Effects of Oxygen and Nitrogen Atoms on SiOCH Film Etching in Ultrahigh-Frequency Plasma
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2003-03-15
著者
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Hori Masaru
Department Of Quantum Engineering Nagoya University
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Hori M
Department Of Quantum Engineering Graduate School Of Engineering Nagoya University
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Hiramatsu Mineo
Department Of Electrical And Electronic Engineering Meijo University
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GOTO Toshio
Department of Quantum Engineering, Nagoya University
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Hori Masaru
Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ
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NAGAI Hisao
Department of Quantum Engineering, Nagoya University
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MAEDA Yoritsugu
Department of Quantum Engineering, Nogoya University
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Nagai Hisao
Department Of Quantum Engineering Nagoya University
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Nagai Hisao
Department Of Chemistry College Of Humanities And Sciences Nihon University
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Goto T
Department Of Quantum Engineering Nagoya University
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Goto T
Department Of Quantum Engineering Graduate School Of Engineering Nagoya University
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Goto Toshio
Department Of Electronics Faculty Of Engineering Nagoya University
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Maeda Yoritsugu
Department Of Quantum Engineering Nogoya University
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Goto Toshio
Department Of Electronic Mechanical Engineering Nagoya University
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GOTO Toshio
Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University
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HIRAMATSU Mineo
Department of Electrical and Electronic Engineering, Meijo University
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