Matsui Yasushi | Electronics Research Laboratory Corporate Research & Development Matsushita Electronics Corporat
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概要
- 同名の論文著者
- Electronics Research Laboratory Corporate Research & Development Matsushita Electronics Corporatの論文著者
関連著者
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Matsui Yasushi
Electronics Research Laboratory Corporate Research & Development Matsushita Electronics Corporat
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Matsui Y
Assoc. Super‐advanced Electronics Technol. (aset) Kanagawa Jpn
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Matsui Y
Nims Tsukuba Jpn
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MATSUI Yoshio
National Institute for Research in Inorganic Materials
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HORIUCHI Shigeo
National Institute for Research in Inorganic Materials
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Horiuchi S
National Inst. Res. In Inorganic Materials Tsukuba Jpn
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Horiuchi S
National Inst. Res. In Inorganic Materials Ibaraki Jpn
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Horiuchi Shigeo
National Institute For Research In Inorganic Materials (nirim)
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Hiratani M
Central Research Laboratory Hitachi Ltd.
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Hiratani M
Central Research Laboratory Hitachi Ltd
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Hiratani Masahiko
Central Research Laboratory Hitachi Ltd.
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Takekawa Shunji
National Institute for Research in Inorganic Materials
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Takekawa S
National Inst. For Materials Sci. Ibaraki Jpn
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Takekawa Shunji
Advanced Materials Laboratory National Institute For Materials Science
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Takekawa Shunji
National Institute For Research In Inorganec Materials
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TAKAYAMA-MUROMACHI Eiji
National Institute for Research in Inorganic Materials
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Hokama A
Control And Prevention Of Infectious Diseases Department Of Medicine And Therapeutics Faculty Of Med
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Hokama Akira
琉球大学 医学部感染病態制御学
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Tanaka Yasuaki
Ntt Interdisciplinary Research Laboratories
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Tanaka Y
Tokyo Univ. Agriculture And Technol. Koganei Jpn
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Tanaka Y
Department Of Materials Science And Technology Science University Of Tokyo
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MAEDA Hiroshi
National Research Institute for Metals, Sengen
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Kato K
Shizuoka Johoku Senior High School Shizuoka Jpn
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Aoyama H
Aset Super-fine Sr Lithography Laboratory
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Aoyama Hajime
Super-fine Sr Lithography Laboratory Association Of Super-advanced Electronics Technologies(aset) At
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Aoyama Hajime
Super-fine Sr Lithography Lab. Association Of Super-advanced Electronics Technologies (aset) Co Ntt
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TANAKA Yoshiaki
National Research Insitute for Metals, Tsukuba Laboratories
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FUJISAKI Yoshihisa
Central Research Laboratory, Hitachi Ltd.
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KATO Katsuo
National Institute for Research in Inorganic Materials
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Hokama Akira
The First Department Of Internal Medicine Faculty Of Medicine University Of The Ryukyus
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橘 邦英
愛媛大学大学院工学研究科電子情報工学専攻
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Tachibana Kunihide
Department of Electronic Science and Engineering, Kyoto University
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TAGUCHI Takao
SORTEC Corporation
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Taguchi T
Research Laboratories Nippondenso Co. Ltd.
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Maeda H
National Research Inst. Metals Ibaraki
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TAGUCHI Takao
ASET Super-fine SR Lithography Laboratory
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Ishino M
Japan Atomic Energy Res. Inst. Kizu Jpn
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MORITA Hirofumi
NTT LSI Laboratories
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AOYAMA Hajime
ASET Super-fine SR Lithography Laboratory, co NTT Telecommnications Energy Laboratories
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MATSUI Yasuji
ASET Super-fine SR Lithography Laboratory, co NTT Telecommnications Energy Laboratories
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Hamakawa Yoshihiro
Faculty Of Science And Engineering Ritsumeikan University
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Hamakawa Yoshihiro
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Morita H
Lcd Division Toshiba Corporation
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OKUYAMA Masanori
Department of Electrical Engineering, Facully of Engineering Science, Osaka University
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IZUMI Fujio
National Institute for Reserch in Inorganic Materials
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Izumi F
Nims)
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Izumi Fujio
National Institute For Research In Inoganic Materials
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Kimura Shingo
Department Of Physics School Of General Education Iwate Medical University
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Okuyama Masanori
Department Of Electrical Engineering Faculty Of Engineering Schience Osaka University
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Okuyama Masanori
Faculty Of Engineering Science Osaka University
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MIKI Hiroshi
Department of Pathology, Kagawa Medical University
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NOZAKI Hiroshi
National Institute for Resarch in Inorganic Materials
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ONODA Mitsuko
National Institute for Research in Inorganic Materials
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UMEZONO Akihiro
Fuji Research Laboratory, Tokai Carbon Co. Ltd.
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Kimura S
Ntt Photonics Lab. Kanagawa Jpn
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FUKUDA Makoto
NTT Telecommunications Energy Laboratories
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MORITA Hirofumi
NTT Telecommunications Energy Laboratories
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Fukumi K
National Inst. Advanced Industrial Sci. And Technol. Jpn
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HAGA Tetsuya
Department of Applied Physics, Hokkaido University
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中山 喜萬
阪大工
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MOROSAWA Tetsuo
NTT LSI Laboratories
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NAKAYAMA Yoshinori
ASET Super-fine SR Lithography Laboratory, co NTT Telecommnications Energy Laboratories
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MATSUDA Tadahito
NTT Telecommunications Energy Laboratories
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MATSUDA Tadahito
NTT System Electronics Laboratories
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Haga T
Ntt Telecommunications Energy Lab. Kanagawa Jpn
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Kobayashi K
Dep. Of Electronic Sci. And Engineering Kyoto Univ. Katsura Nishikyo Kyoto 615-8510 Japaninnovative
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大塚 信之
松下電器半導体センター
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Suzuki M
Shizuoka Univ. Hamamatsu
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Nabatame Toshihide
Mirai-association Of Super-advanced Electronics Technologies (mirai-aset) National Institute Of Adva
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Nabatame T
Aist Tsukuba Jpn
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Nabatame Toshihide
Mirai-aset Advanced Industrial Science And Technology (aist)
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Nabatame Toshihide
Hitachi Research Laboratory Hitachi Ltd.
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Suzuki M
Department Of Electronic Engineering Faculty Of Engineering Hokkaido University
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Adachi M
Toyama Prefectural Univ. Toyama Jpn
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Iizuka Takashi
Fujitsu Laboratories Ltd.:aset Super-fine Sr Lithography Laboratory
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Suzuki K
Ntt Transmission Systems Lab. Ibaraki Jpn
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Suzuki Kenji
Institute For Materials Research Laboratory Tohoku University
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IYI Nobuo
National Institute for Materials Science, Advanced Materials Laboratory
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SUZUKI Katsumi
Superconductivity Research Laboratory,ISTEC
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Fujio Izumi
National Institute For Research In Inorganic Materials
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Iyi N
National Inst. Materials Sci. Ibaraki Jpn
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Iyi N
National Inst. For Materials Sci. (nims) Tsukuba
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Iyi Nobuo
Advanced Materials Laboratory National Institute For Materials Science (nims)
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Iyi Nobuo
Nirim
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Iyi Nobuo
Advanced Materials Laboratory (aml) National Institute For Materials Science (nims)
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Iyi Nobuo
Exploratory Nanomaterials Laboratory National Institute For Materials Science (nims)
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Suzuki Mitsuru
Cryogenic Centre University Of Tokyo
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KAWAHARA Toshio
Department of Materials Science and Engineering, National Defense Academy
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Kobayashi K
Kobe Steel Ltd. Kobe Jpn
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Imagawa Kazushige
Central Research Laboratory, Hitachi, Ltd.
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Kamigaki K
College Of Liberal Arts Toyama University
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UCHIDA Yoshishige
National Institute for Research in Inorganic Materials
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Ogata Toshihiro
Department Of Electronic Engineering Faculty Of Science And Engineering Saga University
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ASANO Isamu
ELPIDA MEMORY, Inc.
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HORIUCHI Kei
Fujitsu Laboratories Ltd.
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Kudoh Kazuhide
Department Of Applied Physics Tokyo University Of Science
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Nozaki H
Okayama Univ. Sci. Okayama Jpn
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IBA Yoshihisa
Fujitsu Laboratories Ltd.
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KUMASAKA Fumiaki
Fujitsu Laboratories Ltd.
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DEGUCHI Kimiyoshi
NTT Telecommunications Energy Laboratories
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Suzuki M
Sci. Univ. Tokyo Chiba Jpn
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Suzuki M
Research Center Asahi Glass Co. Ltd.
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YABE Hideki
Central Research Laboratory, Mitsubishi Electric Corporation
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藤井 研一
阪大院理
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HARIMA Hiroshi
Department of Electronics and Information Science, Kyoto Institute of Technology
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Watanabe Noboru
National Laboratory For High Energy Physics
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Onoda Yoshito
National Institute For Research In Inorganic Materials
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ONO Akira
National Research Laboratory of Metrology
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NISHIDA Masahiro
Department of Neurosurgery, Chugoku Rouse Hospital
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Ono Akira
National Institute For Researches In Inorganic Materials
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Ono Akira
National Institute For Research In Inorganic Materials
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OHKI Shigehisa
NTT Advanced Technology Corp.
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ODA Masatoshi
NTT LSI Laboratories
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Ohki S
Ntt Telecommunications Energy Laboratories
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Ono A
National Inst. Res. In Inorganic Materials Ibaraki Jpn
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Inoue M
Department Of Electrical Engineering Osaka Prefectural Technical College
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Inoue M
Osaka Inst. Technol. Osaka Jpn
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Morosawa Tetsuo
Ntt Telecommunications Energy Laboratories
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EZAKI Mizunori
ASET Super-fine SR Lithography Laboratory, co NTT Telecommnications Energy Laboratories
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KIKUCHI Yukiko
ASET Super-fine SR Lithography Laboratory, co NTT Telecommnications Energy Laboratories
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TSUBOI Shinji
ASET Super-fine SR Lithography Laboratory, co NTT Telecommnications Energy Laboratories
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WATANABE Hiroshi
ASET Super-fine SR Lithography Laboratory, co NTT Telecommnications Energy Laboratories
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OHKI Shigehisa
NTT Telecommunications Energy Laboratories
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SAITO Kenichi
NTT Telecommunications Energy Laboratories
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AOYAMA Hajime
Super-fine SR Lithography Laboratory, Association of Super-Advanced Electronics Technologies(ASET),
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ODA Masatoshi
NTT Telecommunications Energy Laboratories
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ODA Masatoshi
NTT System Electronics Laboratories
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Inoue M
Setsunan Univ. Osaka Jpn
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Makita T
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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Makita Tetsuro
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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SAITO Keisuke
Application Laboratory
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Uchida Masaya
National Institute For Research In Inorganic Materials:high Energy Accelerator Research Organization
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Uchida Masaya
National Institute For Research In Inorganic Materials
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Fujii K
Osaka Univ. Osaka
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Ono K
Department Of Applied Chemistry The University Of Tokyo
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Ono K
Advanced Technology R&d Center Mitsubishi Electric Corporation:(present Address)department Of Ae
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Ono K
Univ. California Ca Usa
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Horie Kazuo
Department Of Electronic System And Information Engineering Faculty Of Biology-oriented Science And
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Inoue Masami
Association Of Super-advanced Electronics Technologies (aset)
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Asano Hajime
Institute Of Materials Science University Of Tsukuba
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Saito Keisuke
Application Laboratory Analytical Division Philips Japan Ltd.
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Saito K
Institute Of Industrial Science University Of Tokyo
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Mukai T
Nitride Semiconductor Research Laboratory Opto-electronics Products Division Nichia Corp.
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Kikuchi Y
Aset Super‐fine Sr Lithography Lab. Kanagawa Jpn
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Kikuchi Yukiko
Aset Super-fine Sr Lithography Laboratory Co Ntt Telecommnications Energy Laboratories
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Kikuchi Yukiko
Super-fine Sr Lithography Laboratory Association Of Super-advanced Electronics Technologies(aset) At
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Ezaki M
Assoc. Super‐advanced Electronics Technol. (aset) Kanagawa Jpn
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Suzuki T
Hitachi Research Laboratory Hitachi Ltd.
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Inoue M
Assoc. Super‐advanced Electronics Technol. (aset) Yokohama Jpn
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Inoue M
Nanomaterials Microdevices Research Center Osaka Institute Of Technology
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Nakamura M
Hitachi Ltd. Ibaraki Jpn
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Inoue M
Kyoto Univ. Kyoto Jpn
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Inoue Masumi
Department Of Quantum Engineering Nagoya University
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Suzuki T
Nagaoka Univ. Technol.
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KUROKAWA Hisayoshi
Department of Electrical and Electronic Engineering, Ehime University
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ISHIGAKI Toru
Institute of Material Science,University of Tsukuba
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WATANABE Narumi
Graduate School of Science, Osaka University
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Mukai Takashi
Department Of Research And Development; Nichia Chemical Industries Ltd.
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SUZUKI Takaaki
Hitachi Research Laboratory of Hitachi Ltd.
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Watanabe N
Graduate School Of Science Osaka University
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WATANABE Hideyuki
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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WATANABE Hiroshi
Advanced Science Research Center, Japan Atomic Energy Research Institute
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OGATA Tamotsu
ULSI Laboratory, Mitsubishi Electric Corporation
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KOBAYASHI Kiyoteru
ULSI Laboratory, Mitsubishi Electric Corporation
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KUROKAWA Hiroshi
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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HIRAYAMA Makoto
ULSI Laboratory, Mitsubishi Electric Corporation
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KOBAYASHI Kiyoteru
Mitsubishi Electric Corporation, ULSI Laboratory
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HIRAYAMA Makoto
Mitsubishi Electric Corporation, ULSI Laboratory
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IWATSUKI Masashi
JEOL Ltd.
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MIURA Hideo
Mechanical Engineering Research Laboratory, Hitachi, Ltd.
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NAKAMURA Masakazu
Department of Electronics and Mechanical Engineering, Faculty of Engineering, Chiba University
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Suzuki Tatsuya
Graduate School Of Engineering Yokohama National University
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Inoue Masataka
Nanomaterials Microdevices Research Center Osaka Institute Of Technology
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Kinoshita K
Ntt Basic Research Laboratories
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OHJI Yuzuru
Semiconductor Leading Edge Technologies, Inc. (Selete)
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KAWAHARA Takaaki
Semiconductor Leading Edge Technologies, Inc.
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Watanabe N
Superconductivity Res. Lab. Tokyo
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Watanabe H
Semiconductor Leading Edge Technol. Inc. Yokohama Jpn
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Watanabe Nobuaki
Superconductivity Research Laboratory International Superconductivity Technology Center
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CANTONI Marco
National Institute for Research in Inorganic Materials
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TSURUTA Tadamasa
National Institute for Research in Inorganic Materials
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MATUI Yoshio
National Institute for research in Inorganic Materials
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UCHDA Yoshishige
National Institute for research in Inorganic Materials
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MATUSI Yoshio
National Institute for Research in Inorganic Materials
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TAKAYAMA MUROMACHI
National Institute for Research in Inorganic Materials
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HORIGUCHI Shigeo
National Institute for Research in Inorganic Materials
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KOSUDA Kosuke
National Institute for Research in Inorganic Materials
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HORIGUCHI Shigeo
Inorganic MaterialsNational Institute for Research in Inorganic Materials
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YAMAMUKA Mikio
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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YUUKI Akimasa
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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ONO Kouichi
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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TSUTAHARA Koichiro
Kita-Itami Works, Mitsubishi Electric Corporation
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MATSUI Yasuji
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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TAGUCHI Takao
Super-fine SR Lithography Laboratory, Association of Super-Advanced Electronics Technologies (ASET),
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Asano Hajime
Instiiute Of Materials Science University Of Tsukuba
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Saito Kenichi
Institute Of Industrial Science University Of Tokyo
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Inoue M
Advanced Technology R&d Center Mitsubishi Electric Corp.
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SAMBONSUGI Yasuhiro
Fujitsu Laboratories Ltd.
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MARUMOTO Kenji
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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MARUMOTO Kenji
Central Research Laboratory, Mitsubishi Electric Corporation
著作論文
- Low-Temperature Growth of SiO_2 Thin Film by Photo-Induced Chemical Vapor Deposition Using Synchrotron Radiation
- Critical-Dimension Controllability of Chemically Amplified Resists for X-Ray Membrane Mask Fabrication
- Observation of the interaction of vortices with dislocations in a Nb superconductor by a cryo-Lorentz EM
- High-Resolution Transmission Electron Microscopy of Long-Period Structures of Various Phases in a Bi-Sr-Cu-O System
- Identification of the Superconducting Phase in the Nd-Ce-Sr-Cu-O System : Electrical Properties of Condensed Matter
- High-Resolution Electron Microscopy of Modulated Structure in 20 K Superconducting Oxide Bi_2Sr_2CuO_y : Electrical Properties of Condensed Matter
- High Resolution Electron Microscopy of Intergrowth and Modulated Structure in 100 K High-T_c Superconductor Bi_2 (Sr,Ca) _4Cu_3O_y : Electrical Properties of Condensed Matter
- Structure Analysis of the Bi_2(Sr,Ca)_3Cu_2O_ Superconducting Crystal Based on the Computer Simulation of HRTEM Images : Condensed Matter
- Twins and Intergrowth Defects in High-T_c Bi-Sr-Ca-Cu-O Superconductor Examined by High-Resolution Electron Microscopy : Electrical Properties of Condensed Matter
- On the 110 K Superconductor in the Bi-Ca-Sr-Cu-O System : Electrical Properties of Condensed Matter
- Possible Model of the Modulated Structure in High-T_c Superconductor in a Bi-Sr-Ca-Cu-O System Revealed by High-Resolution Electron Microscopy : Electrical Properties of Condensed Matter
- Identification of the Superconducting Phase in the Bi-Ca-Sr-Cu-O System : Electrical Properties of Condensed Matter
- High-Resolution Electron Microscopy of Modulated Structure in the New High-T_c superconductors of the Bi-Sr-Ca-Cu-O System : Electrical Properties of Condensed Matter
- High-Resolution Electron Microscopy of Planer Defects and Dislocation in Ba_2YCu_3O_y
- Electron Diffraction and Microscope Study of Ba-Nd-Cu-O Superconducting Oxides and Related Compounds
- Crystal Structure of the Superconductor Ba_Nd_Cu_3O_
- Electron Diffraction and Microscope Study of Radiation Damage in Ba_2YCu_3O_y
- Preparation of (Ba, Sr)TiO_3 Thin Films by Chemical Vapor Deposition Using Liquid Sources
- Sub-100-nm Device Fabrication using Proximity X-Ray Lithography at Five Levels
- Mask Error Factor in Proximity X-Ray Lithography
- Optimum Phase Condition for Low-Contrast X-Ray Masks
- Measurement and Calculation of SiH_2 Radical Density in SiH_4 and Si_2H_6 Plasma for the Deposition of Hydrogenated Amorphous Silicon Thin Films
- Measurement of SiH_2 Densities in an RF-Discharge Silane Plasma Used in the Chemical Vapor Deporsition of Hydrogenated Amorphous Silicon Film
- Spectroscopic Measurements of the Production and the Transport of CH Radicals in a Methane Plasma Used for the CVD of a-C:H
- On the Reaction Kinetics in a Mercury Photosensitized CVD of a-Si:H Films
- Development of methanol sensor using a shear horizontal surface acoustic wave device for a direct methanol fuel cell
- High-Quality CVD/Thermal Stacked Gate Oxide Films with Hydrogen-Free CVD SiO_2 Formed in a SiCl_4-N_2O System
- Kinetic Study of Silicon Nitride Growth from Dichlorosilane and Ammonia
- Evaluation of Acid Diffusibility in a Chemical Amplification Resist Using Acidic Water-Soluble Film
- Development of temperature-control system for liquid droplet using surface Acoustic wave devices
- Use of a low refractive index prism in surface plasmon resonance biosensing
- Dependence of SPR sensor performance on prism material and its importance in biosensor
- I-3 Deposition of thin film based on SAW streaming(Device application (English session))
- P1-27 A study on SAW streaming phenomenon based on temperature measurement and observation of streaming in liquids(Poster session 1)
- High-Performance X-Ray Mask Fabrication Using TaGeN Absorber and Dummy Pattern Method for Sub-100nm Proximity X-Ray Lithography : Instrumentation, Measurement, and Fabrication Technology
- Suppression of Pattern Edge Roughness by Low Ion Strength Developer
- Properties of Ruthenium Films Prepared by Liquid Source Metalorganic Chemical Vapor Deposition Using Ru(EtCp)_2 with Tetrahydrofuran Solvent
- Evaluation of Overlay Accuracy for 100-nm Ground Rule in Proximity X-Ray Lithography
- Conformal Platinum Electrodes Prepared by Chemical Vapor Deposition Using a Liquid MeCpPtMe_3 Precursor in an Oxidizing Atmosphere
- Thermal Stability of a RuO_2 Electrode Prepared by DC Reactive Sputtering
- Hydrogen Reduction Properties of RuO_2 Electrodes
- Performance of X-Ray Stepper for Next-Generation Lithography
- In-Situ Characterization of Si Surface Oxidation by High-Sensitivity Infrared Reflection Spectroscopic Method
- High-Sensitivity Infrared Characterization of Ultrathin SiO_2 Film by Grazing Internal Reflection Method
- A 500℃ fabrication process for MIM capacitors-based on a Ta_2O_5/Nb_2O_5 bilayer with high permittivity-for DRAM and SoC applications
- Highly Oxidation-Resistant TiN Barrier Layers for Ferroelectric Capacitors
- Highly Oxidation-Resistant TiN Barrier Layers for Ferroelectric Capacitors
- Reaction Mechanism of Chemical Vapor Deposition Using Tetraethylorthosilicate and Ozone at Atmospheric Pressure
- High Output Power Operation of a 1.3 μm Gain-Coupled Distributed Feedback Laser with Narrow Spectral Linewidth
- New Structure of 1.3 μm Strained-Layer Multi-Quantum Well Complex-Coupled Distributed Feedback Lasers
- Novel Structure of 1.3μm Strained-Layer MQW Complex-Coupled DFB Lasers
- Analysis of Decomposed Layer Appearing on the Surface of Barium Strontium Titanate
- Effects of Post-Annealing Temperatures and Ambient Atmospheres on the Electrical Properties of Ultrathin (Ba, Sr) TiO_3 Capacitors
- Profile-Imaging of Wavy Cleavage Surface of Bi_2Sr_2CaCu_2O_y by High-Resolution Transmission Electron Microscopy
- Fabrication of Diamond Membranes for X-Ray Masks by Hot-Filament Method
- Preparation and Crystal Structures of Bi-Based Layered Oxides Including Fe
- T_c = 113 K Bi-Based Superconductor Prepared by Doping Fluorine
- Low-Temperature Electron Microscopy of a Bi_2(Sr, Ca)_3Cu_2O_x Superconductor
- Oxygen Diffusion in Pt Botton Electrodes of Ferroelectric Capacitors
- Study of Surface Reaction Probability of CF_x Radicals by Trench Deposition Method
- Preparation of PbZrO_3 -PbTiO_3 -Pb(Mg_Nb_)O_3 Thick Films by Screen Printing
- Preparation of 0.92PbZrO_3-0.03PbTiO_3-0.05Pb(Zn_Nb_)O_3 Pyroelectric Thick Films by Screen Printing
- Thermal Stability of Pt Bottom Electrodes for Ferroelectric Capacitors
- New Biosensor Using Shear Horizontal Surface Acoustic Wave Device