Hayakawa Ryoma | Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
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概要
- 同名の論文著者
- Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture Universityの論文著者
関連著者
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ASHIDA Atsushi
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University
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Fujimura Norifumi
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
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Hayakawa Ryoma
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
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Yoshimura Takeshi
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
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KITAHATA Hiroya
Sekisui Chemical Co., Ltd.
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Yuasa Motokazu
Sekisui Chemical Co. Ltd.
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Uehara Tsuyoshi
Sekisui Chemical Co. Ltd.
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Ashida Atsushi
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
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Fujimura Norifumi
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
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Fujimura Norifumi
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Sakai, Osaka 599-8531, Japan
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Hayakawa Ryoma
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
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Hayakawa Ryoma
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Sakai, Osaka 599-8531, Japan
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Nakae Mari
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
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Kitahata Hiroya
Sekisui Chemical Co., Ltd., 32 Wadai, Tsukuba, Ibaraki 300-4292, Japan
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Yuasa Motokazu
Sekisui Chemical Co., Ltd., 32 Wadai, Tsukuba, Ibaraki 300-4292, Japan
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Ashida Atushi
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Sakai, Osaka 599-8531, Japan
著作論文
- Formation of Silicon Oxynitride Films with Low Leakage Current Using N2/O2 Plasma near Atmospheric Pressure
- Effect of Additional Oxygen on Formation of Silicon Oxynitride Using Nitrogen Plasma Generated near Atmospheric Pressure