Direct Photochemical Vapor Deposition of Hydrogenated Amorphous Silicon : Effects of Excitation Wavelengths and Source Gases
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-04-15
著者
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WANG Yun
Department of Medicine and Science in Sports and Exercise, Tohoku University Graduate School of Medi
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Tachibana Kunihide
Department of Electronic Science and Engineering, Kyoto University
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Nakajima Shigeki
Department Of Electrical Engineering Faculty Of Science And Technology Kinki University
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Tachibana Kunihide
Department Of Electronic Science And Engineering Kyoto University
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Tachibana Kunihide
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Nakajima Sadanojo
Department Of Electrical And Electronic Engineering The University Of Tokushinna
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Wang Yun
Department Of Electronics And Information Science Kyoto Institute Of Technology
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SHIRAFUJI Tatsuru
Department of Electronics and Information Science, Kyoto Institute of Technology
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Wang Yun
Department Of Chemistry Northwest Normal University
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Nakajima S
Ntt Electronics Corp.
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NAKAJIMA Sagara
Department of Electronics and Information Science, Kyoto Institute of Technology
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GENJI Takeshi
Department of Electronics and Information Science, Kyoto Institute of Technology
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Nogiwa Seiji
Optical Measurement Technology Development Co. Ltd.:ando Electric Co. Ltd.
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Genji Takeshi
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Shirafuji T
Kyoto Univ. Kyoto Jpn
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Shirafuji Tatsuru
Department Of Electrical Engineering Kyoto University
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Wang Yun
Department Of Anesthesiology Huashan Hospital Fudan University
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