Mie-Scattering Ellipsometry for Analysis of Particle Behaviors in Processing Plasmas
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概要
- 論文の詳細を見る
In-process Mie-scattering ellipsometry has been newly developed. The refractive index of the particles and the spread of particle size distribution, as well as the mean particle size and the density, can be evaluated by the method. As a demonstration, the behavior of carbon particles injected into argon plasma was observed. It was suggested from the analyzed results that the size of carbon particles increased through coagulation in argon plasma, the geometric standard deviation of the size distribution was about 1.5, and the coagulated particles have smaller refractive index than evaporated carbon.
- 社団法人応用物理学会の論文
- 1994-03-15
著者
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Hayashi Yasuaki
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Tachibana Kunihide
Department Of Electronic Science And Engineering Kyoto University
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Tachibana Kunihide
Department Of Electronics And Information Science Kyoto Institute Of Technology
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