Control of Fluorocarbon Radicals by On-Off Modulated Electron Cyclotron Resonance Plasma
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概要
- 論文の詳細を見る
The CF, CF_2 and CF_3 radical densities were investigated using infrared diode laser absorption spectroscopy (IRLAS) in a CHF_3 electron cyclotron resonance (ECR) plasma with varying on-off period of the microwave source, as well as continuous wave (CW). The ratio of CF and CF_2 radical densities to CF_3 radical density was suecessfully controlled through variation of the duty cycle in a constant pulse width, together with the deposition rate of fluorocarbon films. Furthermore, the radical densities were discussed in comparison with intensities of emission lines F^*, Ar^* and H_α.
- 社団法人応用物理学会の論文
- 1993-08-01
著者
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Takahashi K
National Inst. Res. In Inorganic Materials Ibaraki Jpn
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Hori Masaru
Department Of Quantum Engineering Nagoya University
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GOTO Toshio
Department of Quantum Engineering, Nagoya University
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Hori Masaru
Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ
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Takahashi K
Department Of Physical Electronics Tokyo Institute Of Tecnology
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Takahashi K
Tokyo Inst. Technol. Yokohama Jpn
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Takahashi Kuniharu
Graduate School Of Science And Technology Niigata University
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Takahashi Kouchiro
National Institute For Research In Inorganic Materials
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TAKAHASHI Kunimasa
Department of Quantum Engineering, School of Engineering, Nagoya Univeristy
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Goto Toshio
Department Of Electronics Faculty Of Engineering Nagoya University
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Goto Toshio
Department Of Electronic Mechanical Engineering Nagoya University
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TAKAHASHI Kenji
Semiconductor Research Laboratory, Pioneer Electronic Corporation
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GOTO Toshio
Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University
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