High-Rate Anisotropic Ablation and Deposition of Polytetrafluoroethylene Using Synchrotron Radiation Process

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-12-15

著者

• Ikeda Makoto

  Faculty Of Technology Tokyo University Of Agriculture And Technology

• Hori Masaru

  Department Of Quantum Engineering Nagoya University

• Hiramatsu M

  Nano Factory Graduate School Of Science And Technology Meijo University

• Hiramatsu Mineo

  Department Of Electrical And Electronic Engineering Meijo University

• Ikeda M

  Sony Corporation Research Center

• GOTO Toshio

  Department of Quantum Engineering, Nagoya University

• IKEDA Masanobu

  Department of Quantum Engineering, School of Engineering, Nagoya University

• INAYOSHI Muneto

  Department of Quantum Engineering, School of Engineering, Nagoya University

• HIRAYA Atsunari

  Institute for Molecular Science

• Ikeda M

  Tdk Electronic Device Business Group Akita Jpn

• Ikeda Masanobu

  Department Of Clinical Laboratories Saku Central Hospital

• Hori Masaru

  Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ

• Hiramatsu Makoto

  Memory Products Business Promotion Center Canon Inc.

• Inayoshi Muneto

  Department Of Quantum Engineering School Of Engineering Nagoya Univeristy

• Hiraya A

  Institute For Molecular Science

• Ito M

  Wakayama Univ. Wakayama Jpn

• Ikeda M

  Toshiba Corp. Yokohama Jpn

• Ikeda M

  Toshiba Corp. Kawasaki Jpn

• Goto Toshio

  Department Of Electronics Faculty Of Engineering Nagoya University

• 後藤 俊夫

  Imram Tohoku University

• Hiramatsu M

  Toshiba Corp. Yokohama Jpn

• Goto Toshio

  Department Of Electronic Mechanical Engineering Nagoya University

• GOTO Toshio

  Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University

• Inayoshi Muneto

  Department of Electrical Engineering, Hiroshima University

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