Ishikawa Kenji | Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

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概要

• Ishikawa Kenjiの詳細を見る
• 同名の論文著者
• Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japanの論文著者

関連著者

• KONDO Hiroki

  Graduate School of Engineering, Nagoya University

• Hori Masaru

  Graduate School Of Engineering Nagoya University

• Ishikawa Kenji

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• Takeda Keigo

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• Sekine Makoto

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• Toyoda Hirotaka

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• Itoh Hitoshi

  Technology Development Center Tokyo Electron Ltd.

• Hori Masaru

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• Kubota Yusuke

  Technology Development Center, Tokyo Electron Ltd., Tsukuba, Ibaraki 305-0841, Japan

• Kashiwagi Yusaku

  Technology Development Center, Tokyo Electron Ltd., Tsukuba, Ibaraki 305-0841, Japan

• Kometani Ryosuke

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• KANO Hiroyuki

  NU Eco-Engineering Co., Ltd.

• Den Shoji

  Katagiri Engineering Co. Ltd.

• Chen Shang

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• Kang Song-Yun

  Corporate Development Division, Tokyo Electron Ltd., Nirasaki, Yamanashi 407-0192, Japan

• Sawada Ikuo

  Corporate Development Division, Tokyo Electron Ltd., Nirasaki, Yamanashi 407-0192, Japan

• Takeuchi Takuya

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• Amasaki Shinpei

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• Kano Hiroyuki

  NU Eco Engineering Co., Ltd., Miyoshi, Aichi 470-0201, Japan

• Kondo Hiroki

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• Ito Azumi

  Research & Development Center, ZEON Corporation, Kawasaki 210-9507, Japan

• Hayashi Toshio

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• Miyawaki Yudai

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• Kondo Yusuke

  Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• Yamazaki Atsuyo

  Research & Development Center, ZEON Corporation, Kawasaki 210-9507, Japan

• Matsumoto Hirokazu

  Research & Development Center, ZEON Corporation, Kawasaki 210-9507, Japan

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著作論文

• Behaviors of Absolute Densities of N, H, and NH3 at Remote Region of High-Density Radical Source Employing N2--H2 Mixture Plasmas
• Impacts of CF+, CF2+, CF3+, and Ar Ion Beam Bombardment with Energies of 100 and 400 eV on Surface Modification of Photoresist
• Highly Selective Etching of SiO2 over Si3N4 and Si in Capacitively Coupled Plasma Employing C5HF7 Gas
• A High-Temperature Nitrogen Plasma Etching for Preserving Smooth and Stoichiometric GaN Surface
• High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System
• High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
• A High-Temperature Nitrogen Plasma Etching for Preserving Smooth and Stoichiometric GaN Surface

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