Simulation of Multilayer Defects in Extreme Ultraviolet Masks

スポンサーリンク

概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 2001-04-01

著者

• OKAZAKI Shinji

  Atsugi Research Center, Association of Super-Advanced Electronics Technologies (ASET), c

• TERASAWA Tsuneo

  Central Research Laboratory, Hitachi, Ltd.

• Ogawa Tetsuya

  Institute For Chemical Research Kyoto University

• ITO Masaaki

  Atsugi Research Center, Association of Super-Advanced Electronics Technologies

• OGAWA Taro

  Atsugi Research Center, Association of Super-Advanced Electronics Technologies

• OTAKI Katsura

  Atsugi Research Center, Association of Super-Advanced Electronics Technologies

• NISHIYAMA Iwao

  Atsugi Research Center, Association of Super-Advanced Electronics Technologies

• Ito M

  Aset Euv Laboratory C-o Ntt Atsugi Research Center

関連論文

• 平成21年度インターンシップ実施報告--一貫したキャリア教育を目指して
• Pb(Mg1/3Nb2/3)03-PbTiO3単結晶での巨大横効果圧電性の組成依存
• Theoretical Calculation of Photoabsorption of Various Polymers in an Extreme Ultraviolet Region
• Inhomogeneous substitution of polyhalogenated copperphthalocyanine studied by high-resolution imaging and electron crystallography
• Measurement of Temperature Rise of Quartz Plate during Synchrotron Radiation Irradiation Using Infrared Camera(Instrumentation, Measurement, and Fabrication Technology)
• Stabilization of ZrSi_xO_y Films by Irradiation with an ArF Excimer Laser
• Ring-Field Extreme Ultraviolet Exposure System Using Aspherical Mirrors
• High-Resolution Electron Microscopy of Lamellar Crystals of Syndiotactic Polypropylene
• Electron diffraction analysis of polymorph structures in ultra thin film of vanadyl phthalocyanine on KBr(001)
• Nanofabrication with a Novel EB System with a Large and Stable Beam Current
• Simulation of Long-Range Contrast Modulation in Scanning Tunneling Microscope Image of Perylene-3,4,9,10-Tetraearboxylic-Dianhydride Monolayer on Graphite
• Modeling of In-Plane Distortion of Extreme Ultraviolet Lithography Mask in Flat State
• Thermal In-Plane Distortion Model of Mask for Extreme Ultraviolet Lithography during Periodic Scanning Exposure
• Approach to Patterning of Extreme Ultraviolet Lithography Masks using Ru Buffer Layer : Surfaces, Interfaces, and Films
• Thermal Behavior along Depth of Extreme Ultraviolet Lithography Mask during Dry Etching : Surfaces, Interfaces, and Films
• Temperature Rise of Extreme Ultraviolet Lithography Mask Substrate during Dry Etching Process : Semiconductors
• Estimation of Extreme Ultraviolet Power and Throughput for Extreme Ultraviolet Lithography
• Theoretical Analysis of Placement Error due to Absorber Pattern on Extreme Ultraviolet Lithography Mask
• Optical Performance of KrF Excimer Laser Lithography with Phase Shift Mask for Fabrication of 0.15 μm and Below
• Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks : Photolithography
• Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks
• Transmission Electron Microscopy Observation and Simulation Analysis of Defect-Smoothing Effect of Molybdenum/Silicon Multilayer Coating for Extreme Ultraviolet Lithography Masks
• 圧電単結晶Pb[(Zn1/3Nb2/3)0.91Ti0.09]O3の誘電・圧電・弾性定数とその温度特性
• Poling Field Dependence of Ferroelectric Properties in Barium Titanate Ceramics
• Passivation of Bulk and Surface Defects in GaAs Grown on Si Substrate by Radio Frequency Phosphine/Hydrogen Plasma Exposure : Semiconductors
• Simulation of Multilayer Defects in Extreme Ultraviolet Masks
• 教育関連報告 今の若者は大学に何を求めているか?--問題発見と解決能力向上のツール(第3報)
• Poling Field Dependence of Crystal Orientation and Ferroelectric Properties in Lead Titanate Ceramics
• In-Situ Ellipsometric Observations of Thickness Change in the Layers of Ag/a-As_2S_3 Film System with Progression of Photodoping
• Photon-Stimulated Ion Desorption Measurement of Organosilicon Resist Reactions in Extreme Ultraviolet Lithography
• Roles of Surface Functional Groups on TiN and SiN Substrates in Resist Pattern Deformations
• A High-Density Phase-Change Optical Disk System Possessing Read/Write Compatibility with 90 mm Magneto-Optical Disks
• Heuristic Method for Phase-Conflict Minimization in Automatic Phase-Shift Mask Design
• Analysis of Nonplanar Topography Effects of Phase Shift Masks on Imaging Characteristics
• 0.13 μm Pattern Delineation Using KrF Excimer Laser Light
• Algorithm for Phase-Shift Mask Design with Priority on Shifter Placement
• Phase-Shifting Technology for ULSI Patterning (Special Issue on Opto-Electronics and LSI)
• Novel Alignment Method for Planarized Substrates in Electron Beam Lithography
• A Fast Method of Simulating Resist Pattern Contours Based on Mean Inhibitor Concentration
• Theoretical Calculation of Mask Error Enhancement Factor for Periodic Pattern Imaging
• Overlay Error Estimation of Wafer Rear Surface Alignment for 0.1-μm Lithography
• Analysis of High-Acceleration-Voltage Scanning Electron Microscope Images
• PZTセラミックスのバイポーラパルスによる分極処理
• Evaluation of the Waveguide Effect in Proximity X-Ray Lithography Using an Optical Trace Method
• The Effect of Condenser Tilt on Optical Projection Lithography
• Synthesis and Supramolecular Association of NCN-Pincer Pd-Complex-bound Norvaline Derivatives toward Fabrication of Controlled Metal Array
• Simulation of Multilayer Defects in Extreme Ultraviolet Masks
• Thin-Film Phase of Pentacene Film Formed on KCl by Vacuum Deposition

もっと見る 閉じる

スポンサーリンク