Glow-Discharge Deposition of a-Si: H from Pure Si_2H_6 and Pure SiH_4
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概要
- 論文の詳細を見る
Optical emission spectroscopy and mass spectrometry have been employed as diagnostic tools for studying the glow discharge plasma of pure SiH_4 and pure Si_2H_6. It has been suggested that the dimeric species play an important role in the deposition of a-Si: H from Si_2H_6 glow discharge in contrast to the monomeric species of SiH dominant in the deposition from pure SiH_4. A large amount of hydrogen which is not bonded with Si is incorporated in a-Si: H films prepared from Si_2H_6 and this might be reflected in the dark and photoconductivity of the films.
- 社団法人応用物理学会の論文
- 1983-02-20
著者
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MATSUDA Akihisa
Electrotechnical Laboratory
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TANAKA Kazunobu
Electrotechnical Laboratory
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Matsuda A
Department Of Electrical And Electronic Engineering Faculty Of Engineering Toyama University
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KAGA Takao
Nissan Chemical
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TANAKA Hideo
DAINI-SEIKO SHA
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MALHOTRA Lalit
Indian Institute of Technology Delhi
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TANAKA Hideo
Electrotechnical Laboratory:(Present address)SEIKO Instruments and Electronics Ltd.
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