Fabrication of Multilayered SiOCH Films with Low Dielectric Constant Employing Layer-by-Layer Process of Plasma Enhanced Chemical Vapor Deposition and Oxidation
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-05-15
著者
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Fujii Toshiaki
Department of Information Electronics Graduate School of Engineering, Nagoya University
-
Hori Masaru
Department Of Quantum Engineering Nagoya University
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Hori M
Department Of Quantum Engineering Graduate School Of Engineering Nagoya University
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Hiramatsu Mineo
Department Of Electrical And Electronic Engineering Meijo University
-
GOTO Toshio
Department of Quantum Engineering, Nagoya University
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NAGAI Hisao
Department of Quantum Engineering, Nagoya University
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