Heuristic Method for Phase-Conflict Minimization in Automatic Phase-Shift Mask Design

スポンサーリンク

概要

著者

関連論文

Measurement of Temperature Rise of Quartz Plate during Synchrotron Radiation Irradiation Using Infrared Camera(Instrumentation, Measurement, and Fabrication Technology)
Nanofabrication with a Novel EB System with a Large and Stable Beam Current
Modeling of In-Plane Distortion of Extreme Ultraviolet Lithography Mask in Flat State
Thermal In-Plane Distortion Model of Mask for Extreme Ultraviolet Lithography during Periodic Scanning Exposure
Approach to Patterning of Extreme Ultraviolet Lithography Masks using Ru Buffer Layer : Surfaces, Interfaces, and Films
Thermal Behavior along Depth of Extreme Ultraviolet Lithography Mask during Dry Etching : Surfaces, Interfaces, and Films
Temperature Rise of Extreme Ultraviolet Lithography Mask Substrate during Dry Etching Process : Semiconductors
Estimation of Extreme Ultraviolet Power and Throughput for Extreme Ultraviolet Lithography
Theoretical Analysis of Placement Error due to Absorber Pattern on Extreme Ultraviolet Lithography Mask
Correlation of Nano Edge Roughness in Resist Patterns with Base Polymers
Optical Performance of KrF Excimer Laser Lithography with Phase Shift Mask for Fabrication of 0.15 μm and Below
Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks : Photolithography
Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks
Novel Process for Direct Delineation of Spin on Glass (SOG)
Transmission Electron Microscopy Observation and Simulation Analysis of Defect-Smoothing Effect of Molybdenum/Silicon Multilayer Coating for Extreme Ultraviolet Lithography Masks
Simulation of Multilayer Defects in Extreme Ultraviolet Masks
Nanofabrication with Langmuir-Blodgett Films of a Chemical Amplification Resist SAL601
Formation of Fractionated Novolak Resin Langmuir-Blodgett Films
Fabrication of 0.1μm Complementary Metal-Oxide-Semiconductor Devices : Micro/nanofabrication and Devices
Fabrication of 0.1μm Complementary Metal-Oxide-Semiconductor Devices
Roles of Surface Functional Groups on TiN and SiN Substrates in Resist Pattern Deformations
Investigation of Resist Pattern Deformation in Chemical Amplification Resists on SiN_x Substrates
Electron Beam Direct Writing Technology for 64-Mb DRAM LSIs : Lithography Technology
Electron Beam Direct Writing Technology for 64-Mb DRAM LSIs
Heuristic Method for Phase-Conflict Minimization in Automatic Phase-Shift Mask Design
Analysis of Nonplanar Topography Effects of Phase Shift Masks on Imaging Characteristics
0.13 μm Pattern Delineation Using KrF Excimer Laser Light
Algorithm for Phase-Shift Mask Design with Priority on Shifter Placement
Phase-Shifting Technology for ULSI Patterning (Special Issue on Opto-Electronics and LSI)
A Novel Optical Lithography Technique Using the Phase-Shifter Fringe
Novel Alignment Method for Planarized Substrates in Electron Beam Lithography
A Fast Method of Simulating Resist Pattern Contours Based on Mean Inhibitor Concentration
Theoretical Calculation of Mask Error Enhancement Factor for Periodic Pattern Imaging
Proposal for the Coma Aberration Dependent Overlay Error Compensation Technology
Sub-Halfmicron Lithography Using a High-Contrast i-Line CEL
Overlay Error Estimation of Wafer Rear Surface Alignment for 0.1-μm Lithography
Effect of EB Acceleration Voltage and Beam Sharpness on Process Latitude of 0.2 μm Lines
Analysis of High-Acceleration-Voltage Scanning Electron Microscope Images
The Effect of Condenser Tilt on Optical Projection Lithography
Phase Retrieval from Defocused Images and Its Applications in Lithography
Effect of EB Acceleration Voltage and Beam Sharpness on Process Latitude of 0.2μm Lines : Electron Beam Lithography
Simulation of Multilayer Defects in Extreme Ultraviolet Masks
Measurement of Temperature Rise of Quartz Plate during Synchrotron Radiation Irradiation Using Infrared Camera
Estimation of Extreme Ultraviolet Power and Throughput for Extreme Ultraviolet Lithography

もっと見る

スポンサーリンク