Spatial distributions of electron, CF, and CF2 radical densities and gas temperature in DC-superposed dual-frequency capacitively coupled plasma etch reactor employing cyclic-C4F8/N2/Ar gas

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概要

• 論文の詳細を見る

著者

• Kondo Hiroki

  Deparment Of Physics Saga University

• Hori Masaru

  Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ

• Sekine Makoto

  Department Of Electrical Engineering And Computer Science Nagoya University

• Yamaguchi Tsuyoshi

  Department Of Applied Physics Faculty Of Engineering Shizuoka University

• Kimura Tetsuya

  Department of Biochemistry, Faculty of Pharmaceutical Sciences, Niigata University of Pharmacy and Applied Life Sciences

• Takeda Keigo

  Department of Electric Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan

• Ishikawa Kenji

  Department of Earth and Space Science, Graduate School of Science, Osaka University, 1-1 Machikaneyama, Toyonaka, Osaka 560-0043, Japan

• Koshimizu Chishio

  Tokyo Electron AT Ltd., Nirasaki, Yamanashi 107-848, Japan

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