NAGAI Hisao | Department of Quantum Engineering, Nagoya University
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概要
関連著者
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NAGAI Hisao
Department of Quantum Engineering, Nagoya University
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Hori Masaru
Department Of Quantum Engineering Nagoya University
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Hori M
Department Of Quantum Engineering Graduate School Of Engineering Nagoya University
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Hiramatsu Mineo
Department Of Electrical And Electronic Engineering Meijo University
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GOTO Toshio
Department of Quantum Engineering, Nagoya University
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Nagai Hisao
Department Of Chemistry College Of Humanities And Sciences Nihon University
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Hori Masaru
Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ
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Nagai Hisao
Department Of Quantum Engineering Nagoya University
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Goto T
Department Of Quantum Engineering Nagoya University
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Goto T
Department Of Quantum Engineering Graduate School Of Engineering Nagoya University
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Goto Toshio
Department Of Electronics Faculty Of Engineering Nagoya University
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Goto Toshio
Department Of Electronic Mechanical Engineering Nagoya University
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GOTO Toshio
Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University
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HIRAMATSU Mineo
Department of Electrical and Electronic Engineering, Meijo University
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Fujii Toshiaki
Department of Information Electronics Graduate School of Engineering, Nagoya University
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MAEDA Yoritsugu
Department of Quantum Engineering, Nogoya University
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HONDA Masatake
Department of Chemistry, College of Humanities and Sciences, Nihon University
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YONEDA Shigekazu
Department of Chemistry, College of Humanities and Sciences, Nihon University
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Honda M
Australian National Univ. Act Aus
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Yoneda S
National Sci. Museum Tokyo Jpn
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Yoneda Shigekazu
Departmen T Of Science And Engineering National Science Museum
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Maeda Yoritsugu
Department Of Quantum Engineering Nogoya University
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Yoneda Shigekazu
Department Of Chemistry College Of Humanities And Sciences Nihon University
著作論文
- Fabrication of Multilayered SiOCH Films with Low Dielectric Constant Employing Layer-by-Layer Process of Plasma Enhanced Chemical Vapor Deposition and Oxidation
- Effects of Oxygen and Nitrogen Atoms on SiOCH Film Etching in Ultrahigh-Frequency Plasma
- Plasma Induced Subsurface Reactions for Anisotropic Etching of Organic Low Dielectric Film Employing N_2 and H_2 Gas Chemistry
- Determination for natural yttrium along with rare earths by neutron activation