Hoshinouchi Susumu | Manufacturing Development Laboratory Mitsubishi Electric Co.
スポンサーリンク
概要
関連著者
-
HARIMA Hiroshi
Department of Electronics and Information Science, Kyoto Institute of Technology
-
橘 邦英
愛媛大学大学院工学研究科電子情報工学専攻
-
Tachibana Kunihide
Department of Electronic Science and Engineering, Kyoto University
-
Ohnishi H
Institute For Chemical Research Kyoto University
-
Ohnishi Hiroshi
Manufacturing Engineering Center Mitsubishi Electric Corporation
-
Ohnishi Hiroshi
Manufacturing Development Laboratory Mitsubishi Electric Corp.
-
Tachibana Kunihide
Department Of Electronic Science And Engineering Kyoto University
-
KOBAYASHI Minoru
Manufacturing Development Laboratory, Mitsubishi Electric Corp.
-
HOSHINOUCHI Susumu
Manufacturing Development Laboratory, Mitsubishi Electric Corp.
-
Harima H
Department Of Electronics And Information Science Kyoto Institute Of Technology
-
Harima Hiroshi
Department Of Applied Physics Osaha University
-
Hoshinouchi Susumu
Manufacturing Development Laboratory Mitsubishi Electric Co.
-
Kobayashi M
Tokai Univ. Kanagawa Jpn
-
KOBAYASHI Minoru
Manufacturing Development Laboratory, Mitsubishi Electric Co.
-
KUSAKABE Yoshihiko
Manufacturing Development Laboratory, Mitsubishi Electric Corp.
-
Kusakabe Y
Mitsubishi Electric Corp. Hyogo Jpn
-
Hanaoka Ken-ichi
Department of Electronics and Information Science, Kyoto Institute of Technology
-
Hanaoka Ken-ichi
Department Of Electronics And Information Science Kyoto Institute Of Technology
著作論文
- Preparation of Nearly Stoichiometric Superconducting Y-Ba-Cu-O Films by an MOCVD Technique Using Ozone
- Spectroscopic Study on a Discharge Plasma of MOCVD Source Gases for High-T_C Superconducting Films
- Preparation and Characterization of Superconducting Y-Ba-Cu-O Films by the MOCVD Technique