Temperature and Density of CF Radicals in 60 MHz Capacitively Coupled Fluorocarbon Gas Plasma
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概要
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Both optical emission spectroscopy and infrared diode laser absorption spectroscopy were applied to measurements of rotational temperatures of CF radicals in 60 MHz capacitively coupled CF4 and CF4/Ar plasmas. The rotational temperature of CF radicals in the excited state was determined by fitting the optical emission spectra with the calculation results. The calculation for emission spectra was performed using two different rotational constant value of $A=0.76$ and 4.48 for the B$^{2}\Delta$ state, and then the constant $A$ was evaluated to be 0.76 from the emission intensities. In the CF4 plasma, the CF rotational temperature was increased from 300 to 380 K as the 60 MHz power was increased from 300 to 1500 W, and the radical density was increased from $1.59\times 10^{12}$ to $5.05\times 10^{12}$ cm-3. On the other hand, in the CF4/Ar plasma, the CF rotational temperature was increased by 20 K with the power, and the radical density was constant at $1.1\times 10^{12}$ cm-3. It was found that the rotational temperatures of CF radicals in the excited state were in equilibrium with those in the ground state under the present conditions.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-03-15
著者
-
Nagai Mikio
Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ
-
Hori Masaru
Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ
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