OKAZAKI Shinji | ASET EUVL Laboratory
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概要
関連著者
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OKAZAKI Shinji
ASET EUVL Laboratory
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Okazaki S
Aset Euvl Laboratory
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Okazaki S
Japan Broadcasting Corp. Tokyo Jpn
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OKAZAKI Shinji
Central Research Laboratory, Hitacti, Ltd.
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Okazaki Shinji
Central Research Lab. Hitachi Ltd.
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Chiba Akira
Aset (association Of Super-advanced Electronics Technologies) Euv Process Technology Research Labora
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Ogawa T
Faculty Of Engineering Takushoku University
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Ogawa Tohru
Technology Strategy Development Sony Co. Core Technology & Network Company
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Ogawa Tetsuya
Institute For Chemical Research Kyoto University
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CHIBA Akio
Waseda University
著作論文
- Measurement of Temperature Rise of Quartz Plate during Synchrotron Radiation Irradiation Using Infrared Camera(Instrumentation, Measurement, and Fabrication Technology)
- Modeling of In-Plane Distortion of Extreme Ultraviolet Lithography Mask in Flat State
- Thermal In-Plane Distortion Model of Mask for Extreme Ultraviolet Lithography during Periodic Scanning Exposure
- Approach to Patterning of Extreme Ultraviolet Lithography Masks using Ru Buffer Layer : Surfaces, Interfaces, and Films
- Thermal Behavior along Depth of Extreme Ultraviolet Lithography Mask during Dry Etching : Surfaces, Interfaces, and Films
- Temperature Rise of Extreme Ultraviolet Lithography Mask Substrate during Dry Etching Process : Semiconductors
- Estimation of Extreme Ultraviolet Power and Throughput for Extreme Ultraviolet Lithography
- Correlation of Nano Edge Roughness in Resist Patterns with Base Polymers
- Optical Performance of KrF Excimer Laser Lithography with Phase Shift Mask for Fabrication of 0.15 μm and Below
- Transmission Electron Microscopy Observation and Simulation Analysis of Defect-Smoothing Effect of Molybdenum/Silicon Multilayer Coating for Extreme Ultraviolet Lithography Masks