Fabrication of Dense Carbon Nanotube Films Using Microwave Plasma-Enhanced Chemical Vapor Deposition
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-02-15
著者
-
Hori Masaru
Department Of Quantum Engineering Nagoya University
-
Hori Masaru
Department Of Electrical Engineering And Computer Science Nagoya University
-
HIRAMATSU Mineo
Nano Factory, Department of Electrical and Electronic Engineering, Meijo University
-
Hiramatsu Mineo
Nano Factory Department Of Electrical And Electronic Engineering Meijo University
-
TANIGUCHI Masaki
NanoFactory, Department of Materials Science and Engineering, Meijo University
-
NAGAO Hidetoshi
NanoFactory, Department of Materials Science and Engineering, Meijo University
-
ANDO Yoshinori
NanoFactory, Department of Materials Science and Engineering, Meijo University
-
Taniguchi Masateru
The Institute Of Scientific And Industrial Research Osaka University
-
Taniguchi Masaki
Nanofactory Department Of Materials Science And Engineering Meijo University
関連論文
- Growth and Energy Bandgap Formation of Silicon Nitride Films in Radical Nitridation
- Fabrication of Carbon Nanowalls Using Novel Plasma Processing
- Infrared spectroscopy on poly(dG)-poly(dC) DNA at low hydration
- Growth of Carbon Nanotubes by Microwave-excited Non-Equilibrium Atmospheric-Pressure Plasma
- Diamond Film Formation by OH Radical Injection from Remote Microwave H_2/H_2O Plasma into Parallel-Plate RF Methanol Plasma
- High-Rate Anisotropic Ablation and Deposition of Polytetrafluoroethylene Using Synchrotron Radiation Process
- Synthesis of Diamond Using RF Magnetron Methanol Plasma Chemical Vapor Deposition Assisted by Hydrogen Radical Injection
- High-Rate Growth of Films of Dense, Aligned Double-Walled Carbon Nanotubes Using Microwave Plasma-Enhanced Chemical Vapor Deposition
- Fabrication of Dense Carbon Nanotube Films Using Microwave Plasma-Enhanced Chemical Vapor Deposition
- Study on the Absolute Density and Translational Temperature of Si Atoms in Very High Frequency Capacitively Coupled SiH_4 Plasma with Ar, N_2, and H_2 Dilution Gases
- A Novel Silicon-Dioxide Etching Process Employing Pulse-Modulated Electron-Beam-Excited Plasma
- Effects of Ar Dilution and Exciting Frequency on Absolute Density and Translational Temperature of Si Atom in Very High Frequency-Capacitively Coupled SiH_4 Plasmas
- Effects of Driving Frequency on the Translational Temperature and Absolute Density of Si Atoms in Very High Frequency Capacitively Coupled SiF_4 Plasmas
- Development of Compact C_2F_4 Gas Supply Equipment and Its Application to Etching of Dielectrics in an Environmental Benign Process
- Low-k SiOCH Film Etching Process and Its Diagnostics Employing Ar/C_5F_O/N_2 Plasma
- Octave Spanning High Quality Super Continuum Generation Using 10nJ and 104fs High Energy Ultrashort Soliton Pulse
- Combinatorial Plasma Etching Process
- Synthesis of Platinum Nanoparticles on Two-Dimensional Carbon Nanostructures with an Ultrahigh Aspect Ratio Employing Supercritical Fluid Chemical Vapor Deposition Process
- Control of Electric Conduction of Carbon Nanowalls
- Electrical Characterization of Carbon Nanowalls
- Selective Adsorption of DNA onto SiO_2 Surface in SiO_2/SiH Pattern
- Electrical Properties of Poly(dA)・Poly(dT) and Poly(dG)・Poly(dC) DNA
- Humidity Dependence of Electrical Resistivity in Poly(dG)・Poly(dC) DNA Thin Film
- Hydration Effects on the Microwave Dielectricity in Dry Poly(dA)-Poly(dT) DNA(Cross-disciplinary physics and related areas of science and technology)
- Measurement Environment Dependency of Single Molecule Conductance
- High Performance of Silicon Oxide Selective Etching Using F_2 Gas and Graphite Instead of Perfluorinated Compound Gases
- Diamond Deposition and Behavior of Atomic Carbon Species in a Low-Pressure Inductively Coupled Plasma
- Behaviors of carbon atom density in hydrocarbon and fluorocarbon plasmas
- Measurement of Einstein's A Coefficient of the 296.7 nm Transition Line of the Carbon Atom
- Measurement of Carbon Atom Density in High Density Plasma Process
- Fabrication of Multilayered SiOCH Films with Low Dielectric Constant Employing Layer-by-Layer Process of Plasma Enhanced Chemical Vapor Deposition and Oxidation
- Effects of Oxygen and Nitrogen Atoms on SiOCH Film Etching in Ultrahigh-Frequency Plasma
- Plasma Induced Subsurface Reactions for Anisotropic Etching of Organic Low Dielectric Film Employing N_2 and H_2 Gas Chemistry
- Synthesis of Polytetrafluoroethylene-like Films by a Novel Plasma Enhanced Chemical Vapor Deposition Employing Solid Material Evaporation Technique
- CH_3 Radical Density in Electron Cyclotron Resonance CH_3OH and CH_3OH/H_2 Plasmas
- Evaluation of CF_2 Radical as a Precursor for Fluorocarbon Film Formation in Highly Selective SiO_2 Etching Process Using Radical Injection Technique
- CF_X (X=1-3) Radical Measurements in ECR Etching Plasma Employing C_4F_8 Gas by Infrared Diode Laser Absorption Spectroscopy
- Characteristics of Fluorocarbon Radicals and CHF_3 Molecule in CHF_3 Electron Cyclotron Resonance Downstream Plasma
- CF_X(X=1-3) Radicals Controlled by On-Off Modulated Electron Cyclotron Resonance Plasma and Their Effects on Polymer Film Deposition ( Plasma Processing)
- Cleaning of Glass Disk in Oxygen Plasma by Using Compact Electron-Beam-Excited Plasma Source
- Silicon Oxide Selective Etching Employing Dual Frequency Superimposed Magnetron Sputtering of Carbon Using F_2/Ar Gases
- Atmospheric Pressure Fluorocarbon-Particle Plasma Chemical Vapor Deposition for Hydrophobic Film Coating
- Measurement of Spatial Distribution of SiF_4 and SiF_2 Densities in High Density SiF_4 Plasma Using Single-Path Infrared Diode Laser Absorption Spectroscopy and Laser-Induced Fluorescence Technique
- Spatial Distribution Measurement of Absolute Densities of CF and CF_2 Radicals in a High Density Plasma Reactor Using a Combination of Single-Path Infrared Diode Laser Absorption Spectroscopy and Laser-Induced Fluorescence Technique
- Critical Factors for Nucleation and Vertical Growth of Two Dimensional Nano-Graphene Sheets Employing a Novel Ar^+ Beam with Hydrogen and Fluorocarbon Radical Injection
- Development and Characterization of a New Compact Microwave Radical Beam Source
- Roles of SiH_3 and SiH_2 Radicals in Particle Growth in rf Silane Plasmas
- Effects of Dilution Gases on Si Atoms and SiHx^^+ (X = 0-3) Ions in Electron Cyclotron Resonance SiH_4 Plasmas
- Measurements of the CF, CF_2 and CF_3 Radicals in a CHF_3 Electron Cyclotron Resonance Plasma
- Deposition of Diamond-Like Carbon Using Compact Electron-Beam-Excited Plasma Source
- Investigation of Nitrogen Atoms in Low-Pressure Nitrogen Plasmas Using a Compact Electron-Beam-Excited Plasma Source
- Control of Fluorocarbon Radicals by On-Off Modulated Electron Cyclotron Resonance Plasma
- Selective Adsorption of DNA onto SiO2 Surface in SiO2/SiH Pattern
- Aligned Growth of Single-Walled and Double-Walled Carbon Nanotube Films by Control of Catalyst Preparation
- High-Rate Growth of Films of Dense, Aligned Double-Walled Carbon Nanotubes Using Microwave Plasma-Enhanced Chemical Vapor Deposition
- Fabrication of Dense Carbon Nanotube Films Using Microwave Plasma-Enhanced Chemical Vapor Deposition
- Growth of Carbon Nanotubes by Microwave-excited Non-Equilibrium Atmospheric-Pressure Plasma
- Fabrication of Carbon Nanowalls Using Novel Plasma Processing