Ohnishi H | Institute For Chemical Research Kyoto University
スポンサーリンク
概要
関連著者
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Ohnishi H
Institute For Chemical Research Kyoto University
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Ohnishi Hiroshi
Manufacturing Engineering Center Mitsubishi Electric Corporation
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Ohnishi Hiroshi
Manufacturing Development Laboratory Mitsubishi Electric Corp.
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橘 邦英
愛媛大学大学院工学研究科電子情報工学専攻
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Tachibana Kunihide
Department of Electronic Science and Engineering, Kyoto University
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Tachibana Kunihide
Department Of Electronic Science And Engineering Kyoto University
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HARIMA Hiroshi
Department of Electronics and Information Science, Kyoto Institute of Technology
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Harima H
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Harima Hiroshi
Department Of Applied Physics Osaha University
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Hanaoka Ken-ichi
Department of Electronics and Information Science, Kyoto Institute of Technology
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Hanaoka Ken-ichi
Department Of Electronics And Information Science Kyoto Institute Of Technology
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KOBAYASHI Minoru
Manufacturing Development Laboratory, Mitsubishi Electric Corp.
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HOSHINOUCHI Susumu
Manufacturing Development Laboratory, Mitsubishi Electric Corp.
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Hoshinouchi Susumu
Manufacturing Development Laboratory Mitsubishi Electric Co.
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Kobayashi M
Tokai Univ. Kanagawa Jpn
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KOBAYASHI Minoru
Manufacturing Development Laboratory, Mitsubishi Electric Co.
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GOTO Yoshiyuki
Manufacturing Development Laboratory, Mitsubishi Electric Co.
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KUSAKABE Yoshihiko
Manufacturing Development Laboratory, Mitsubishi Electric Corp.
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Goto Y
Central Research Laboratory Hitachi Ltd.
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Kusakabe Y
Mitsubishi Electric Corp. Hyogo Jpn
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Kawabata Takeo
Institute For Chemical Research Kyoto University
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FUJI KAORU
Institute for Chemical Research, Kyoto University
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Chen Ji-jun
Institute For Chemical Research Kyoto University
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Fuji Kaoru
Institute For Chemical Research Kyoto University
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OHNISHI Hiroshi
Institute for Chemical Research, Kyoto University
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SHANG Muhong
Institute for Chemical Research, Kyoto University
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Shang Muhong
Institute For Chemical Research Kyoto University
著作論文
- In Situ Monitoring of Selective Copper Deposition Processes in a Metal-Organic Chemical Vapor Depositiorn Using Fourier-Transform Infrared Reflectiorn-Absorptiorn Spectroscopy
- In Situ Measurement of Gas-Phase Reactions in Metal-Organic Chemical Vapor Deposition of Copper Films by Fourier Transform Infrared Spectroscopy
- An IR Study on the Stability of Y(DPM)_3, Ba(DPM)_2 and Cu(CPM)_2 for UV Irradiation
- Influence of Ozone Concentration on the Preparation of Stoichiometric Superconducting Y-Ba-Cu-O Films by a Metalorganic Chemical Vapor Deposition Technique
- Preparation of Nearly Stoichiometric Superconducting Y-Ba-Cu-O Films by an MOCVD Technique Using Ozone
- Spectroscopic Study on a Discharge Plasma of MOCVD Source Gases for High-T_C Superconducting Films
- Preparation and Characterization of Superconducting Y-Ba-Cu-O Films by the MOCVD Technique
- Lewis Acid-Promoted Nitroolefination of Enol Silyl Ethers via an Addition Elimination Process