Tachibana Kunihide | Department Of Electronic Science And Engineering Kyoto University
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概要
関連著者
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Tachibana Kunihide
Department Of Electronic Science And Engineering Kyoto University
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Tachibana Kunihide
Department of Electronic Science and Engineering, Kyoto University
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橘 邦英
愛媛大学大学院工学研究科電子情報工学専攻
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Nakamura Toshihiro
Department Of Anesthesiology Yamanashi Medical University
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Nakamura T
Hokkaido Univ. Sapporo Jpn
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中村 高遠
静大院理工
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Nakamura T
Sumitomo Electric Industries Ltd.
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Nakamura Toshihiro
Departments of Cardiology, National Hospital Organization Kyushu Medical Center
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Nakamura Tomoyuki
Fine Chemicals And Polymers Research Laboratory Nof Corporation
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Nakamura T
Kyoto Univ. Kyoto Jpn
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MOMOSE Shun
Department of Electronic Science and Engineering, Kyoto University
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Nakamura Takuya
The Faculty Of Engineering Saitama University
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Nakamura Tetsuro
Materials And Structures Laboratory Tokyo Institute Of Technology
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Nakamura Tetsuro
School Of Electrical Engineering And Electronics Toyohashi University Of Technology
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Nakamura Tetsuro
Department Of Electrical Engineering And Electronics Toyohashi University Of Technology
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Nakamura Toshihiko
Faculty Of Engineering Tokyo Institute Of Technology
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Nakamura T
Hokkaido Univ. Sapporo
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Momose Shun
Department Of Electronic Science And Engineering Kyoto University
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Harima Hiroshi
Department Of Applied Physics Osaha University
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HARIMA Hiroshi
Department of Electronics and Information Science, Kyoto Institute of Technology
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橘 邦英
京都工繊大工芸
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Ohnishi H
Institute For Chemical Research Kyoto University
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Ohnishi Hiroshi
Manufacturing Engineering Center Mitsubishi Electric Corporation
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Ohnishi Hiroshi
Manufacturing Development Laboratory Mitsubishi Electric Corp.
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SHIRAFUJI Tatsuru
Department of Electronics and Information Science, Kyoto Institute of Technology
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Harima H
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Shirafuji Tatsuru
Department Of Electrical Engineering Kyoto University
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Nakamura Tomohiko
The Institute Of Scientific And Industrial Research Osaka University
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Matsui Yasuji
Central Research Laboratory Mitsubishi Electric Corp.
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中村 高遠
静岡大学工学部
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Nakamura Takatou
Department Of Electronics Faculty Of Engineering Shizuoka University
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Hayashi Yasuaki
Department Of Electronics And Information Science Kyoto Institute Of Technology
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MATSUI Yasuji
Central Research Laboratory, Mitsubishi Electric Corp.
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Sakai Osamu
Department Of Cardiovascular Surgery Kyoto Prefectural University Of Medicine
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Matsui Yasushi
Electronics Research Laboratory Corporate Research & Development Matsushita Electronics Corporat
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Tachibana Kunihide
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Hanaoka Ken-ichi
Department of Electronics and Information Science, Kyoto Institute of Technology
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Urano Yoshio
Department Of Dermatology School Of Medicine The University Of Tokushima
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Yuuki Akimasa
Central Research Laboratory Mitsubishi Electric Corp.
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Hanaoka Ken-ichi
Department Of Electronics And Information Science Kyoto Institute Of Technology
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HAYASHI Yasuaki
Department of Electronics and Information Science, Kyoto Institute of Technology
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Nakamura T
Tokyo Metropolitan Univ. Tokyo Jpn
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KOBAYASHI Minoru
Manufacturing Development Laboratory, Mitsubishi Electric Corp.
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HOSHINOUCHI Susumu
Manufacturing Development Laboratory, Mitsubishi Electric Corp.
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YUUKI Akimasa
Central Research Laboratory, Mitsubishi Electric Corp.
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Muto Y
The Institute For Materials Research Tohoku University
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Fukuda Kuniya
Department Of Engineering Physics Faculty Engineering Kyoto University
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Yuuki A
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Yuuki Akimasa
Product Development Laboratory Mitsubishi Electric Corporation
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STOFFELS Eva
Department of Electronic Science and Engineering, Kyoto University
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Motomura Hideki
Department Of Electrical And Electronic Engineering Ehime University
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Hoshinouchi Susumu
Manufacturing Development Laboratory Mitsubishi Electric Co.
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Stoffels E
Department Of Technical Physics Eindhoven University Of Technology
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Ito Yosuke
Department Of Chemistry Kumamoto University
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Kobayashi M
Tokai Univ. Kanagawa Jpn
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Shirafuji T
Kyoto Univ. Kyoto Jpn
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Urabe Keiichiro
Department Of Electronic Science And Engineering Kyoto University
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Shirafuji Tatsuru
International Innovation Center Kyoto University
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MOTOMURA Hideki
Department of Electrical and Electronic Engineering, Ehime University
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Sakai T
Tokyo Inst. Technol. Kanagawa Jpn
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FUJIMOTO Takashi
Department of Engineering Physics and Mechanics, Graduate School of Engineering, Kyoto University
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Mukai T
Nitride Semiconductor Research Laboratory Opto-electronics Products Division Nichia Corp.
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Sakai Tomohiro
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Mukai Takashi
Department Of Research And Development; Nichia Chemical Industries Ltd.
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Takahashi K
Tokyo Inst. Technol. Yokohama Jpn
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SAHARA Ryusuke
Department of Electronic Science and Engineering, Kyoto University
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FUKUDA Kuniya
Department of Engineering Science,Kyoto University
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Mukai Takashi
Nichia Corp. Tokushima Jpn
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Sahara Ryusuke
Department Of Electronic Science And Engineering Kyoto University
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Tachibana Kunihide
Department Of Mechanical Engineering Ii Faculty Of Engineering Kyoto University:department Of Electr
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TAKAHASHI Kazuo
Electronics Research Laboratory, Matsushita Electronics Corporation
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SAKAI Tetsuo
NHK Science and Technical Research Laboratories
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GOTO Yoshiyuki
Manufacturing Development Laboratory, Mitsubishi Electric Co.
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MUKAI Takuya
Department of Electronics and Information Science, Kyoto Institute of Technology
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KUSAKABE Yoshihiko
Manufacturing Development Laboratory, Mitsubishi Electric Corp.
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Murakami Y
Hiroshima Univ. Higashi‐hiroshima Jpn
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Ito Yosuke
Department Of Electronic Science And Engineering Kyoto University
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Mukai Takuya
Department Of Electronics And Information Science Faculty Of Engineering And Desigh Kyoto Institute
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Goto Y
Central Research Laboratory Hitachi Ltd.
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Fukuda Kuniya
Department Of Mechanical Engineering Ii Faculty Of Engineering Kyoto University
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STOFFELS Winfred
Department of Electronic Science and Engineering, Kyoto University
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IMAI Shinichi
Matsushita Electronics Corporation
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Naito Teruki
Department Of Electronic Science And Engineering Kyoto University
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Sakai T
Laboratory Of Plant Cell Biochemistry Department Of Applied Plant Science Division Of Life Science G
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Itoh Tohru
Development Department Plasma System Corp.
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Urabe Keiichiro
Department of Electronic Science and Engineering, Kyoto University, Kyotodaigaku-Katsura, Nishikyo-k
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Sakai Toshikatsu
School Of Science And Engineering Waseda University:crest Japan Science And Technology Corporation (
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Fujimoto Takashi
Department Of Mechanical Engineering Ii Faculty Of Engineering Kyoto University:postdoctral Research
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Shirafuji Tatsuru
International Innovation Center, Kyoto University, Yoshida Honmachi, Sakyo-Ku, Kyoto 606-8501, Japan
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Yasaka Yasuyoshi
Department Of Electonics Kyoto University
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Kikuchi Tetsuo
Department Of Electronic Science And Engineering Kyoto University
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Kusakabe Y
Mitsubishi Electric Corp. Hyogo Jpn
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Fujimoto Takashi
Department Of Aeronautical Engineering Faculty Of Engineering Kyusyu University
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Ohnishi Keitaro
Department Of Electronic Science And Engineering Kyoto University
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SAKAI Osamu
Department of Physics, Tokyo Metropolitan University
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KAWASAKI Takeshi
Department of Physics, Faculty of Science, Tokyo University of Science
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林 康明
京都工芸繊維大学大学院
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WANG Yun
Department of Medicine and Science in Sports and Exercise, Tohoku University Graduate School of Medi
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林康 明
京都工芸繊維大学工芸学部電子情報工学科
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Takahashi Kazuo
Department of Electronic Science and Engineering, Kyoto University
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林 康明
京都工芸繊維大学大学院工芸科学研究科
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Itoh Kikuo
Faculty Of General Education Kumamoto University
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Ganguly Biswa
Air Force Research Laboratory
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Hayashi Yutaka
Device Synthesis Section Electrotechnical Laboratory
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URANO Yoshio
Department of Dermatology, School of Medicine, University of Tokushima
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Kikuchi T
Department Of Applied Chemistry Faculty Of Science Science University Of Tokyo
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TATSUTA Toshiaki
R&D Center SAMCO International Inc.
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TSUJI Osamu
R&D Center SAMCO International Inc.
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Hayashi Yuzo
Irie Koken Co. Ltd.
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OGATA YOSHIRO
Department of Surgery, Tochigi Cancer Center
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Kawasaki Takeshi
Department Of Chemistry Faculty Of Science Toho University
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Sakai T
Dainippon Screen Manufacturing Co. Ltd. Kyoto Jpn
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Hayashi Y
Irie Koken Co. Ltd. Saitama Jpn
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Takei Makoto
Electronics Research Laboratory Matsushita Electronics Corporation
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HAYASHI Yasuaki
Kyoto Institute of Technology
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LEE Ho-Jun
Also belongs to Venture Business Laboratory, Kyoto University
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YAMAMUKA Mikio
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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TAKADA Hiroshi
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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Itoh Kimitaka
Plasma Physics Laboratory Kyoto University
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Takahashi Kazuo
Department Of Advanced Medical Technology And Development Bml Inc.
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ITOH Kazuhiro
Department of Parasitology, Faculty of Veterinary Medicine, Hokkaido University
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Hayashi Yasuaki
Institute For Super Materials Ulvac Japan Ltd.
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Hayashi Yasuaki
Department Of Electronics Kyoto Institute Of Technology
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Hayashi Yasuaki
Department Of Neurology Okayama National Hospital
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Nakajima Shigeki
Department Of Electrical Engineering Faculty Of Science And Technology Kinki University
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Tachibana Kunihide
Department Of Electronics Kyoto University
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Nakajima Sadanojo
Department Of Electrical And Electronic Engineering The University Of Tokushinna
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Sakai Osamu
Department Of Electronic Science And Engineering Kyoto University
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Wang Yun
Department Of Electronics And Information Science Kyoto Institute Of Technology
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HASHIGUCHI Seishiro
Department of Electronics and Information Science, Kyoto Institute of Technology
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MURAKAMI Yukio
NHK Science and Technical Research Laboratories
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Kikuchi Tetsuo
Department of Electronic Science and Engineering, Kyoto University
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Ohnishi Keitaro
Department of Electronic Science and Engineering, Kyoto University
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Yasaka Yasuyoshi
Department of Electronic Science and Engineering, Kyoto University
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Itoh Tohru
Development Department, Plasma System Corp.
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MATSUZAKI Hideomi
NHK Science and Technical Research Laboratories
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MORITA Noriko
Central Research Laboratory, Mitsubishi Electric Corp.
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NAITO Teruki
Department of Electronic Science and Engineering, Kyoto University
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Matsuzaki H
Nhk Science And Technical Research Laboratories
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Itoh K
Discrete Device Division Semiconductor Co. Matsushita Electric Industrial Co. Ltd.
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MURAKAMI Yukio
Display and Optical Devices Research Division, NHK Science and Technical Research Laboratories
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MATSUZAKI Hideomi
Display and Optical Devices Research Division, NHK Science and Technical Research Laboratories
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MURAKAMI Hiroshi
Display and Optical Devices Research Division, NHK Science and Technical Research Laboratories
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Wang Yun
Department Of Chemistry Northwest Normal University
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Tsuji Osamu
R&d Center Samco International Inc.
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Urano Yoshio
Department Of Electronics Faculty Of Industrial Arts Kyoto Technical University
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Ogata Yoshiro
Department Of Mechanical Engineering Ii Faculty Of Engineering Kyoto University:(present Address)res
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Itoh Kazuhiro
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Nakajima S
Ntt Electronics Corp.
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Yamamuka M
Mitsubishi Electric Corp. Hyogo Jpn
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Yamamuka Mikio
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Yamamuka Mikio
Department Of Electronics And Information Science Kyoto Institute Of Technology
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KONDO Hisao
Department of Materials Science and Engineering, Nagoya Institute of Technology
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NAKAJIMA Sagara
Department of Electronics and Information Science, Kyoto Institute of Technology
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GENJI Takeshi
Department of Electronics and Information Science, Kyoto Institute of Technology
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Ohnishi K
International Superconductivity Technol. Center Chiba Jpn
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Nogiwa Seiji
Optical Measurement Technology Development Co. Ltd.:ando Electric Co. Ltd.
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Chen Wei-ming
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Tachibana Kunihide
Department Of Electronics Kyoto Technical University
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MONJU Mikiko
Department of Electronics, Kyoto Technical University
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HARIMA Hiroshir
Department of Electronics, Kyoto Technical University
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Kamisugi Hideaki
Department of Electronic Science and Engineering, Kyoto University
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Genji Takeshi
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Takada Hiroshi
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Lee H‐j
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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MORITA Tatsuo
Central Research Laboratories, SHARP Corporation
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Morita Tatsuo
Central Research Laboratory Sharp Corporation
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SUGIYAMA Ikuto
Department of Mechanical Engineering II, Faculty of Engineering, Kyoto University
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Motomura Hideki
Department Of Electronic Science And Engineering Kyoto University
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Monju Mikiko
Department Of Electronics Kyoto Technical University
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Sugiyama Ikuto
Department Of Mechanical Engineering Ii Faculty Of Engineering Kyoto University
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TANAKA Yoshihisa
Department of Life System, Institute of Technology and Science, The University of Tokushima
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Imai Shinichi
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Kamisugi Hideaki
Department Of Electronic Science And Engineering Kyoto University:(present Address)electro-optic Pro
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Matsuzaki H
Display And Optical Devices Research Division Nhk Science And Technical Research Laboratories
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Sawada Yasushi
Advanced Technology Research Laboratory Matsushita Electric Works Ltd.
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Lee H‐j
Process Development Team Semiconductor R&d Center Samsung Electronics
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Morita Noriko
Central Research Laboratory Mitsubishi Electric Corp.
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Takano Nobuhiko
Department of Electronic Science and Engineering, Kyoto University, Kyotodaigaku-Katsura, Nishikyo-k
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Harima Hiroshir
Department Of Electronics Kyoto Technical University
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Lee Ho-jun
Also Belongs To Venture Business Laboratory Kyoto University
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Hashiguchi Seishiro
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Hashiguchi Seishiro
Department Of Electronics And Information Science Faculty Of Engineering And Design Kyoto Institute
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MAEKAWA Shinji
Central Research Laboratory, SHARP Corporation
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Ohara Masahiro
Department Of Electronics Faculty Of Industrial Arts Kyoto Technical University
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Murakami Yukio
Display And Optical Devices Research Division Nhk Science And Technical Research Laboratories
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Tachibana Kunihide
Department Of Electronics And Information Science Kyoto Institute Of Technology:(present Address) De
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Tachibana Kunihide
Department Of Electronics Faculty Of Industrial Arts Kyoto Technical University
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Tachibana Kunihide
Department Of Mechanical Engineering Ii Faculty Of Engineering Kyoto University
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TAGUCHI Noriyuki
Advanced Technology Research Laboratory, Matsushita Electric Works, Ltd.
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Tsuchino Akio
Department of Electronics, Kyoto University, Yoshida Honmachi, Sakyo-Ku, Kyoto 606-8501, Japan
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Tsuchino Akio
Department Of Electronics Kyoto University
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MURAISHI Shuichi
Application and Research Center, JEOL Ltd.
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Tanaka Yoshihisa
Department Of Electronics Faculty Of Industrial Arts Kyoto Technical University
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Takano Nobuhiko
Department Of Electronic Science And Engineering Kyoto University
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Yasaka Yasuyoshi
Department Of Electronic Science And Engineering Kyoto University
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Kondo Hisao
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Kawasaki Takeshi
Department Of Applied Electronics Tokyo Science University
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Kawasaki Takeshi
Department Of Electronic Science And Engineering Kyoto University
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Maekawa Shinji
Central Research Laboratory Sharp Corporation
著作論文
- Two-Dimensional Melting in a Coulomb Crystal of Dusty Plasmas
- Observations of Silicon Surfaces Exposed to Inductively Coupled CHF_3 and C_4F_8/H_2 Plasmas Using Fourier Transform Infrared Ellipsometry
- Reaction Mechanism of Alkoxy Derivatives of Titanium Diketonates as Source Molecules in Liquid Source Metalorganic Chemical Vapor Deposition of (Ba,Sr)TiO_3 Films : A Study by In Situ Infrared Absorption Spectroscopy
- Effects of O_2 Gas on Reaction Mechanisms in the Chemical Vapor Deposition of (Ba, Sr)TiO_3 Thin Film
- Film Precursor Formation in Metalorganic Chemical Vapor Deposition of Barium Strontium Titanate Films : A Study by Microdischarge Optical Emission Spectroscopy
- Formation Mechanism of Strontium and Titaniuln Oxide Fillns by Metalorganlc Chemlcal Vapor Deposition: An Isotopic Labeling Study Using ^O_2 : Atoms, Molecules, and Chemical Physics
- Diagnosis of Oxidation Reactions in Metalorganic Chemical Vapor Deposition of (Ba,Sr)TiO_3 Films by In Situ Fourier Transform Infrared Spectroscopy
- Effects of Gas-Phase Thermal Decompositions of Chemical Vapor Deposition Source Molecules on the Deposition of(Ba, Sr)TiO_3 Films : A Study by In Situ Fourier Transform Infared Spectroscopy
- Gas Phase Reactions in the MOCVD of (Ba, Sr)TiO_3 Films : A Study by Microdischarge Optical Emission Spectroscopy
- Microdischarge Optical Emission Spectroscopy as a Novel Diagnostic Tool for Metalorganic Chemical Vapor Deposition of(Ba, Sr)TiO_3 Films
- Investigation of Discharge Phenomena in a Cell of Color Plasma Display Panel I. : One-Dimensional Model and Numerical Method
- Plasma Production and Wave Propagation in a Plasma Source Using Lower Hybrid Waves
- Measurement and Calculation of SiH_2 Radical Density in SiH_4 and Si_2H_6 Plasma for the Deposition of Hydrogenated Amorphous Silicon Thin Films
- In Situ Monitoring of Selective Copper Deposition Processes in a Metal-Organic Chemical Vapor Depositiorn Using Fourier-Transform Infrared Reflectiorn-Absorptiorn Spectroscopy
- Diffusion and Quenching of Metastable Xe Atoms in Mixtures of Xe and Rare Gases
- In Situ Measurement of Gas-Phase Reactions in Metal-Organic Chemical Vapor Deposition of Copper Films by Fourier Transform Infrared Spectroscopy
- Measurement of SiH_2 Densities in an RF-Discharge Silane Plasma Used in the Chemical Vapor Deporsition of Hydrogenated Amorphous Silicon Film
- An IR Study on the Stability of Y(DPM)_3, Ba(DPM)_2 and Cu(CPM)_2 for UV Irradiation
- Influence of Ozone Concentration on the Preparation of Stoichiometric Superconducting Y-Ba-Cu-O Films by a Metalorganic Chemical Vapor Deposition Technique
- Measurement of Absolute Densities and Spatial Distributions of Si and SiH in an RF-Discharge Silane Plasma for the Chemical Vapor Deposition of a-Si:H Films
- Preparation of Nearly Stoichiometric Superconducting Y-Ba-Cu-O Films by an MOCVD Technique Using Ozone
- Spectroscopic Measurements of the Production and the Transport of CH Radicals in a Methane Plasma Used for the CVD of a-C:H
- Spectroscopic Study on a Discharge Plasma of MOCVD Source Gases for High-T_C Superconducting Films
- Preparation and Characterization of Superconducting Y-Ba-Cu-O Films by the MOCVD Technique
- On the Reaction Kinetics in a Mercury Photosensitized CVD of a-Si:H Films
- A Numerical Study on Gaseous Reactions in Silane Pyrolysis
- Experimental Verification of Complex Dispersion Relation in Lossy Photonic Crystals
- A Two-Dimensional Simulation of Pulsed Discharge for a Color DC-Type Plasma Display Panel
- Direct Photochemical Vapor Deposition of Hydrogenated Amorphous Silicon : Effects of Excitation Wavelengths and Source Gases
- Measurement of Collision Broadening of Resonance Lines of Calcium Ion by a Low-Resolution Spectrometer
- Behavior of F Atoms and CF_2 Radicals in Fluorocarbon Plasmas for SiO_2/Si Etching
- Observation of Coulomb-Crystal Formation from Carbon Particles Grown in a Methane Plasma
- Electron Attachment Mass Spectrometry for the Detection of Electronegative Species in a Plasma
- Angle Resolved Mass Spectrometry of Positive Ions Transmitted through High Aspect Ratio Channels in a Radio Frequency Discharge
- Calculation of the Output Power of the Argon-Ion Laser Superimposed by a Magnetic Field
- Population Density and LTE of Excited Atoms in a Positive-Column Plasma I. : Calculation on Hydroegn
- Monte-Carlo Simulation of Surface Reactions in Plasma-Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Thin Films
- Interaction between Dielectric Barrier Discharge and Positive Streamer in Helium Plasma Jet at Atmospheric Pressure
- Mode Change Observed on Spatial Distribution of Microplasma Emission in a Microdischarge Cell with a Floating Electrode
- Ion Impact Energy Distributions and Properties of Amorphous Hydrogenated Carbon Thin Films Deposited in a Self-Biased RF Discharge
- High Speed Deposition of SiO2 Films with Plasma Jet Based on Capillary Dielectric Barrier Discharge at Atmospheric Pressure
- Behavior of N2+ Ions in He Microplasma Jet at Atmospheric Pressure Measured by Laser Induced Fluorescence Spectroscopy
- Current Status of Microplasma Research
- Analysis of Product Species in Capacitively Coupled C_5F_8 Plasma by Electron Attachment Mass Spectroscopy
- Analysis of Spherical Carbon Particle Growth in Methane Plasma by Mie-Scattering Ellipsometry ( Plasma Processing)
- Mie-Scattering Ellipsometry for Analysis of Particle Behaviors in Processing Plasmas
- In Situ Ellipsometric Monitoring of the Growth of Polycrystalline Silicon Thin Films by RF Plasma Chemical Vapor Deposition ( Plasma Processing)
- Reduction of Copper Oxide Thin Films with Hydrogen Plasma Generated by a Dielectric-Barrier Glow Discharge
- Plasma Copolymerization of C6F6/C5F8 for Application of Low-Dielectric-Constant Fluorinated Amorphous Carbon Films and Its Gas-Phase Diagnostics Using In Situ Fourier Transform Infrared Spectroscopy
- Rotational Analysis of Second-Positive Emissions in a N_2-SF_6 Laser
- 材料プロセス用フルオロカーボンプラズマに関する基礎研究の進展 5.Polymerization in Fluorocarbon Plasmas
- Measurement of the Formation and Dissociation Rates of CsXe Excimers
- Detection of H Atoms in RF-Discharge SiH_4, CH_4 and H_2 Plasmas by Two-Photon Absorption Laser-Induced Fluorescence Spectroscopy ( Plasma Processing)
- Thickness Dependence of H Radical Treatment of Si Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition Using SiF_4/SiH_4/H_2 Gases
- Population Density and LTE of Excited Atoms in a Positive-Column Plasma. : II. Measurement on Argon
- Construction and Performance of a Fourier-Transform Infrared Phase-Modulated Ellipsometer for In-Process Surface Diagnostics
- Plasma Enhanced Chemical Vapor Deposition of Fluorinated Amorphous Carbon Films on the Surface with Reverse Tapered Microstructures
- Microplasma-Induced Deformation of an Anomalous Response Spectrum of Electromagnetic Waves Propagating along Periodically Perforated Metal Plates
- Enhancement of Optical Emission by Floating Electrodes in a Planar Microdischarge Cell
- Spatiotemporal Surface Charge Measurement in Two Types of Dielectric Barrier Discharges Using Pockels Effect
- Quantum Chemical Study on Decomposition and Polymer Deposition in Perfluorocarbon Plasmas: Molecular Orbital Calculations of Excited States of Perfluorocarbons
- A Plasma Source Using Waves in a Lower Hybrid Frequency Range
- A Set of De-Excitation Rate Coefficients for the 3s ^3P_2 and ^3P_1 Levels of Neon
- Angle Resolved Mass Spectrometry of Positive Ions Transmitted through High Aspect Ratio Channels in a Radio Frequency Discharge
- Microplasma Array Serving as Photonic Crystals and Plasmon Chains
- A Study on Radical Fluxes in Silane Plasma CVD from Trench Coverage Analysis
- The Necessity of Radicals for Gene Transfection by Discharge Plasma Irradiation