Toyoda Hirotaka | Department Of Electrical Engineering And Computer Science Nagoya University

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著作論文

Dependences of Giant Magnetoresistance in Co/Cu Multilayers on Sputtering Conditions
Electron-Impact Dissociation of Methane into CH_3 and CH_2 Radicals : II. Absolute Cross Sections
Electron-Impact Dissociation of Methane into CH_3 and CH_2 Radicals : I. Relative Cross Sections
Dissociative Ion Yields on Metal Surfaces Bombarded with Low-Energy Fluorocarbon Ions
Observation of Ion Scattering from Metal Surfaces Bombarded with Low-Energy Hydrocarbon Ions
Generation of a Large Electron Beam for Plasma Processing
Formation of CH Radical by Surface Bombardment in a Methane/Argon DC Discharge
RF Plasma Production at Ultralow Pressures with Surface Magnetic Confinement
Wall Heating Effect on Crystallization of Low-Temperature Deposited Silicon Films from an Inductuvely-Coupled Plasma
Lower Temperature Deposition of Polycrystalline Silicon Films from a Modified Inductively Coupled Silane Plasma
LOW-TEMPERATURE FORMATION OF poly-Si FILMS BY INDUCTIVELY-COUPLED SILANE PLASMA
Drastic Change in CF_2 and CF_3 Kinetics Induced by Hydrogen Addition into CF_4 Etching Plasma
Spatial Distribution and Surface Loss of CF_3 and CF_2 Radicals in a CF_4 Etching Plasma
Radial Density Profile of Microwave Plasma for Wall Conditioning in a Purely Toroidal Magnetic Field (小特集粒子・熱制御とプラズマ対向材料研究の進展--IEA/TEXTOR共同研究の成果と現状)
High Speed Cleaning of Boronized Wall with a CF_4 Containing Plasma
Rapid Cleaning of Boronized Walls with a Chlorine/Hydrogen Glow Discharge
Lower-Temperature Growth of Hydrogenated Amorphous Silicon Films from Inductively Coupled Silane Plasma
Simple Direct Monitoring of SiH_3 Radical and Particulates in a Silane Plasma with Ultraviolet Transmission Spectroscopy
Cross Section Measurements for Electron-Impact Dissociation of CHF_3 into Neutral and Ionic Radicals
Cross Sections for Electron-Impact Dissociation of Alternative Etching Gas, C_3HF_7O
Cross Section Measurements for Electron-Impact Dissociation of C_4F_8 into Neutral and Ionic Radicals
Effect of O- Ion Beam Irradiation during RF-Magnetron Sputtering on Characteristics of CoFeB--MgO Magnetic Tunnel Junctions
Spatial Profile Measurement of SiH3 Radical Flux in SiH4/H2 Microwave Plasma by Modified Appearance Mass Spectrometry
Novel Antenna Coupler Design for Production of Meter-Scale High-Density Planar Surface Wave Plasma
Low Temperature Growth of Amorphous and Polycrystalline Silicon Films from a Modified Inductively Coupled Plasma
Effect of Sputtering Deposition Process on Magnetic Properties of Magnetic Multilayers
Nitriding of Polymer by Low Energy Nitrogen Neutral Beam Source
Suppression of Oxygen Impurity Incorporation into Silicon Films Prepared from Surface-Wave Excited H2/SiH4 Plasma
Suppression of High-Energy Backscattered Particles in Magnetron Plasma Using Cylindrical Cathode
Dependences of Giant Magnetoresistance in Co/Cu Multilayers on Sputtering Conditions
Cross Section Measurements for Electron-Impact Dissociation of C 4F 8 into Neutral and Ionic Radicals
Influence of Oxygen Addition and Wafer Bias Voltage on Bromine Atom Surface Reaction in a HBr/Ar Inductively Coupled Plasma
Influence of Oxygen Addition and Wafer Bias Voltage on Bromine Atom Surface Reaction in a HBr/Ar Inductively Coupled Plasma (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
Hydrogen Release and Retention Dynamics of Amorphous Carbon Layers Exposed to a Hydrogen/Helium Plasma

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