TERASAWA Tsuneo | Central Research Laboratory, Hitachi, Ltd.

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著作論文

Nanofabrication with a Novel EB System with a Large and Stable Beam Current
Optical Performance of KrF Excimer Laser Lithography with Phase Shift Mask for Fabrication of 0.15 μm and Below
Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks : Photolithography
Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks
Simulation of Multilayer Defects in Extreme Ultraviolet Masks
Roles of Surface Functional Groups on TiN and SiN Substrates in Resist Pattern Deformations
Heuristic Method for Phase-Conflict Minimization in Automatic Phase-Shift Mask Design
Analysis of Nonplanar Topography Effects of Phase Shift Masks on Imaging Characteristics
0.13 μm Pattern Delineation Using KrF Excimer Laser Light
Algorithm for Phase-Shift Mask Design with Priority on Shifter Placement
Phase-Shifting Technology for ULSI Patterning (Special Issue on Opto-Electronics and LSI)
Novel Alignment Method for Planarized Substrates in Electron Beam Lithography
A Fast Method of Simulating Resist Pattern Contours Based on Mean Inhibitor Concentration
Theoretical Calculation of Mask Error Enhancement Factor for Periodic Pattern Imaging
Overlay Error Estimation of Wafer Rear Surface Alignment for 0.1-μm Lithography
Analysis of High-Acceleration-Voltage Scanning Electron Microscope Images
The Effect of Condenser Tilt on Optical Projection Lithography

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