Chemical Vapor Deposition of Mn and Mn Oxide and their Step Coverage and Diffusion Barrier Properties on Patterned Interconnect Structures
スポンサーリンク
概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2009-03-25
著者
-
Koike Junichi
Department Of Materials Science Tohoku University
-
Koike Junichi
Department Of Materials Science Graduate School Of Engineering Tohokuuniversity
-
NEISHI Koji
Department of Materials Science and Engineering, Faculty of Engineering, Kyushu University
-
MATSUMOTO Kenji
Technology Development Center, Tokyo Electron Ltd.
-
ITOH Hitoshi
Technology Development Center, Tokyo Electron Ltd.
-
SATO Hiroshi
Technology Development Center, Tokyo Electron Ltd.
-
HOSAKA Shigetoshi
Technology Development Center, Tokyo Electron Ltd.
-
Neishi Koji
Department Of Materials Science Tohoku University
-
Neishi Koji
Department Of Materials Science And Engineering Faculty Of Engineering Kyushu University
-
Hosaka Shigetoshi
Technology Development Center Tokyo Electron Ltd.
-
Itoh Hitoshi
Technology Development Center Tokyo Electron Ltd.
-
Matsumoto Kenji
Technology Development Center Tokyo Electron Ltd.
-
Matsumoto Kenji
Technical Laboratory Citizen Watch Co. Ltd.
-
Sato Hiroshi
Technology Development Center, Tokyo Electron AT Limited
関連論文
- Effect of Heat Treatment on the Hardness of Ti-Mo-N Films Deposited by RF Reactive Magnetron Sputtering
- Epitaxial Growth of SrRuO_3 Thin Film Electrode on Si by Pulsed Laser Deposition
- Fabrication of Pseudocubic SrRuO_3 (100) Epitaxial Thin Films on Si by Pulsed Laser Deposition : Surfaces, Interfaces, and Films
- Microstructural Investigation of Pulsed-Laser-Deposited SrRuO_3 Films on Si with SrO Buffer Layers : Semiconductors
- Development of Severe Torsion Straining Process for Rapid Continuous Grain Refinement
- Chemical Vapor Deposition of Mn and Mn Oxide and their Step Coverage and Diffusion Barrier Properties on Patterned Interconnect Structures
- Low-Temperature Superplasticity in Aluminum Alloys Processed by Equal-Channel Angular Pressing
- Formation of Slit-Like Voids at Trench Corners of Damascene Cu Interconnects
- Halide Vapor Phase Epitaxy of Mg_xZn_O Layers on Zn-Polar ZnO Substrates
- Selective Formation of a SnO2 Cap Layer, Its Growth Behavior, and Oxidation Resistance
- Influence of Crystal Orientation of Ru Under-Layer on Initial Growth of Copper Chemical Vapor Deposition
- Joint Transform Correlator Using a Phase Only Spatial Light Modulator (OPTICAL COMPUTING 1)
- Characterization of Chemically Vapor Deposited Manganese Barrier Layers Using X-ray Absorption Fine Structure
- Evaluation of Interface Adhesion Strength in Cu/(Ta–$x$% N, Ta/TaN)/SiO2/Si by Nanoscratch Test
- Material Consideration on Ta, Mo, Ru, and Os as Glue Layer for Ultra Large Scale Integration Cu Interconnects
- Simultaneous Formation of a Metallic Mn Layer and a MnO
- High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System
- High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
- Finite Element Method Analysis of Nanoscratch Test for the Evaluation of Interface Adhesion Strength in Cu Thin Films on Si Substrate
- Simultaneous Formation of a Metallic Mn Layer and a MnO