Behavior of F Atoms and CF_2 Radicals in Fluorocarbon Plasmas for SiO_2/Si Etching
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-07-30
著者
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KAWASAKI Takeshi
Department of Physics, Faculty of Science, Tokyo University of Science
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Tachibana Kunihide
Department of Electronic Science and Engineering, Kyoto University
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Kawasaki Takeshi
Department Of Chemistry Faculty Of Science Toho University
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Tachibana Kunihide
Department Of Electronic Science And Engineering Kyoto University
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Kamisugi Hideaki
Department of Electronic Science and Engineering, Kyoto University
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Kamisugi Hideaki
Department Of Electronic Science And Engineering Kyoto University:(present Address)electro-optic Pro
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Kawasaki Takeshi
Department Of Applied Electronics Tokyo Science University
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Kawasaki Takeshi
Department Of Electronic Science And Engineering Kyoto University
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KAWASAKI TAKESHI
Department of Applied Chemistry, Waseda University
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