Effects of Electrode Distance on Plasma Parameters and a-Si:H Film Properties in Plasma CVD Process
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概要
- 論文の詳細を見る
- 1997-12-15
著者
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Kondo Masafumi
Central Research Laboratories Charp Corporation
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MATSUDA Akihisa
Electrotechnical Laboratory
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Hayashi Ryo
Electrotechnical Laboratory
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Maemura Yoko
Faculty Of Engineering Nagasaki University
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Matsuda A
Department Of Electrical And Electronic Engineering Faculty Of Engineering Toyama University
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Kondo M
Department Of Health And Welfare Nishikyushu University
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Takagi T
Kyoto Univ. Kyoto Jpn
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TAKAGI Tomoko
Electrotechnical Laboratory
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KONDO Michio
Electrotechnical Laboratory
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FUJIYAMA Hiroshi
Faculty of Engineering Nagasaki University
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