Itoh Hitoshi | Technology Development Center Tokyo Electron Ltd.

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概要

• 同名の論文著者
• Technology Development Center Tokyo Electron Ltd.の論文著者

関連著者

• Itoh Hitoshi

  Technology Development Center Tokyo Electron Ltd.

• KONDO Hiroki

  Graduate School of Engineering, Nagoya University

• Hori Masaru

  Graduate School Of Engineering Nagoya University

• Takeda Keigo

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• Ishikawa Kenji

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• Toyoda Hirotaka

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• Kubota Yusuke

  Technology Development Center, Tokyo Electron Ltd., Tsukuba, Ibaraki 305-0841, Japan

• Kashiwagi Yusaku

  Technology Development Center, Tokyo Electron Ltd., Tsukuba, Ibaraki 305-0841, Japan

• Koike Junichi

  Department Of Materials Science Tohoku University

• Koike Junichi

  Department Of Materials Science Graduate School Of Engineering Tohokuuniversity

• NEISHI Koji

  Department of Materials Science and Engineering, Faculty of Engineering, Kyushu University

• MATSUMOTO Kenji

  Technology Development Center, Tokyo Electron Ltd.

• ITOH Hitoshi

  Technology Development Center, Tokyo Electron Ltd.

• SATO Hiroshi

  Technology Development Center, Tokyo Electron Ltd.

• HOSAKA Shigetoshi

  Technology Development Center, Tokyo Electron Ltd.

• Neishi Koji

  Department Of Materials Science Tohoku University

• Neishi Koji

  Department Of Materials Science And Engineering Faculty Of Engineering Kyushu University

• Hosaka Shigetoshi

  Technology Development Center Tokyo Electron Ltd.

• Matsumoto Kenji

  Technology Development Center Tokyo Electron Ltd.

• Matsumoto Kenji

  Technical Laboratory Citizen Watch Co. Ltd.

• Sato Hiroshi

  Technology Development Center, Tokyo Electron AT Limited

• Hori Masaru

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

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著作論文

• Chemical Vapor Deposition of Mn and Mn Oxide and their Step Coverage and Diffusion Barrier Properties on Patterned Interconnect Structures
• High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System
• High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)

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