Plasma Enhanced Chemical Vapor Deposition of Fluorinated Amorphous Carbon Films on the Surface with Reverse Tapered Microstructures
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概要
- 論文の詳細を見る
Fluorinated amorphous carbon films have been deposited using a novel monomer of C5F8 with a quite high deposition rate of 500 nm/min at room temperature. The capability of deposition on the surface with reverse tapered microstructures, which are formed for micro patterning of organic electroluminescence devices, has been demonstrated. The unique deposition profile is discussed in terms of the nature of deposition precursors which are mainly estimated from the results of in situ Fourier transform infrared spectroscopy and optical emission spectroscopy of the gas phase.
- 2003-07-15
著者
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Tachibana Kunihide
Department Of Electronic Science And Engineering Kyoto University
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Nakamura Toshihiro
Department Of Anesthesiology Yamanashi Medical University
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Shirafuji Tatsuru
International Innovation Center, Kyoto University, Yoshida Honmachi, Sakyo-Ku, Kyoto 606-8501, Japan
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Shirafuji Tatsuru
International Innovation Center Kyoto University
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Kashiwagi Motofumi
Zeon Corporation, 1-2-1 Yako, Kawasaki-ku, Kawasaki-shi, Kanagawa-ken 201-9507, Japan
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Nakamura Toshihiro
Department of Electronics, Kyoto University, Yoshida Honmachi, Sakyo-Ku, Kyoto 606-8501, Japan
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Tachibana Kunihide
Department of Electronics, Kyoto University, Yoshida Honmachi, Sakyo-Ku, Kyoto 606-8501, Japan
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Wada Takahisa
Department of Electronics, Kyoto University, Yoshida Honmachi, Sakyo-Ku, Kyoto 606-8501, Japan
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