Measurement of Hydrogen Radical Density and Its Impact on Reduction of Copper Oxide in Atmospheric-Pressure Remote Plasma Using H2 and Ar Mixture Gases
スポンサーリンク
概要
- 論文の詳細を見る
A 60 Hz alternating current excited atmospheric-pressure plasma with an ultrahigh electron density of over $10^{16}$ cm-3 employing H2/Ar [$\aku p(\text{H$_{2}$})/p(\text{H$_{2}$}+\text{Ar})$ 1--3%] gases was used to reduce copper oxides on copper. The remote plasma reduced CuO and Cu2O at room temperature. The ground-state hydrogen (H) radical density in the atmospheric-pressure plasma was measured by vacuum ultraviolet absorption spectroscopy using a micro hollow cathode lamp. The ratio of reduction of amount of CuO flux to the H radical flux was determined from the measured H radical density and gas temperature.
- 2010-12-25
著者
-
Kondo Hiroki
Deparment Of Physics Saga University
-
Hori Masaru
Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ
-
KANO Hiroyuki
NU Eco-Engineering Co., Ltd.
-
Sekine Makoto
Department Of Electrical Engineering And Computer Science Nagoya University
-
Ishikawa Kenji
Department Of Electrical Engineering And Computer Science Nagoya University
-
Takeda Keigo
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
-
Takeda Keigo
Department of Electric Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
-
Sekine Makoto
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
-
Inui Hirotoshi
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
-
Yoshida Naofumi
Fuji Machine Mfg. Co., Ltd., Chiryu, Aichi 472-8686, Japan
-
Inui Hirotoshi
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
-
Inui Hirotoshi
Department of Electrical and Electronic Engineering, Graduate School of Science and Technology, Meijo University, Nagoya 468-8502, Japan
-
Ishikawa Kenji
Department of Earth and Space Science, Graduate School of Science, Osaka University, 1-1 Machikaneyama, Toyonaka, Osaka 560-0043, Japan
-
Kano Hiroyuki
NU Eco-Engineering Co., Ltd., Miyoshi, Aichi 470-0201, Japan
-
Kano Hiroyuki
NU Eco Engineering Co., Ltd., Miyoshi, Aichi 470-0201, Japan
-
Kondo Hiroki
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
関連論文
- Conductive Atomic Force Microscopy Analysis for Local Electrical Characteristics in Stressed SiO_2 Gate Films
- Conductance Oscillations in Hopping Conduction Systems Fabricated by Focused Ion Beam Implantation ( Quantum Dot Structures)
- Surface Treatment of Ge(001) Surface by Radical Nitridation
- Conductance Oscillations in Low-Dimensional Ion Implanted Regions Annealed by Rapid Thermal Annealing
- Diamond Film Formation by OH Radical Injection from Remote Microwave H_2/H_2O Plasma into Parallel-Plate RF Methanol Plasma
- High-Rate Anisotropic Ablation and Deposition of Polytetrafluoroethylene Using Synchrotron Radiation Process
- Synthesis of Diamond Using RF Magnetron Methanol Plasma Chemical Vapor Deposition Assisted by Hydrogen Radical Injection
- Effects of Ar Dilution and Exciting Frequency on Absolute Density and Translational Temperature of Si Atom in Very High Frequency-Capacitively Coupled SiH_4 Plasmas
- Development of Compact C_2F_4 Gas Supply Equipment and Its Application to Etching of Dielectrics in an Environmental Benign Process
- RKKY Interaction and Kondo Effect in (Ce,La) PdSn