KITAHATA Hiroya | Sekisui Chemical Co., Ltd.
スポンサーリンク
概要
関連著者
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KITAHATA Hiroya
Sekisui Chemical Co., Ltd.
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HAYAKAWA Ryoma
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University
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YOSHIMURA Takeshi
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University
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ASHIDA Atushi
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University
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YUASA Motokazu
Sekisui Chemical Co., Ltd.
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FUJIMURA Norifumi
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University
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ASHIDA Atsushi
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University
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Kitahata Hiroya
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
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Suemitsu Maki
Center For Interdisciplinary Research Tohoku University
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Fujimura Norifumi
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
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Toyoshima Yasutake
Center For Interdisciplinary Research Tohoku University
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Hayakawa Ryoma
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
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Yuasa Motokazu
Sekisui Chemical Co. Ltd.
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Nakajima Setsuo
Sekisui Chemicals Co. Ltd.
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Yoshimura Takeshi
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
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Uehara Tsuyoshi
Sekisui Chemical Co. Ltd.
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Fujimura Norifumi
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Sakai, Osaka 599-8531, Japan
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Hayakawa Ryoma
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Sakai, Osaka 599-8531, Japan
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Kitahata Hiroya
Sekisui Chemical Co., Ltd., 32 Wadai, Tsukuba, Ibaraki 300-4292, Japan
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Kitahata Hiroya
Sekisui Chemicals Co., Ltd., Wadai, Tsukuba, Ibaraki 300-4292, Japan
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Yuasa Motokazu
Sekisui Chemical Co., Ltd., 32 Wadai, Tsukuba, Ibaraki 300-4292, Japan
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Ashida Atushi
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Sakai, Osaka 599-8531, Japan
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Uehara Tsuyoshi
Sekisui Chemicals Co., Ltd., Wadai, Tsukuba, Ibaraki 300-4292, Japan
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Kitabatake Hirotatsu
Center for Interdisciplinary Research, Tohoku University, Sendai 980-8578, Japan
著作論文
- Formation of Silicon Oxynitride Films with Low Leakage Current Using N_2/O_2 Plasma near Atmospheric Pressure
- Formation of Silicon Oxynitride Films with Low Leakage Current Using N2/O2 Plasma near Atmospheric Pressure
- Incubation-Free Growth of Polycrystalline Si Films by Plasma-Enhanced Chemical Vapor Deposition Using Pulsed Discharge under Near Atmospheric Pressure