Shirafuji Tatsuru | International Innovation Center Kyoto University
スポンサーリンク
概要
関連著者
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Shirafuji Tatsuru
International Innovation Center Kyoto University
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Tachibana Kunihide
Department Of Electronic Science And Engineering Kyoto University
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Nakamura Toshihiro
Department Of Anesthesiology Yamanashi Medical University
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Shirafuji Tatsuru
International Innovation Center, Kyoto University, Yoshida Honmachi, Sakyo-Ku, Kyoto 606-8501, Japan
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Tachibana Kunihide
Department Of Electronics Kyoto University
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Tsuchino Akio
Department of Electronics, Kyoto University, Yoshida Honmachi, Sakyo-Ku, Kyoto 606-8501, Japan
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Tsuchino Akio
Department Of Electronics Kyoto University
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Fracassi Francesco
Cnr Centro Di Studio Per La Chimica Dei Plasmi C-o Dipartimento Di Chimica Universita De Bari
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Kashiwagi Motofumi
Zeon Corporation, 1-2-1 Yako, Kawasaki-ku, Kawasaki-shi, Kanagawa-ken 201-9507, Japan
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SHIRAFUJI Tatsuru
International innovation Center, Kyoto University
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Nakamura Toshihiro
Department of Electronics, Kyoto University, Yoshida Honmachi, Sakyo-Ku, Kyoto 606-8501, Japan
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Tachibana Kunihide
Department of Electronics, Kyoto University, Yoshida Honmachi, Sakyo-Ku, Kyoto 606-8501, Japan
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Tachibana Kunihide
Department of Electronic Science and Engineering, Kyoto University, Katsura, Nishikyo-ku, Kyoto 615-8510, Japan
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Wada Takahisa
Department of Electronics, Kyoto University, Yoshida Honmachi, Sakyo-Ku, Kyoto 606-8501, Japan
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Abolmasov Sergey
Venture Business Laboratory, Kyoto University, Yoshida-Honmachi, Sakyo-ku, Kyoto 606-8501, Japan
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Abo Rei
Department of Electronic Science and Engineering, Kyoto University, Katsura, Nishikyo-ku, Kyoto 615-8510, Japan
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Fracassi Francesco
CNR, Centro di Studio per la Chimica dei Plasmi, c-o Dipartimento di Chimica, Universita de Bari
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Fornelli Antonella
CNR, Centro di Studio per la Chimica dei Plasmi, c-o Dipartimento di Chimica, Universita de Bari
著作論文
- Plasma Copolymerization of C6F6/C5F8 for Application of Low-Dielectric-Constant Fluorinated Amorphous Carbon Films and Its Gas-Phase Diagnostics Using In Situ Fourier Transform Infrared Spectroscopy
- Plasma Enhanced Chemical Vapor Deposition of Fluorinated Amorphous Carbon Films on the Surface with Reverse Tapered Microstructures
- Dry Etching of SiO_2 Thin Films with Perfluoropropenoxide-O_2 and Perfiuoropropene-O_2 Plasmas
- Spatiotemporal Surface Charge Measurement in Two Types of Dielectric Barrier Discharges Using Pockels Effect