Low-k SiOCH Film Etching Process and Its Diagnostics Employing Ar/C_5F_<10>O/N_2 Plasma
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概要
- 論文の詳細を見る
- 2006-09-15
著者
-
HAYASHI Takayuki
Department of Physics, Tokyo Metropolitan University
-
Hori Masaru
Department Of Quantum Engineering Nagoya University
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NAGAI Mikio
Department of Quantum Engineering, Nagoya University
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OKAMOTO Hidekazu
Asahi Glass Co., Ltd.
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