Detection of H Atoms in RF-Discharge SiH_4, CH_4 and H_2 Plasmas by Two-Photon Absorption Laser-Induced Fluorescence Spectroscopy (<Special Issue> Plasma Processing)

概要

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Hydrogen atoms were detected quantitatively by a two-photon absorption laser-induced fluorescence technique in capacitively coupled and inductively coupled RF-discharge plasmas. In a parallel-plate RF-discharge reactor the density of H atoms measured in a SiH_4 plasma diluted with Ar was higher than that diluted with H_2. A comparison of the densities in SiH_4, CH_4 and H_2 plasmas measured by changing dilution ratio with Ar also showed that H_2 molecules were not easily decomposed and H atoms were mostly produced from decomposition of source SiH_4 and CH_4 molecules at low RF-power level. Spatial distribution of H atoms effused from an inductively coupled RF-discharge radical source was also measured. Its axial and radial profiles showed the expansion of H atoms towards the chamber wall by diffusion and gas flow. The absolute calibration of H atom density was carried out by a comparison with absorption of Ly_α line at 121.6 nm.
社団法人応用物理学会の論文
1994-07-30