Sekine Makoto | Department Of Electrical Engineering And Computer Science Nagoya University
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概要
関連著者
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Hori Masaru
Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ
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Sekine Makoto
Department Of Electrical Engineering And Computer Science Nagoya University
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Kondo Hiroki
Deparment Of Physics Saga University
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Takeda Keigo
Department of Electric Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Ishikawa Kenji
Department of Earth and Space Science, Graduate School of Science, Osaka University, 1-1 Machikaneyama, Toyonaka, Osaka 560-0043, Japan
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Hiramatsu Mineo
Department Of Electrical And Electronic Engineering Meijo University
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Hori Masaru
Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ
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Ishikawa Kenji
Department Of Electrical Engineering And Computer Science Nagoya University
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Kano Hiroyuki
NU Eco Engineering Co., Ltd., Miyoshi, Aichi 470-0201, Japan
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Miyawaki Yudai
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
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Kondo Hiroki
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Kondo Yusuke
Department Cardiovascular Science and Medicine, Chiba University Graduate School of Medicine
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Hori Masaru
Department Of Quantum Engineering Nagoya University
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SEKINE Makoto
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya Un
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Shiratani Masaharu
Department Of Electoronics Kyushu University
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Kano Hiroyuki
Graduate School Of Engineering Nagoya University
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KANO Hiroyuki
NU Eco-Engineering Co., Ltd.
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Takeda Keigo
Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ
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Setsuhara Yuichi
Joining And Welding Research Institute Osaka University
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Kondo Hiroki
Department Of Electrical Engineering And Computer Science Nagoya University
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Sekine Makoto
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Sekine Makoto
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
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Nagahata Kazunori
Semiconductor Technology Development Division, SBG, CPDG, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Ishikawa Kenji
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
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Kondo Yusuke
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
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Matsugai Hiroyasu
Semiconductor Technology Development Division, Advanced Device Technology Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Honda Takahiro
Semiconductor Technology Development Division, Advanced Device Technology Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Tatsumi Tetsuya
Semiconductor Technology Development Division, Advanced Device Technology Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Fukasawa Masanaga
Semiconductor Technology Development Division, Advanced Device Technology Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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KONDO Hiroki
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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Hori Masaru
Department Of Electrical Engineering And Computer Science Nagoya University
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TAKEDA Keigo
Department of Quantum Engineering, Nagoya University
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Hori Masaru
Department Of Electronical Engineering And Computer Science Graduate School Of Engineering Nagoya Un
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SHIRATANI Masaharu
Department of Electrical Engineering, Faculty of Engineering, Kyushu University
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MOON Chang
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya Un
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SETSUHARA Yuichi
Joining and Welding Research Institute, Osaka University
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Shiratani Masaharu
Department Of Electronics Graduate School Of Information Science And Electrical Engineering Kyushu U
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Moon Chang
Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ
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Toyoda Hirotaka
Department Of Electrical Engineering And Computer Science Nagoya University
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Den Shoji
Katagiri Engineering Co. Ltd.
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Kondo Shingo
Department Of Electrical Engineering And Computer Science Nagoya University
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Koga Kazunori
Department Of Advanced Energy Engineering Sciences Interdisciplinary Graduate School Of Engineering
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Sekine Makoto
Nagoya Univ. Nagoya Jpn
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Kuroda Hiroki
Department Of Education (sciences) Shizuoka University
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YAMAKAWA Koji
Katagiri Engineering Co., Ltd.
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Hara Yasuhiro
Research Center For Nanodevices And Systems Hiroshima University
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Ito Masafumi
Department Of Electrical And Electronic Engineering Faculty Of Science And Technology Meijo Universi
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Abe Yusuke
Department Of Electrical Engineering And Computer Science Nagoya University
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Ishikawa Kenji
Department Of Materials Science And Engineering Nagoya Institute Of Technology
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Yamaguchi Tsuyoshi
Department Of Applied Physics Faculty Of Engineering Shizuoka University
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Watanabe Hitoshi
Department Of Agricultural Chemistry Faculty Of Agriculture The University Of Tokyo
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Yamamoto Hiroshi
Departmemt Of Chemical Engineering University Of Tokyo
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UCHIDA Giichiro
Department of Electric and Electronics Graduate School of Information Science and Electrical Enginee
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Kondo Yusuke
Department Of Public Health Shimane University Faculty Of Medicine
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Hagino Tatsuya
Department Of Electrical Engineering And Computer Science Nagoya University
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Hara Yasuhiro
Research Center For Ultra-precision Science And Technology Graduate School Of Engineering Osaka University
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Yamakawa Koji
Katagiri Engineering Co. Ltd.
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Ohta Takayuki
Department Of Electrical And Electronic Engineering Faculty Of Science And Technology Meijo University
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Kimura Tetsuya
Department of Biochemistry, Faculty of Pharmaceutical Sciences, Niigata University of Pharmacy and Applied Life Sciences
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Okumura Katsuya
Octec Corporation, Shinjuku, Tokyo 160-0011, Japan
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Hattori Kei
Device Process Development Center, Corporate R&D Center, Toshiba Corporation, Yokohama 235-8522, Japan
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Osato Masaaki
Technical Development Department, Components Division, Ebara Corporation, Fujisawa, Kanagawa 251-8502, Japan
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Maeda Takeshi
Corporate Fine Ceramics Group, Kyocera Corporation, Kyoto 612-8501, Japan
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Minami Masaki
Process Design Department, Semiconductor Technology Development Division, Core Device Development Group, R&D Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Takeda Keigo
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
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Takeda Keigo
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Takeda Keigo
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Fukasawa Masanaga
Semiconductor Technology Development Division, Core Device Development Group, R&D Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Fukasawa Masanaga
Process Design Department, Semiconductor Technology Development Division, Core Device Development Group, R&D Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Sekine Makoto
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Inui Hirotoshi
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
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Yoshida Naofumi
Fuji Machine Mfg. Co., Ltd., Chiryu, Aichi 472-8686, Japan
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Matsugai Hiroyasu
Process Design Department, Semiconductor Technology Development Division, Core Device Development Group, R&D Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Honda Takayoshi
Process Design Department, Semiconductor Technology Development Division, Core Device Development Group, R&D Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Uesawa Fumikatsu
Process Design Department, Semiconductor Technology Development Division, Core Device Development Group, R&D Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Tatsumi Tetsuya
Process Design Department, Semiconductor Technology Development Division, Core Device Development Group, R&D Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Inui Hirotoshi
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Inui Hirotoshi
Department of Electrical and Electronic Engineering, Graduate School of Science and Technology, Meijo University, Nagoya 468-8502, Japan
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Honda Takayoshi
Process Design Department, Semiconductor Technology Development Division, Core Device Development Group, R&D Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Matsugai Hiroyasu
Process Design Department, Semiconductor Technology Development Division, Core Device Development Group, R&D Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Matsuzaki Hidefumi
Department of Electronics, Kyushu University, Fukuoka 819-0395, Japan
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Uesawa Fumikatsu
Semiconductor Technology Development Division, Core Device Development Group, R&D Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Uesawa Fumikatsu
Process Design Department, Semiconductor Technology Development Division, Core Device Development Group, R&D Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Ohta Takayuki
Department of Chemistry, Graduate School of Science, The University of Tokyo
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Tatsumi Tetsuya
Semiconductor Technology Development Division, Core Device Development Group, R&D Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Tatsumi Tetsuya
Process Design Department, Semiconductor Technology Development Division, Core Device Development Group, R&D Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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Hattori Kei
Device Process Development Center, Corporate R&D Center, Toshiba Corporation, Yokohama 235-8522, Japan
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Abe Yusuke
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Kano Hiroyuki
NU Eco-Engineering Co., Ltd., Miyoshi, Aichi 470-0201, Japan
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YAMASHITA Daisuke
Department of Food Science and Technology, Faculty of Agriculture, Kyoto University
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Ishikawa Kenji
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Kondo Hiroki
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
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KONDO Shingo
Department of Chemistry and Chemical Biology, Faculty of Engineering,Gunma University
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Kuroda Hiroki
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Koga Kazunori
Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Urakawa Tatsuya
Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Torigoe Ryuhei
Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Uchida Giichiro
Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Shiratani Masaharu
Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Kawashima Sho
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Hori Masaru
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Yamashita Daisuke
Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Horibe Takeyoshi
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Uesawa Fumikatsu
Semiconductor Technology Development Division, Advanced Device Technology Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan
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TATSUMI Tetsuya
Semiconductor Technology Development Division, Advanced Device Technology Platform, Sony Corporation
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Koshimizu Chishio
Tokyo Electron AT Ltd., Nirasaki, Yamanashi 107-848, Japan
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ABE Yusuke
Department of Biomedical Engineering, Graduate School of Medicine, The University of Tokyo
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HORIBE Takeyoshi
Department of Electrical Engineering and Computer Science, Nagoya University
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KONDO Hiroki
Department of Electrical Engineering and Computer Science, Nagoya University
著作論文
- Combinatorial Plasma Etching Process
- Spatial distributions of electron, CF, and CF2 radical densities and gas temperature in DC-superposed dual-frequency capacitively coupled plasma etch reactor employing cyclic-C4F8/N2/Ar gas
- Critical Factors for Nucleation and Vertical Growth of Two Dimensional Nano-Graphene Sheets Employing a Novel Ar^+ Beam with Hydrogen and Fluorocarbon Radical Injection
- Measurement of Hydrogen Radical Density and Its Impact on Reduction of Copper Oxide in Atmospheric-Pressure Remote Plasma Using H2 and Ar Mixture Gases
- Dependence of Surface-Loss Probability of Hydrogen Atom on Pressures in Very High Frequency Parallel-Plate Capacitively Coupled Plasma
- Control of Super Hydrophobic and Super Hydrophilic Surfaces of Carbon Nanowalls Using Atmospheric Pressure Plasma Treatments (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
- Nitriding of Polymer by Low Energy Nitrogen Neutral Beam Source
- Ultrahigh-Speed Synthesis of Nanographene Using Alcohol In-Liquid Plasma
- Feature Profiles on Plasma Etch of Organic Films by a Temporal Control of Radical Densities and Real-Time Monitoring of Substrate Temperature
- Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation
- High-Performance Decomposition and Fixation of Dry Etching Exhaust Perfluoro-Compound Gases and Study of Their Mechanism
- H2/N2 Plasma Etching Rate of Carbon Films Deposited by H-Assisted Plasma Chemical Vapor Deposition
- Wavelength Dependence of Photon-Induced Interface Defects in Hydrogenated Silicon Nitride/Si Structure during Plasma Etching Processes
- Supercritical Fluid Deposition of High-Density Nanoparticles of Photocatalytic TiO
- Wavelength Dependence of Photon-Induced Interface Defects in Hydrogenated Silicon Nitride/Si Structure during Plasma Etching Processes (Special Issue : Dry Process)
- Supercritical Fluid Deposition of High-Density Nanoparticles of Photocatalytic TiO_2 on Carbon Nanowalls