Population Density and LTE of Excited Atoms in a Positive-Column Plasma. : II. Measurement on Argon
スポンサーリンク
概要
- 論文の詳細を見る
A calculation is made to relate external discharge parameters to internal plasma parameters for a positive column of Ar produced by a steady or pulsed DC-discharge. The plasma and energy balance equations and Ohm's law based on the theory of Tonks and Langmuir, and on that of Schottky are numerically solved, and the calculated plasma parameters are compared with the measurements for various external parameters of the experiments. On the basis of the calculations, population densities of excited ArI levels are obtained as a function of the electron density at an electron temperature of 50,000 K in a steady DC-discharge of Ar, and it has been proved that, as shown in a previous paper, they change from coronal to full-saturation phases as the electron density increases.
- 社団法人応用物理学会の論文
- 1973-06-05
著者
-
Tachibana Kunihide
Department Of Electronic Science And Engineering Kyoto University
-
Fukuda Kuniya
Department Of Engineering Physics Faculty Engineering Kyoto University
-
Tachibana Kunihide
Department Of Mechanical Engineering Ii Faculty Of Engineering Kyoto University
関連論文
- Two-Dimensional Melting in a Coulomb Crystal of Dusty Plasmas
- Observations of Silicon Surfaces Exposed to Inductively Coupled CHF_3 and C_4F_8/H_2 Plasmas Using Fourier Transform Infrared Ellipsometry
- Reaction Mechanism of Alkoxy Derivatives of Titanium Diketonates as Source Molecules in Liquid Source Metalorganic Chemical Vapor Deposition of (Ba,Sr)TiO_3 Films : A Study by In Situ Infrared Absorption Spectroscopy
- Effects of O_2 Gas on Reaction Mechanisms in the Chemical Vapor Deposition of (Ba, Sr)TiO_3 Thin Film
- Film Precursor Formation in Metalorganic Chemical Vapor Deposition of Barium Strontium Titanate Films : A Study by Microdischarge Optical Emission Spectroscopy
- Formation Mechanism of Strontium and Titaniuln Oxide Fillns by Metalorganlc Chemlcal Vapor Deposition: An Isotopic Labeling Study Using ^O_2 : Atoms, Molecules, and Chemical Physics
- Diagnosis of Oxidation Reactions in Metalorganic Chemical Vapor Deposition of (Ba,Sr)TiO_3 Films by In Situ Fourier Transform Infrared Spectroscopy
- Effects of Gas-Phase Thermal Decompositions of Chemical Vapor Deposition Source Molecules on the Deposition of(Ba, Sr)TiO_3 Films : A Study by In Situ Fourier Transform Infared Spectroscopy
- Gas Phase Reactions in the MOCVD of (Ba, Sr)TiO_3 Films : A Study by Microdischarge Optical Emission Spectroscopy
- Microdischarge Optical Emission Spectroscopy as a Novel Diagnostic Tool for Metalorganic Chemical Vapor Deposition of(Ba, Sr)TiO_3 Films
- Study of Self-Diffusion Process of Water Molecules in Porous Glass by Stimulated Spin Echo Method with Pulsed Field Gradients
- Selective-Excitation Study of Collisional Excitation Transfer for Helium 3^P and D States
- Investigation of Discharge Phenomena in a Cell of Color Plasma Display Panel I. : One-Dimensional Model and Numerical Method
- Plasma Production and Wave Propagation in a Plasma Source Using Lower Hybrid Waves
- Measurement and Calculation of SiH_2 Radical Density in SiH_4 and Si_2H_6 Plasma for the Deposition of Hydrogenated Amorphous Silicon Thin Films
- In Situ Monitoring of Selective Copper Deposition Processes in a Metal-Organic Chemical Vapor Depositiorn Using Fourier-Transform Infrared Reflectiorn-Absorptiorn Spectroscopy
- Diffusion and Quenching of Metastable Xe Atoms in Mixtures of Xe and Rare Gases
- In Situ Measurement of Gas-Phase Reactions in Metal-Organic Chemical Vapor Deposition of Copper Films by Fourier Transform Infrared Spectroscopy
- Measurement of SiH_2 Densities in an RF-Discharge Silane Plasma Used in the Chemical Vapor Deporsition of Hydrogenated Amorphous Silicon Film
- An IR Study on the Stability of Y(DPM)_3, Ba(DPM)_2 and Cu(CPM)_2 for UV Irradiation
- Influence of Ozone Concentration on the Preparation of Stoichiometric Superconducting Y-Ba-Cu-O Films by a Metalorganic Chemical Vapor Deposition Technique
- Measurement of Absolute Densities and Spatial Distributions of Si and SiH in an RF-Discharge Silane Plasma for the Chemical Vapor Deposition of a-Si:H Films
- Preparation of Nearly Stoichiometric Superconducting Y-Ba-Cu-O Films by an MOCVD Technique Using Ozone
- Spectroscopic Measurements of the Production and the Transport of CH Radicals in a Methane Plasma Used for the CVD of a-C:H
- Spectroscopic Study on a Discharge Plasma of MOCVD Source Gases for High-T_C Superconducting Films
- Preparation and Characterization of Superconducting Y-Ba-Cu-O Films by the MOCVD Technique
- On the Reaction Kinetics in a Mercury Photosensitized CVD of a-Si:H Films
- A Numerical Study on Gaseous Reactions in Silane Pyrolysis
- Experimental Verification of Complex Dispersion Relation in Lossy Photonic Crystals
- A Two-Dimensional Simulation of Pulsed Discharge for a Color DC-Type Plasma Display Panel
- Direct Photochemical Vapor Deposition of Hydrogenated Amorphous Silicon : Effects of Excitation Wavelengths and Source Gases
- Excitation Mechanism of 3250 and 4416 Å Laser Lines in the Cataphoretic He-Cd Laser Discharge
- Dispersion and Absorption Studies on the Doubly-Excited 5p^2 ^3P_ States of CdI
- Absorption Cross Sections for the Autoionizing Transitions 5s5p ^3P_-5p^2 ^3P_2 of CdI
- Measurement of Collision Broadening of Resonance Lines of Calcium Ion by a Low-Resolution Spectrometer
- Behavior of F Atoms and CF_2 Radicals in Fluorocarbon Plasmas for SiO_2/Si Etching
- Observation of Coulomb-Crystal Formation from Carbon Particles Grown in a Methane Plasma
- Electron Attachment Mass Spectrometry for the Detection of Electronegative Species in a Plasma
- Angle Resolved Mass Spectrometry of Positive Ions Transmitted through High Aspect Ratio Channels in a Radio Frequency Discharge
- Oscillator Strengths and Rare-Gas-Induced Broadening of the Principal Series Lines of Ba
- Measurements of Oscillator Strengths for the Transitions from the Metastable ^3P Levels of Alkaline-Earth Atoms.IV.Calcium : High-n Members
- Measurements of Oscillator Strengths for the Transitions from the Metastable ^3P Levels of Alkaline-Earth Atoms.III.Calcium-Low-n Members
- Rare-Gas-Induced Broadening of Ca Principal Series Lines
- Collision Broadening of Principal Series Lines of Calcium in the Presence of Helium
- Collision Broadening of Pfincipal Series Lines of Calcium in the Presence of Krypton
- Calculation of the Output Power of the Argon-Ion Laser Superimposed by a Magnetic Field
- Population Density and LTE of Excited Atoms in a Positive-Column Plasma I. : Calculation on Hydroegn
- Cubic Contribution to EPR of Mn^ in MgC1_2
- Electron Spin Resonance of Manganese in MgCl_2
- Measurement of Oscillator Strengths for Three Lines among the 4s4p ^3P-4p^2 ^3P Multiplet of Zn I
- Monte-Carlo Simulation of Surface Reactions in Plasma-Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Thin Films
- Interaction between Dielectric Barrier Discharge and Positive Streamer in Helium Plasma Jet at Atmospheric Pressure
- F-centers in LiCl Crystals
- Spectroscopic Studies on Helium Plasma Heated by Reflected Shock in T-Tube
- Mode Change Observed on Spatial Distribution of Microplasma Emission in a Microdischarge Cell with a Floating Electrode
- Extreme Ultraviolet Emission and Ionization O-ions in a Linear Z-Pinch Helium Plasma
- A New Grazing Incidence Spectrometer and Extreme Ultraviolet Spectra of Light Impurity Ions in Linear Pinch Plasmas
- Ion Impact Energy Distributions and Properties of Amorphous Hydrogenated Carbon Thin Films Deposited in a Self-Biased RF Discharge
- High Speed Deposition of SiO2 Films with Plasma Jet Based on Capillary Dielectric Barrier Discharge at Atmospheric Pressure
- Behavior of N2+ Ions in He Microplasma Jet at Atmospheric Pressure Measured by Laser Induced Fluorescence Spectroscopy
- The Optical Absorption of Localized Exciton in KCl-KI Crystal
- Optical Absorption of Localized Exciton in KCl:I and NaCl:I Single Crystals
- Paramagnetic Resonance Spectrum of Manganese in Single Crystals of Alkali Halide Grown from the Melt
- Current Status of Microplasma Research
- Analysis of Product Species in Capacitively Coupled C_5F_8 Plasma by Electron Attachment Mass Spectroscopy
- Collision Broadening of Principal Series Lines of Barium in the Presence of Krypton
- Collision-Induced Dipole Transitions Associated with High-Lying States. : I. Absorption Studies of Barium in Rare Gases
- Collision-Induced Dipole Transitions Associated with High-Lying States of Calcium in Rare Gases
- Absorption Studies of the Collision-Induced Dipole Transitions (4s-3d and 4s-5d) of Calcium in Rare Gases
- Optical Bleaching of R-bands in LiF Crystals
- Analysis of Spherical Carbon Particle Growth in Methane Plasma by Mie-Scattering Ellipsometry ( Plasma Processing)
- Interferometric Measurement of Large Values of Number Density of Metal Vapor in Heat Pipes
- Mie-Scattering Ellipsometry for Analysis of Particle Behaviors in Processing Plasmas
- In Situ Ellipsometric Monitoring of the Growth of Polycrystalline Silicon Thin Films by RF Plasma Chemical Vapor Deposition ( Plasma Processing)
- Reduction of Copper Oxide Thin Films with Hydrogen Plasma Generated by a Dielectric-Barrier Glow Discharge
- Line Broadening Measurement in High Density Plasma : I. H_α and H_β
- Line Broadening Measurement in High Density Plasma. : II. Neutral Helium Lines
- Stepwise Excitation and Local Thermodynamic Equilibrium on Excited Hydrogen Levels in Helium-Hydrogen Plasma behind Shock Front
- Plasma Copolymerization of C6F6/C5F8 for Application of Low-Dielectric-Constant Fluorinated Amorphous Carbon Films and Its Gas-Phase Diagnostics Using In Situ Fourier Transform Infrared Spectroscopy
- Rotational Analysis of Second-Positive Emissions in a N_2-SF_6 Laser
- 材料プロセス用フルオロカーボンプラズマに関する基礎研究の進展 5.Polymerization in Fluorocarbon Plasmas
- Measurement of the Formation and Dissociation Rates of CsXe Excimers
- Detection of H Atoms in RF-Discharge SiH_4, CH_4 and H_2 Plasmas by Two-Photon Absorption Laser-Induced Fluorescence Spectroscopy ( Plasma Processing)
- Thickness Dependence of H Radical Treatment of Si Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition Using SiF_4/SiH_4/H_2 Gases
- Population Density and LTE of Excited Atoms in a Positive-Column Plasma. : II. Measurement on Argon
- Construction and Performance of a Fourier-Transform Infrared Phase-Modulated Ellipsometer for In-Process Surface Diagnostics
- Measurement of Oscillator strengths of CdI 5s5p ^3P_-5p^2^3P_ by the Hook Method
- Application of Dye Laser to the Hook Method on the Population Measurement of Excited He and Ne Atoms in the Pulsed Discharge
- Ultraviolet Laser Oscillations of Multiply Ionized Ions in Z-Pinch Discharge
- Plasma Enhanced Chemical Vapor Deposition of Fluorinated Amorphous Carbon Films on the Surface with Reverse Tapered Microstructures
- Microplasma-Induced Deformation of an Anomalous Response Spectrum of Electromagnetic Waves Propagating along Periodically Perforated Metal Plates
- Enhancement of Optical Emission by Floating Electrodes in a Planar Microdischarge Cell
- Spatiotemporal Surface Charge Measurement in Two Types of Dielectric Barrier Discharges Using Pockels Effect
- Quantum Chemical Study on Decomposition and Polymer Deposition in Perfluorocarbon Plasmas: Molecular Orbital Calculations of Excited States of Perfluorocarbons
- A Plasma Source Using Waves in a Lower Hybrid Frequency Range
- A Set of De-Excitation Rate Coefficients for the 3s ^3P_2 and ^3P_1 Levels of Neon
- Angle Resolved Mass Spectrometry of Positive Ions Transmitted through High Aspect Ratio Channels in a Radio Frequency Discharge
- Microplasma Array Serving as Photonic Crystals and Plasmon Chains
- A Study on Radical Fluxes in Silane Plasma CVD from Trench Coverage Analysis
- The Necessity of Radicals for Gene Transfection by Discharge Plasma Irradiation