Ogawa Tohru | Technology Strategy Development Sony Co. Core Technology & Network Company

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著作論文

平成21年度インターンシップ実施報告--一貫したキャリア教育を目指して
Pb(Mg1/3Nb2/3)03-PbTiO3単結晶での巨大横効果圧電性の組成依存
Application of Zirconium Silicon Oxide Films to an Attenuated Phase-Shifting Mask in ArF Lithography
Inhomogeneous substitution of polyhalogenated copperphthalocyanine studied by high-resolution imaging and electron crystallography
Measurement of Temperature Rise of Quartz Plate during Synchrotron Radiation Irradiation Using Infrared Camera(Instrumentation, Measurement, and Fabrication Technology)
Stabilization of ZrSi_xO_y Films by Irradiation with an ArF Excimer Laser
Fabrication of 0.1 μm Patterns Using an Alternating Phase Shift Mask in ArF Excimer Laser Lithography
Fabrication of 0.13-μm Device Patterns by Argon Fluoride Excimer Laser Lithography with Practical Resolution Enhancement Techniques
Hollow Density Profile on Electron Cyclotron Resonance Heating JFT-2M Plasma
Electron diffraction analysis of polymorph structures in ultra thin film of vanadyl phthalocyanine on KBr(001)
Wet-silylation Process for X-ray and EUV Lithographies
Positive Charge Generation at a SiO_2/Si Interface due to Bombardment with Metastable Atoms
Thermal and Ion-Induced Reactions on a Chlorine-Adsorbed GaAs (100) Surface Studied by Metastable-Atom De-excitation Electron Spectroscopy
Negative Tone Dry Development of Si-Containing Resists by Laser Ablation
X-Ray Lithography with a Wet-Silylated and Dry-Developed Resist
Prevention of Resist Pattern Collapse by Flood Exposure during Rinse Process
Simulation of Long-Range Contrast Modulation in Scanning Tunneling Microscope Image of Perylene-3,4,9,10-Tetraearboxylic-Dianhydride Monolayer on Graphite
Modeling of In-Plane Distortion of Extreme Ultraviolet Lithography Mask in Flat State
Thermal In-Plane Distortion Model of Mask for Extreme Ultraviolet Lithography during Periodic Scanning Exposure
Approach to Patterning of Extreme Ultraviolet Lithography Masks using Ru Buffer Layer : Surfaces, Interfaces, and Films
Thermal Behavior along Depth of Extreme Ultraviolet Lithography Mask during Dry Etching : Surfaces, Interfaces, and Films
Temperature Rise of Extreme Ultraviolet Lithography Mask Substrate during Dry Etching Process : Semiconductors
Estimation of Extreme Ultraviolet Power and Throughput for Extreme Ultraviolet Lithography
Theoretical Analysis of Placement Error due to Absorber Pattern on Extreme Ultraviolet Lithography Mask
Transmission Electron Microscopy Observation and Simulation Analysis of Defect-Smoothing Effect of Molybdenum/Silicon Multilayer Coating for Extreme Ultraviolet Lithography Masks
圧電単結晶Pb[(Zn1/3Nb2/3)0.91Ti0.09]O3の誘電・圧電・弾性定数とその温度特性
Poling Field Dependence of Ferroelectric Properties in Barium Titanate Ceramics
Passivation of Bulk and Surface Defects in GaAs Grown on Si Substrate by Radio Frequency Phosphine/Hydrogen Plasma Exposure : Semiconductors
教育関連報告今の若者は大学に何を求めているか?--問題発見と解決能力向上のツール(第3報)
Poling Field Dependence of Crystal Orientation and Ferroelectric Properties in Lead Titanate Ceramics
In-Situ Ellipsometric Observations of Thickness Change in the Layers of Ag/a-As_2S_3 Film System with Progression of Photodoping
Photon-Stimulated Ion Desorption Measurement of Organosilicon Resist Reactions in Extreme Ultraviolet Lithography
Photoluminescence Studies of Hydrogen-Passivated Al_Ga_As Grown on Si Substrate by Metalorganic Chemical Vapor Deposition
Volume Expansion and Ag Doping Amounts in the Photodoping Process in Amorphous As_2S_3
Approach to Next-Generation Optical Lithography
PZTセラミックスのバイポーラパルスによる分極処理
In-Situ Observation of Photodoping Process in a Chalcogenide Glass As_2S_3 by Ellipsometry
Poling Field Dependence of Ferroelectric Properties and Crystal Orientation in Rhombohedral Lead Zirconate Titanate Ceramics
Crystal Orientation of Tetragonal Lead Zirconate Titanate Ceramic Surface and Its Aging Behavior
Poling Field Dependence of Ferroelectric Domains in Tetragonal Lead Zirconate Titanate Ceramics

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