Wavelength Dependence of Photon-Induced Interface Defects in Hydrogenated Silicon Nitride/Si Structure during Plasma Etching Processes (Special Issue : Dry Process)

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文

著者

• Kondo Hiroki

  Deparment Of Physics Saga University

• Hori Masaru

  Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ

• Sekine Makoto

  Department Of Electrical Engineering And Computer Science Nagoya University

• Takeda Keigo

  Department of Electric Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan

• Miyawaki Yudai

  Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

• Ishikawa Kenji

  Department of Earth and Space Science, Graduate School of Science, Osaka University, 1-1 Machikaneyama, Toyonaka, Osaka 560-0043, Japan

• Nagahata Kazunori

  Semiconductor Technology Development Division, SBG, CPDG, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan

• Matsugai Hiroyasu

  Semiconductor Technology Development Division, Advanced Device Technology Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan

• Honda Takahiro

  Semiconductor Technology Development Division, Advanced Device Technology Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan

• Tatsumi Tetsuya

  Semiconductor Technology Development Division, Advanced Device Technology Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan

• Fukasawa Masanaga

  Semiconductor Technology Development Division, Advanced Device Technology Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan

• Kondo Yusuke

  Department Cardiovascular Science and Medicine, Chiba University Graduate School of Medicine

• Uesawa Fumikatsu

  Semiconductor Technology Development Division, Advanced Device Technology Platform, Sony Corporation, Atsugi, Kanagawa 243-0014, Japan

• TATSUMI Tetsuya

  Semiconductor Technology Development Division, Advanced Device Technology Platform, Sony Corporation

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