Uehara Tsuyoshi | Sekisui Chemical Co. Ltd.
スポンサーリンク
概要
関連著者
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Uehara Tsuyoshi
Sekisui Chemical Co. Ltd.
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ASHIDA Atsushi
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University
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Fujimura Norifumi
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
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Yoshimura Takeshi
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
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SAKUMA Yoshiki
National Institute for Materials Science
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Sakuma Yoshiki
National Inst. Materials Sci.(nims) Tsukuba Jpn
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CHIKYOW Toyohiro
National Institute for Mateirals Science
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KITAHATA Hiroya
Sekisui Chemical Co., Ltd.
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Hori Masaru
Department Of Electrical Engineering And Computer Science Graduate School Of Engineering Nagoya Univ
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Suemitsu Maki
Center For Interdisciplinary Research Tohoku University
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Nagata Takahiro
Advanced Electronic Materials Center National Institute For Materials Science (nims)
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Nagata Takahiro
National Institute For Materials Science (nims)
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Toyoshima Yasutake
Center For Interdisciplinary Research Tohoku University
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Sakuma Yoshiki
National Institute For Materials Science (nims)
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Sakuma Yoshiki
Nanomaterials Laboratory National Institute For Materials Science
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UEHARA Tsuyoshi
Sekisui Chemical Co., Ltd.
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Chikyow Toyohiro
National Institute For Materials Science (nims)
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Hayakawa Ryoma
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
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Nakajima Setsuo
Sekisui Chemicals Co. Ltd.
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Ito Masafumi
Department Of Electrical And Electronic Engineering Faculty Of Science And Technology Meijo Universi
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Chikyow Toyohiro
National Inst. Materials Sci. Ibaraki Jpn
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Iwasaki Masahiro
Department Of Mechanical Engineering Doshisha University
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Haemori Masamitsu
Advanced Electronic Materials Center National Institute For Materials Science (nims)
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Ashida Atsushi
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
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Takeda Keigo
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Takeda Keigo
Department of Electric Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
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Fujimura Norifumi
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
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Hayakawa Ryoma
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
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Chikyow Toyohiro
Advanced Electric Materials Center, National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
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Anzai Junichiro
Sekisui Chemical Co., Ltd., Wadai, Tsukuba, Ibaraki 300-4292, Japan
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Nakae Mari
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
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Kitahata Hiroya
Sekisui Chemicals Co., Ltd., Wadai, Tsukuba, Ibaraki 300-4292, Japan
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Nagata Takahiro
Advanced Electric Materials Center, National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
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Nagata Takahiro
Advanced Electronic Materials Center, National Institute for Materials Science, Tsukuba, Ibaraki 305-0044, Japan
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Yara Takuya
Sekisui Chemical Co., Ltd., 32 Wadai, Tsukuba, Ibaraki 300-4292, Japan
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Haemori Masamitsu
Advanced Electronic Materials Center, National Institute for Materials Science, Tsukuba, Ibaraki 305-0044, Japan
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Haemori Masamitsu
Advanced Electric Materials Center, National Institute for Materials Science, Tsukuba, Ibaraki 305-0044, Japan
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Uehara Tsuyoshi
Sekisui Chemical Co., Ltd., 32 Wadai, Tsukuba, Ibaraki 300-4292, Japan
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Uehara Tsuyoshi
Sekisui Chemicals Co., Ltd., Wadai, Tsukuba, Ibaraki 300-4292, Japan
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Uehara Tsuyoshi
Sekisui Chemical Co., Ltd., Wadai, Tsukuba, Ibaraki 300-4292, Japan
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Kitabatake Hirotatsu
Center for Interdisciplinary Research, Tohoku University, Sendai 980-8578, Japan
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Iwasaki Masahiro
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Uehara Tsuyoshi
Sekisui Chemical Co., Ltd., Kyoto 601-8105, Japan
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Nose Yukinori
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, Sakai 599-8531, Japan
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Nakamura Tatsuru
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, Sakai 599-8531, Japan
著作論文
- GaN Film Fabrication by Near-Atmospheric Plasma-Assisted Chemical Vapor Deposition
- Effect of Low Level O2 Addition to N2 on Surface Cleaning by Nonequilibrium Atmospheric-Pressure Pulsed Remote Plasma
- Orientation Control of ZnO Films Deposited Using Nonequilibrium Atmospheric Pressure N2/O2 Plasma
- Surface Nitridation of $c$-Plane Sapphire Substrate by Near-Atmospheric Nitrogen Plasma
- Effect of Additional Oxygen on Formation of Silicon Oxynitride Using Nitrogen Plasma Generated near Atmospheric Pressure
- Incubation-Free Growth of Polycrystalline Si Films by Plasma-Enhanced Chemical Vapor Deposition Using Pulsed Discharge under Near Atmospheric Pressure