Minimization of X-Ray Mask Distortion by Two-Dimensional Finite Element Method Simulation : Lithography Technology

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1991-01-31

著者

• Soga Tetsuo

  Department Of Electronics Faculty Of Engineering Nagoya University

• Saito Norihito

  Solid-state Laser For Astronomical Observation Research Team Riken

• MOCHIJI Kozo

  Central Research Laboratory, Hitachi Ltd.

• KISHIMOTO Akihiko

  Central Research Laboratory, Hitachi, Ltd.

• KUNIYOSHI Shinji

  Semiconductor Design and Development Center, Hitachi, Ltd.

• Soga T

  Nagoya Inst. Technol. Nagoya Jpn

• SOGA Takashi

  Central Research Laboratory, Hitachi, Ltd.

• Saito N

  Solid-state Laser For Astronomical Observation Research Team Riken

• Saito Naoto

  Mechanical Engineering Research Laboratory Hitachi Ltd.

• Mochiji K

  Joint Res. Center For Atom Technol. Angstrom Technol. Partnership(jrcat‐atp) Ibaraki Jpn

• Mochiji Kozo

  Central Research Laboratory Hitachi Ltd.

• Soga Takashi

  Central Research Laboratory Hitachi Limited

• KIMURA Takeshi

  Ome Works, Hitachi, Ltd

• Kishimoto A

  Faculty Of Engineering Hiroshima University

• Kuniyoshi Shinji

  Semiconductor Design And Development Center Hitachi Ltd.

• Saito N

  Hokkaido Forest Products Res. Inst. Asahikawa Jpn

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