Selective Adsorption of DNA onto SiO2 Surface in SiO2/SiH Pattern
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概要
- 論文の詳細を見る
Deoxyribonucleic acid (DNA) molecules can be selectively adsorbed onto a SiO2 surface in SiO2/SiH pattern, fabricated using photolithography, by adding MgCl2 to a DNA solution. Since DNA molecules can be adsorbed onto a Si substrate through Mg2+, the adsorption of DNA molecules in a SiO2/SiH pattern is influenced by the concentration of MgCl2 and the difference in chemical property between a SiO2 surface and a SiH surface. The optimum concentration of MgCl2 at which DNA molecules are selectively adsorbed onto a SiO2 surface was 0.1 mM.
- 2004-10-15
著者
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Kawai Tomoji
The Institute Of Science And Industrial Research (isir-sanken) Osaka University
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Taniguchi Masateru
The Institute Of Scientific And Industrial Research Osaka University
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Tanaka Shin-ichi
The Institute Of Scientific And Industrial Research Osaka University
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Taniguchi Masateru
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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TANIGUCHI Masateru
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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