Mochiji K | Joint Res. Center For Atom Technol. Angstrom Technol. Partnership(jrcat‐atp) Ibaraki Jpn
スポンサーリンク
概要
- MOCHIJI Kozoの詳細を見る
- 同名の論文著者
- Joint Res. Center For Atom Technol. Angstrom Technol. Partnership(jrcat‐atp) Ibaraki Jpnの論文著者
関連著者
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Mochiji K
Joint Res. Center For Atom Technol. Angstrom Technol. Partnership(jrcat‐atp) Ibaraki Jpn
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MOCHIJI Kozo
Central Research Laboratory, Hitachi Ltd.
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Mochiji Kozo
Central Research Laboratory Hitachi Ltd.
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Oizumi Hiroaki
Central Research Laboratory Hitachi Ltd.
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Yamamoto S
Univ. Tsukuba Ibaraki Jpn
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Oizumi H
Hitachi Ltd. Tokyo Jpn
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Oizumi H
Aset Euvl Lab. Kanagawa Jpn
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Oizumi Hiroaki
Sortec Corporation
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Soga Tetsuo
Department Of Electronics Faculty Of Engineering Nagoya University
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YAMAMOTO Seiji
Central Research Laboratory, Hitachi Ltd.
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Soga T
Nagoya Inst. Technol. Nagoya Jpn
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OCHIAI Isao
Department of Physics,Faculty of Science,The University of Tokyo
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SOGA Takashi
Central Research Laboratory, Hitachi, Ltd.
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ITABASHI Naoshi
Central Research Laboratory, Hitachi, Ltd.
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OCHIAI Isao
Central Research Laboratory, Hitachi, Ltd.
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Yamamoto Seiji
Central Research Laboratory Hitachi Ltd.
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Itabashi N
Plasma Technology Laboratory Association Of Super-advanced Electronics Technologies(aset)
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Ochiai Isao
Central Research Laboratory Hitachi Ltd.
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Soga Takashi
Central Research Laboratory Hitachi Limited
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Itabashi Naoshi
Central Research Laboratory Hitachi Ltd.
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Ochiai I
Central Research Laboratory Hitachi Ltd.
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KISHIMOTO Akihiko
Central Research Laboratory, Hitachi, Ltd.
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KUNIYOSHI Shinji
Semiconductor Design and Development Center, Hitachi, Ltd.
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Kishimoto A
Faculty Of Engineering Hiroshima University
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Kuniyoshi Shinji
Semiconductor Design And Development Center Hitachi Ltd.
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Ogawa Tohru
Technology Strategy Development Sony Co. Core Technology & Network Company
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Saito Norihito
Solid-state Laser For Astronomical Observation Research Team Riken
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OGAWA Taro
Central Research Laboratory, Hitachi Ltd.
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ONO Tetsuo
Kasado Works, Hitachi, Ltd
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Iijima S
Fundamental Research Laboratories Nec Corporation
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Iijima Sumio
Fundamental Research Laboratories Nec Corporation
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IIJIMA Shinpei
Central Research Laboratory, Hitachi Ltd
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Iijima Shinpei
Central Research Laboratory Hitachi Ltd
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SAITOH Masayoshi
Central Research Laboratory, Hitachi, Ltd.
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Saito N
Solid-state Laser For Astronomical Observation Research Team Riken
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Ono T
Osaka Univ. Osaka Jpn
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Saitoh Masayoshi
Central Research Laboratory Hitachi Ltd.
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Ogawa Taro
Central Research Laboratory Hitachi Ltd.
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Saito Naoto
Mechanical Engineering Research Laboratory Hitachi Ltd.
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KIMURA Takeshi
Ome Works, Hitachi, Ltd
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Saito N
Hokkaido Forest Products Res. Inst. Asahikawa Jpn
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SAKAKIHARA Masahiko
Magnetic and Electronic Materials Research Laboratory, Hitachi Metals, Ltd.
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KAWAI Tetsurou
Magnetic and Electronic Materials Research Laboratory, Hitachi Metals, Ltd.
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YAMAGUCHI Sadae
Institute for Materials Research, Tohoku University
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OKUNO Kazuhiko
Department of Physics,Tokyo Metropolitan University
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MOCHIJI Kozou
Central Research Laboratory, Hitachi, Ltd.
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ONO Tetsuo
Central Research Laboratory, Hitachi, Ltd.
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OGAWA Tarou
Central Research Laboratory, Hitachi Ltd.
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LEE Kaidee
Department of Chemistry, State University of New York
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HANSON David
Department of Chemistry, State University of New York
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SAITHO Masayoshi
Central Research Laboratory, Hitachi, Ltd.
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Lee Kaidee
Department Of Chemistry State University Of New York
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Ogawa Tarou
Central Research Laboratory Hitachi Ltd.
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Hanson David
Department Of Chemistry State University Of New York
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Okuno Kazuhiko
Department Of Physics Faculty Of Science Tokyo Metropolitan University
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Kawai Tetsurou
Magnetic And Electronic Materials Research Laboratory Hitachi Metals Ltd.
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Yamaguchi Sadae
Institute For Materials Research Tohoku University
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Sakakihara Masahiko
Magnetic And Electronic Materials Research Laboratory Hitachi Metals Ltd.
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Ono Tetsuo
Central Research Laboratory Hitachi Ltd.
著作論文
- High-Quality Carbon-Doped Boron Nitride Membrane for X-Ray Lithography Mask
- Influence of Oxygen upon Radiation Durability of SiN X-Ray Mask Membranes : Lithography Technology
- Influence of Oxygen upon Radiation Durability of SiN X-ray Mask Membranes
- X-Ray Mask Technology Utilizing an Optical Stepper
- Positive Charge Generation at a SiO_2/Si Interface due to Bombardment with Metastable Atoms
- Thermal and Ion-Induced Reactions on a Chlorine-Adsorbed GaAs (100) Surface Studied by Metastable-Atom De-excitation Electron Spectroscopy
- Surface Reaction Induced by Multiply-Charged Ions
- Photon-Stimulated Ion Desorption from Semiconductor Surfaces
- X-ray Mask Technology utilizing an Optical Stepper : X-Ray Lithography
- Minimization of X-Ray Mask Distortion by Two-Dimensional Finite Element Method Simulation : Lithography Technology
- Minimization of X-Ray Mask Distortion by Two-Dimensional Finite Element Method Simulation