KUSAKABE Yoshihiko | Manufacturing Development Laboratory, Mitsubishi Electric Corp.

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概要

• 同名の論文著者
• Manufacturing Development Laboratory, Mitsubishi Electric Corp.の論文著者

関連著者

• Ohnishi Hiroshi

  Manufacturing Engineering Center Mitsubishi Electric Corporation

• Ohnishi Hiroshi

  Manufacturing Development Laboratory Mitsubishi Electric Corp.

• KUSAKABE Yoshihiko

  Manufacturing Development Laboratory, Mitsubishi Electric Corp.

• HARIMA Hiroshi

  Department of Electronics and Information Science, Kyoto Institute of Technology

• 橘 邦英

  愛媛大学大学院工学研究科電子情報工学専攻

• Tachibana Kunihide

  Department of Electronic Science and Engineering, Kyoto University

• Ohnishi H

  Institute For Chemical Research Kyoto University

• Tachibana Kunihide

  Department Of Electronic Science And Engineering Kyoto University

• KOBAYASHI Minoru

  Manufacturing Development Laboratory, Mitsubishi Electric Corp.

• HOSHINOUCHI Susumu

  Manufacturing Development Laboratory, Mitsubishi Electric Corp.

• Harima H

  Department Of Electronics And Information Science Kyoto Institute Of Technology

• Harima Hiroshi

  Department Of Applied Physics Osaha University

• Hoshinouchi Susumu

  Manufacturing Development Laboratory Mitsubishi Electric Co.

• Kobayashi M

  Tokai Univ. Kanagawa Jpn

• Kusakabe Y

  Mitsubishi Electric Corp. Hyogo Jpn

• KOBAYASHI Minoru

  Manufacturing Development Laboratory, Mitsubishi Electric Co.

• Komori Hideki

  Manufacturing Engineering Center Mitsubishi Electric Corp.

• Hanaoka Ken-ichi

  Manufacturing Engineering Center Mitsubishi Electric Corp.

• Yamanishi Ken-ichiro

  Manufacturing Engineering Center, Mitsubishi Electric Corp.,

• Yamanishi Ken-ichiro

  Manufacturing Engineering Center Mitsubishi Electric Corp.

• Ohnishi Hiroshi

  Manufacturing Engineering Center Mitsubishi Electric Corp.

• Kusakabe Yoshihiko

  Manufacturing Engineering Center Mitsubishi Electric Corp.

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著作論文

• Preparation of Nearly Stoichiometric Superconducting Y-Ba-Cu-O Films by an MOCVD Technique Using Ozone
• Preparation and Characterization of Superconducting Y-Ba-Cu-O Films by the MOCVD Technique
• Investigation of Precursors Formed by Mixing SiH2Cl2 with NH3 for Chemical Vapor Deposition of Silicon nitride Films

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