Simulation of Multilayer Defects in Extreme Ultraviolet Masks
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概要
- 論文の詳細を見る
We have employed a scalar simulation based on Fresnel formulas to predict approximately how strongly a multilayer defect in a reflective mask affects the aerial image in extreme ultraviolet lithography. This method enables us to obtain the field reflected from a defective mask, using considerably fewer computational resources than those required for a rigorous electromagnetic simulation. This method was applied to two-dimensional masks with multilayer defects modeled by a simple structure in which the coverage profile was identical throughout the layers. For such defects, we confirmed the validity of the scalar simulation by comparing the normalized peak intensity to that obtained from an electromagnetic simulation. The dependence of the printability of a defect on its size and position is also discussed.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-04-15
著者
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OKAZAKI Shinji
Atsugi Research Center, Association of Super-Advanced Electronics Technologies (ASET), c
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ITO Masaaki
Atsugi Research Center, Association of Super-Advanced Electronics Technologies
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OGAWA Taro
Atsugi Research Center, Association of Super-Advanced Electronics Technologies
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NISHIYAMA Iwao
Atsugi Research Center, Association of Super-Advanced Electronics Technologies
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Otaki Katsura
Atsugi Research Center Association Of Super-advanced Electronics Technologies
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Terasawa Tsuneo
Central Research Laboratory Hitachi Ltd.
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Okazaki Shinji
Atsugi Research Center, Association of Super-Advanced Electronics Technologies, c/o NTT Atsugi R&D Center, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Ogawa Taro
Atsugi Research Center, Association of Super-Advanced Electronics Technologies, c/o NTT Atsugi R&D Center, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Otaki Katsura
Atsugi Research Center, Association of Super-Advanced Electronics Technologies, c/o NTT Atsugi R&D Center, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Terasawa Tsuneo
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan
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