CF_3, CF_2 and CF Radical Measurements in RF CHF_3 Etching Plasma Using Infrared Diode Laser Absorption Spectroscopy (<Special Issue> Plasma Processing)

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-07-30

著者

• OHTSU Yasunori

  Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Sag

• Maruyama Kenji

  Telecommunications Advncement Organization Of Japan Sendai Research Center:graduate School Of Materi

• GOTO Toshio

  Department of Quantum Engineering, Nagoya University

• Ohtsu Yasunori

  Department Of Electrical Engineering Saga University

• Ohtsu Yasunori

  Department Of Electrical & Electronic Engineering Saga University

• Maruyama K

  Telecommunications Advncement Organization Of Japan Sendai Research Center:graduate School Of Materi

• MARUYAMA Koji

  Department of Quantum Engineering, Nagoya University

• OHKOUCHI Katsunori

  Department of Information Electronics, Nagoya University

• Maruyama Kei-ichi

  Faculty Of Science And Technology Science University Of Tokyo

• Ohkouchi Katsunori

  Department Of Information Electronics Nagoya University

• Goto Toshio

  Department Of Electronics Faculty Of Engineering Nagoya University

• Maruyama Koji

  Department Of Aerospace Engineering Osaka Prefecture University

• Goto Toshio

  Department Of Electronic Mechanical Engineering Nagoya University

• GOTO Toshio

  Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University

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