Rare Gases
- In Situ Measurement of Gas-Phase Reactions in Metal-Organic Chemical Vapor Deposition of Copper Films by Fourier Transform Infrared Spectroscopy
- Measurement of SiH_2 Densities in an RF-Discharge Silane Plasma Used in the Chemical Vapor Deporsition of Hydrogenated Amorphous Silicon Film
- An IR Study on the Stability of Y(DPM)_3, Ba(DPM)_2 and Cu(CPM)_2 for UV Irradiation
- Influence of Ozone Concentration on the Preparation of Stoichiometric Superconducting Y-Ba-Cu-O Films by a Metalorganic Chemical Vapor Deposition Technique
- Measurement of Absolute Densities and Spatial Distributions of Si and SiH in an RF-Discharge Silane Plasma for the Chemical Vapor Deposition of a-Si:H Films
- Preparation of Nearly Stoichiometric Superconducting Y-Ba-Cu-O Films by an MOCVD Technique Using Ozone
- Spectroscopic Measurements of the Production and the Transport of CH Radicals in a Methane Plasma Used for the CVD of a-C:H
- Spectroscopic Study on a Discharge Plasma of MOCVD Source Gases for High-T_C Superconducting Films
- Preparation and Characterization of Superconducting Y-Ba-Cu-O Films by the MOCVD Technique
- On the Reaction Kinetics in a Mercury Photosensitized CVD of a-Si:H Films
- A Numerical Study on Gaseous Reactions in Silane Pyrolysis
- Experimental Verification of Complex Dispersion Relation in Lossy Photonic Crystals
- A Two-Dimensional Simulation of Pulsed Discharge for a Color DC-Type Plasma Display Panel
- Direct Photochemical Vapor Deposition of Hydrogenated Amorphous Silicon : Effects of Excitation Wavelengths and Source Gases
- Measurement of Collision Broadening of Resonance Lines of Calcium Ion by a Low-Resolution Spectrometer
- Behavior of F Atoms and CF_2 Radicals in Fluorocarbon Plasmas for SiO_2/Si Etching
- Observation of Coulomb-Crystal Formation from Carbon Particles Grown in a Methane Plasma
- Electron Attachment Mass Spectrometry for the Detection of Electronegative Species in a Plasma
- Angle Resolved Mass Spectrometry of Positive Ions Transmitted through High Aspect Ratio Channels in a Radio Frequency Discharge
- Calculation of the Output Power of the Argon-Ion Laser Superimposed by a Magnetic Field
- Population Density and LTE of Excited Atoms in a Positive-Column Plasma I. : Calculation on Hydroegn
- Monte-Carlo Simulation of Surface Reactions in Plasma-Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Thin Films
- Interaction between Dielectric Barrier Discharge and Positive Streamer in Helium Plasma Jet at Atmospheric Pressure
- Mode Change Observed on Spatial Distribution of Microplasma Emission in a Microdischarge Cell with a Floating Electrode
- Ion Impact Energy Distributions and Properties of Amorphous Hydrogenated Carbon Thin Films Deposited in a Self-Biased RF Discharge
- High Speed Deposition of SiO2 Films with Plasma Jet Based on Capillary Dielectric Barrier Discharge at Atmospheric Pressure
- Behavior of N2+ Ions in He Microplasma Jet at Atmospheric Pressure Measured by Laser Induced Fluorescence Spectroscopy
- Current Status of Microplasma Research
- Analysis of Product Species in Capacitively Coupled C_5F_8 Plasma by Electron Attachment Mass Spectroscopy
- Analysis of Spherical Carbon Particle Growth in Methane Plasma by Mie-Scattering Ellipsometry ( Plasma Processing)
- Mie-Scattering Ellipsometry for Analysis of Particle Behaviors in Processing Plasmas
- In Situ Ellipsometric Monitoring of the Growth of Polycrystalline Silicon Thin Films by RF Plasma Chemical Vapor Deposition ( Plasma Processing)
- Reduction of Copper Oxide Thin Films with Hydrogen Plasma Generated by a Dielectric-Barrier Glow Discharge
- Plasma Copolymerization of C6F6/C5F8 for Application of Low-Dielectric-Constant Fluorinated Amorphous Carbon Films and Its Gas-Phase Diagnostics Using In Situ Fourier Transform Infrared Spectroscopy
- Rotational Analysis of Second-Positive Emissions in a N_2-SF_6 Laser
- 材料プロセス用フルオロカーボンプラズマに関する基礎研究の進展 5.Polymerization in Fluorocarbon Plasmas
- Measurement of the Formation and Dissociation Rates of CsXe Excimers
- Detection of H Atoms in RF-Discharge SiH_4, CH_4 and H_2 Plasmas by Two-Photon Absorption Laser-Induced Fluorescence Spectroscopy ( Plasma Processing)
- Thickness Dependence of H Radical Treatment of Si Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition Using SiF_4/SiH_4/H_2 Gases
- Population Density and LTE of Excited Atoms in a Positive-Column Plasma. : II. Measurement on Argon
- Construction and Performance of a Fourier-Transform Infrared Phase-Modulated Ellipsometer for In-Process Surface Diagnostics
- Plasma Enhanced Chemical Vapor Deposition of Fluorinated Amorphous Carbon Films on the Surface with Reverse Tapered Microstructures
- Microplasma-Induced Deformation of an Anomalous Response Spectrum of Electromagnetic Waves Propagating along Periodically Perforated Metal Plates
- Enhancement of Optical Emission by Floating Electrodes in a Planar Microdischarge Cell
- Spatiotemporal Surface Charge Measurement in Two Types of Dielectric Barrier Discharges Using Pockels Effect
- Quantum Chemical Study on Decomposition and Polymer Deposition in Perfluorocarbon Plasmas: Molecular Orbital Calculations of Excited States of Perfluorocarbons
- A Plasma Source Using Waves in a Lower Hybrid Frequency Range
- A Set of De-Excitation Rate Coefficients for the 3s ^3P_2 and ^3P_1 Levels of Neon
- Angle Resolved Mass Spectrometry of Positive Ions Transmitted through High Aspect Ratio Channels in a Radio Frequency Discharge
- Microplasma Array Serving as Photonic Crystals and Plasmon Chains
- A Study on Radical Fluxes in Silane Plasma CVD from Trench Coverage Analysis
- The Necessity of Radicals for Gene Transfection by Discharge Plasma Irradiation