Itabashi N | Plasma Technology Laboratory Association Of Super-advanced Electronics Technologies(aset)
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概要
- 同名の論文著者
- Plasma Technology Laboratory Association Of Super-advanced Electronics Technologies(aset)の論文著者
関連著者
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Itabashi N
Plasma Technology Laboratory Association Of Super-advanced Electronics Technologies(aset)
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ITABASHI Naoshi
Central Research Laboratory, Hitachi, Ltd.
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YAMADA Chikashi
Institute for Laser Science, The University of Electro-Communications
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GOTO Toshio
Department of Quantum Engineering, Nagoya University
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HIROTA EIZI
Institute for Molecular Science
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ITABASHI Naoshi
Department of Electronics, Faculty of Engineering, Nagoya University
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NISHIWAKI Nobuki
Department of Electronics, Faculty of Engineering, Nagoya University
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Nishiwaki Nobuki
Department Of Electronics Faculty Of Engineering Nagoya University
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Goto Toshio
Department Of Electronics Faculty Of Engineering Nagoya University
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Hirota E
Guraduate Univ. Advanced Studies Yokohama
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Yamada Chikashi
Institute For Molecular Science
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Goto Toshio
Department Of Electronic Mechanical Engineering Nagoya University
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GOTO Toshio
Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University
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Yamamoto S
Univ. Tsukuba Ibaraki Jpn
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YAMAMOTO Seiji
Central Research Laboratory, Hitachi Ltd.
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OCHIAI Isao
Department of Physics,Faculty of Science,The University of Tokyo
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OCHIAI Isao
Central Research Laboratory, Hitachi, Ltd.
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Yamamoto Seiji
Central Research Laboratory Hitachi Ltd.
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Ochiai Isao
Central Research Laboratory Hitachi Ltd.
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Mochiji K
Joint Res. Center For Atom Technol. Angstrom Technol. Partnership(jrcat‐atp) Ibaraki Jpn
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Itabashi Naoshi
Central Research Laboratory Hitachi Ltd.
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Ochiai I
Central Research Laboratory Hitachi Ltd.
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MOCHIJI Kozo
Central Research Laboratory, Hitachi Ltd.
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Mochiji Kozo
Central Research Laboratory Hitachi Ltd.
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MAGANE Mitsuo
Department of Electronics, Faculty of Engineering, Nagoya University
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Magane Mitsuo
Department Of Electronics Faculty Of Engineering Nagoya University
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MATSUDA Akihisa
Electrotechnical Laboratory
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Inoue M
Department Of Electrical Engineering Osaka Prefectural Technical College
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Inoue M
Osaka Inst. Technol. Osaka Jpn
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Kato K
Shizuoka Johoku Senior High School Shizuoka Jpn
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Ogawa Tohru
Technology Strategy Development Sony Co. Core Technology & Network Company
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HIKOSAKA Yukinobu
Plasma Technology Laboratory, Association of Super-Advanced Electronics Technologies (ASET)
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NODA Shuichi
Plasma Technology Laboratory, Association of Super-Advanced Electronics Technologies (ASET)
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OKIGAWA Mitsuru
Plasma Technology Laboratory, Association of Super-Advanced Electronics Technologies (ASET)
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INOUE Masami
Plasma Technology Laboratory, Association of Super-Advanced Electronics Technologies (ASET)
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ONO Tetsuo
Kasado Works, Hitachi, Ltd
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Ono T
Osaka Univ. Osaka Jpn
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Matsuda A
Department Of Electrical And Electronic Engineering Faculty Of Engineering Toyama University
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KATO Kozo
Department of Electronics, Faculty of Engineering, Nagoya University
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Tatsumi Tetsuya
Plasma Technology Laboratory Association Of Super-advanced Electronics Technologies (aset)
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MORISHITA Satoshi
Plasma Technology Laboratory, Association of Super-Advanced Electronics Technologies (ASET)
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HAYASHI Hisataka
Plasma Technology Laboratory, Association of Super-Advanced Electronics Technologies (ASET)
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ITABASHI Naoshi
Plasma Technology Laboratory, Association of Super-advanced Electronics Technologies(ASET)
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OKUNO Kazuhiko
Department of Physics,Tokyo Metropolitan University
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MOCHIJI Kozou
Central Research Laboratory, Hitachi, Ltd.
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ONO Tetsuo
Central Research Laboratory, Hitachi, Ltd.
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OGAWA Tarou
Central Research Laboratory, Hitachi Ltd.
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LEE Kaidee
Department of Chemistry, State University of New York
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HANSON David
Department of Chemistry, State University of New York
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Naito Susumu
Department Of Electronics Faculty Of Engineering Nagoya University
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KINOSHITA Keizo
Plasma Technology Laboratory, Association of Super-Advanced Electronics Technologies(ASET)
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ITABSHI Naoshi
Plasma Technology Laboratory, Association of Super-Advanced Electronics Technologies(ASET)
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Hayashi H
Association Of Super-advanced Electronics Technologies (aset):(present Address)process & Manufac
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Lee Kaidee
Department Of Chemistry State University Of New York
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Ogawa Tarou
Central Research Laboratory Hitachi Ltd.
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Hanson David
Department Of Chemistry State University Of New York
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Kinoshita Keizo
Plasma Technology Laboratory Association Of Super-advanced Electronics Technologies(aset)
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Okuno Kazuhiko
Department Of Physics Faculty Of Science Tokyo Metropolitan University
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Ono Tetsuo
Central Research Laboratory Hitachi Ltd.
著作論文
- Mechanism of Radical Control in Capacitive RF Plasma for ULSI Processing
- Positive Charge Generation at a SiO_2/Si Interface due to Bombardment with Metastable Atoms
- Thermal and Ion-Induced Reactions on a Chlorine-Adsorbed GaAs (100) Surface Studied by Metastable-Atom De-excitation Electron Spectroscopy
- Surface Reaction Induced by Multiply-Charged Ions
- Photon-Stimulated Ion Desorption from Semiconductor Surfaces
- Monitoring of Electron Energy Distribution Change from Optical Emission for Nonmagnetic Ultrahigh-Frequency Plasma
- Measurements of the CF Radical in DC Pulsed CF_4/H_2 Discharge Plasma Using Infrared Diode Laser Absorption Spectroscopy
- Spatial Distribution of SiH_3 Radicals in RF Silane Plasma
- SiH_3 Radical Density in Pulsed Silane Plasma
- Diffusion Coefficient and Reaction Rate Constant of the SiH_3 Radical in Silane Plasma
- Measurement of the SiH_3 Radical Density in Silane Plasma using Infrared Diode Laser Absorption Spectroscopy : Techniques, Instrumentations and Measurement