Critical Factors for Nucleation and Vertical Growth of Two Dimensional Nano-Graphene Sheets Employing a Novel Ar^+ Beam with Hydrogen and Fluorocarbon Radical Injection

スポンサーリンク

概要

• 論文の詳細を見る
• Japan Society of Applied Physicsの論文
• 2010-04-25

著者

• KONDO Hiroki

  Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University

• Hori Masaru

  Department Of Quantum Engineering Nagoya University

• Hori Masaru

  Department Of Electrical Engineering And Computer Science Nagoya University

• Hiramatsu Mineo

  Department Of Electrical And Electronic Engineering Meijo University

• Kondo Hiroki

  Deparment Of Physics Saga University

• Hori Masaru

  Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ

• SEKINE Makoto

  Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya Un

• Kano Hiroyuki

  Graduate School Of Engineering Nagoya University

• Kondo Shingo

  Department Of Electrical Engineering And Computer Science Nagoya University

• Sekine Makoto

  Department Of Electrical Engineering And Computer Science Nagoya University

• Kondo Hiroki

  Department Of Electrical Engineering And Computer Science Nagoya University

• Hori Masaru

  Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ

• KONDO Shingo

  Department of Chemistry and Chemical Biology, Faculty of Engineering,Gunma University

関連論文

• Growth and Energy Bandgap Formation of Silicon Nitride Films in Radical Nitridation
• Behavior of Local Current Leakage in Stressed Gate SiO_2 Films Analyzed by Conductive Atomic Force Microscopy
• Detection and Characterization of Stress-Induced Defects in Gate SiO_2 Films by Conductive Atomic Force Microscopy
• Growth of Silicon Nanocrystal Dots with High Number Density by Ultra-High-Vacuum Chemical Vapor Deposition
• Conductive Atomic Force Microscopy Analysis for Local Electrical Characteristics in Stressed SiO_2 Gate Films
• Microscopic Analysis of Stress-Induced Leakage Current in Stressed Gate SiO_2 Films Using Conductive Atomic Force Microscopy
• Fabrication and Evaluation of Floating Gate Memories with Surface-Nitrided Si Nanocrystals
• Conductance Oscillations in Hopping Conduction Systems Fabricated by Focused Ion Beam Implantation ( Quantum Dot Structures)
• Surface Treatment of Ge(001) Surface by Radical Nitridation
• Conductance Oscillations in Low-Dimensional Ion Implanted Regions Annealed by Rapid Thermal Annealing
• Fabrication of Carbon Nanowalls Using Novel Plasma Processing
• Growth of Carbon Nanotubes by Microwave-excited Non-Equilibrium Atmospheric-Pressure Plasma
• Diamond Film Formation by OH Radical Injection from Remote Microwave H_2/H_2O Plasma into Parallel-Plate RF Methanol Plasma
• High-Rate Anisotropic Ablation and Deposition of Polytetrafluoroethylene Using Synchrotron Radiation Process
• Synthesis of Diamond Using RF Magnetron Methanol Plasma Chemical Vapor Deposition Assisted by Hydrogen Radical Injection
• High-Rate Growth of Films of Dense, Aligned Double-Walled Carbon Nanotubes Using Microwave Plasma-Enhanced Chemical Vapor Deposition
• Fabrication of Dense Carbon Nanotube Films Using Microwave Plasma-Enhanced Chemical Vapor Deposition
• Study on the Absolute Density and Translational Temperature of Si Atoms in Very High Frequency Capacitively Coupled SiH_4 Plasma with Ar, N_2, and H_2 Dilution Gases
• A Novel Silicon-Dioxide Etching Process Employing Pulse-Modulated Electron-Beam-Excited Plasma
• Effects of Ar Dilution and Exciting Frequency on Absolute Density and Translational Temperature of Si Atom in Very High Frequency-Capacitively Coupled SiH_4 Plasmas
• Effects of Driving Frequency on the Translational Temperature and Absolute Density of Si Atoms in Very High Frequency Capacitively Coupled SiF_4 Plasmas
• Development of Compact C_2F_4 Gas Supply Equipment and Its Application to Etching of Dielectrics in an Environmental Benign Process
• RKKY Interaction and Kondo Effect in (Ce,La) PdSn
• Photoisomerizable DNA Ligands. Spectral and Electrochemical Properties and Base-Pair Selectivity of Binding of Bis[2-(1-alkylpyridinium-4-yl)vinyl]benzen Dyes
• Low-k SiOCH Film Etching Process and Its Diagnostics Employing Ar/C_5F_O/N_2 Plasma
• Octave Spanning High Quality Super Continuum Generation Using 10nJ and 104fs High Energy Ultrashort Soliton Pulse
• Combinatorial Plasma Etching Process
• Synthesis of Platinum Nanoparticles on Two-Dimensional Carbon Nanostructures with an Ultrahigh Aspect Ratio Employing Supercritical Fluid Chemical Vapor Deposition Process
• Control of Electric Conduction of Carbon Nanowalls
• Electrical Characterization of Carbon Nanowalls
• Implementation of a Handwriting Interface for Mathematical Expression Input/Edit
• Java Based On-line Handwriting Interface for Mathematical Expression and Its Character Recognition Performance
• Improved Performance of Discharge-Pumped XeCl Laser Using Ar/He Diluent
• High Performance of Silicon Oxide Selective Etching Using F_2 Gas and Graphite Instead of Perfluorinated Compound Gases
• Diamond Deposition and Behavior of Atomic Carbon Species in a Low-Pressure Inductively Coupled Plasma
• Behaviors of carbon atom density in hydrocarbon and fluorocarbon plasmas
• Measurement of Einstein's A Coefficient of the 296.7 nm Transition Line of the Carbon Atom
• Measurement of Carbon Atom Density in High Density Plasma Process
• Genotyping of the Human Lipoprotein Lipase Gene by Ferrocenylnaphthalene Diimide-based Electrochemical Hybridization Assay
• Direct Detection of Single Nucleotide Polymorphism (SNP) with Genomic DNA by the Ferrocenylnaphthalene Diimide-based Electrochemical Hybridization Assay (FND-EHA)
• Electrochemical Detection of Base Pair Mutation
• フェロセン化ナフタレンジイミド誘導体の電気化学とそのヘアピンDNA修飾電極での挙動
• Enhanced Electron Transfer from Glucose Oxidase to DNA-Immobilized Electrode Aided by Ferrocenyl Naphthalene Diimide, a Threading Intercalator
• Fabrication of Multilayered SiOCH Films with Low Dielectric Constant Employing Layer-by-Layer Process of Plasma Enhanced Chemical Vapor Deposition and Oxidation
• Effects of Oxygen and Nitrogen Atoms on SiOCH Film Etching in Ultrahigh-Frequency Plasma
• Plasma Induced Subsurface Reactions for Anisotropic Etching of Organic Low Dielectric Film Employing N_2 and H_2 Gas Chemistry
• Synthesis of Polytetrafluoroethylene-like Films by a Novel Plasma Enhanced Chemical Vapor Deposition Employing Solid Material Evaporation Technique
• CH_3 Radical Density in Electron Cyclotron Resonance CH_3OH and CH_3OH/H_2 Plasmas
• Evaluation of CF_2 Radical as a Precursor for Fluorocarbon Film Formation in Highly Selective SiO_2 Etching Process Using Radical Injection Technique
• CF_X (X=1-3) Radical Measurements in ECR Etching Plasma Employing C_4F_8 Gas by Infrared Diode Laser Absorption Spectroscopy
• Characteristics of Fluorocarbon Radicals and CHF_3 Molecule in CHF_3 Electron Cyclotron Resonance Downstream Plasma
• CF_X(X=1-3) Radicals Controlled by On-Off Modulated Electron Cyclotron Resonance Plasma and Their Effects on Polymer Film Deposition ( Plasma Processing)
• Cleaning of Glass Disk in Oxygen Plasma by Using Compact Electron-Beam-Excited Plasma Source
• Number of Constituents in a Proton, the Diffractive Excitation and the Chou-Yang Model
• Spatial distributions of electron, CF, and CF2 radical densities and gas temperature in DC-superposed dual-frequency capacitively coupled plasma etch reactor employing cyclic-C4F8/N2/Ar gas
• The Enhancement of the Δ(1232) Width
• A Confining Potential Model for a Quark Core and Its Surrounding Pion Clouds : Particles and Fields
• Silicon Oxide Selective Etching Employing Dual Frequency Superimposed Magnetron Sputtering of Carbon Using F_2/Ar Gases
• Atmospheric Pressure Fluorocarbon-Particle Plasma Chemical Vapor Deposition for Hydrophobic Film Coating
• Coulomb Blockade Phenomena in Si Metal-Oxide-Semiconductor Field-Effect Transistors with Nano-Scale Channels Fabricated Using Focused-Ion Beam Implantation
• Measurement of Spatial Distribution of SiF_4 and SiF_2 Densities in High Density SiF_4 Plasma Using Single-Path Infrared Diode Laser Absorption Spectroscopy and Laser-Induced Fluorescence Technique
• Spatial Distribution Measurement of Absolute Densities of CF and CF_2 Radicals in a High Density Plasma Reactor Using a Combination of Single-Path Infrared Diode Laser Absorption Spectroscopy and Laser-Induced Fluorescence Technique
• Critical Factors for Nucleation and Vertical Growth of Two Dimensional Nano-Graphene Sheets Employing a Novel Ar^+ Beam with Hydrogen and Fluorocarbon Radical Injection
• Development and Characterization of a New Compact Microwave Radical Beam Source
• Roles of SiH_3 and SiH_2 Radicals in Particle Growth in rf Silane Plasmas
• Effects of Dilution Gases on Si Atoms and SiHx^^+ (X = 0-3) Ions in Electron Cyclotron Resonance SiH_4 Plasmas
• Measurements of the CF, CF_2 and CF_3 Radicals in a CHF_3 Electron Cyclotron Resonance Plasma
• Effect of Pr Valence State on Interfacial Structure and Electrical Properties of Pr Oxide/PrON/Ge Gate Stack Structure
• Deposition of Diamond-Like Carbon Using Compact Electron-Beam-Excited Plasma Source
• Investigation of Nitrogen Atoms in Low-Pressure Nitrogen Plasmas Using a Compact Electron-Beam-Excited Plasma Source
• Laser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet
• On the Lightlike Chiral Partner of π-Meson
• Analysis of Local Leakage Current of Pr-Oxide Thin Films with Conductive Atomic Force Microscopy
• Measurement of Hydrogen Radical Density and Its Impact on Reduction of Copper Oxide in Atmospheric-Pressure Remote Plasma Using H2 and Ar Mixture Gases
• Surface Loss Probability of Nitrogen Atom on Stainless-Steel in N2 Plasma Afterglow
• Control of Fluorocarbon Radicals by On-Off Modulated Electron Cyclotron Resonance Plasma
• A Note on the Leptonic Decays of Charmed Mesons
• Mixing Effect between Particles and Resonances
• Symmetry Breaking of the Chiral U(3)⊗U(3) and the Quark Model
• Nonlinear Realizations of Groups and Chiral Transformations in the Quark Model
• Single Pion Production in Low Energy Pion-Nucleon Scattering and Chiral Dynamics
• An Implementation of an Intelligent Tutoring System (ITS) on the World-Wide Web (WWW) : Individualized Tutoring Mechanism in the WWW Framework
• The Global Classroom Project
• Eigenstate Formalism for Single and Double Diffractive Excitation
• Geometrical Structure of Hadrons and Diffractive Eigenstates
• The Hyperfine Splitting of the Nucleon and the Δ_ and the Coulomb Spike Effect : Particles and Fields
• πN Scattering Lengths in the Skyrmion Model
• New Bound for Single and Double Diffraction Cross Sections in Identical Particle Collisions
• The Geometrical Shape of Hadronic Strings and Overlapping Functions
• On the Electromagnetic Interactions in the B and D Mesons and Their Structure : Particles and Fields
• Successive Magnetic Transitions in Candidate ``Idle-Spin'' System, Cu3(OH)4SO4
• Control of Super Hydrophobic and Super Hydrophilic Surfaces of Carbon Nanowalls Using Atmospheric Pressure Plasma Treatments (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
• Fabrication of Multilayered SiOCH Films with Low Dielectric Constant Employing Layer-by-Layer Process of Plasma Enhanced Chemical Vapor Deposition and Oxidation
• Nucleation Control of Carbon Nanowalls Using Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition
• Fabrication of Graphene-Based Films Using Microwave-Plasma-Enhanced Chemical Vapor Deposition
• Fabrication of Carbon Nanowalls on Carbon Fiber Paper for Fuel Cell Application
• Supercritical Fluid Deposition of High-Density Nanoparticles of Photocatalytic TiO
• Plasma Induced Subsurface Reactions for Anisotropic Etching of Organic Low Dielectric Film Employing N2 and H2 Gas Chemistry
• Effects of Oxygen and Nitrogen Atoms on SiOCH Film Etching in Ultrahigh-Frequency Plasma
• Supercritical Fluid Deposition of High-Density Nanoparticles of Photocatalytic TiO_2 on Carbon Nanowalls

もっと見る 閉じる

スポンサーリンク