Thermal Stress Relaxation in GaAs Layer on New Thin Si Layer over Porous Si Substrate Grown by Metalorganic Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-11-15
著者
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Yonehara Takao
Eltran Project R&d Headquarters Canon Inc.
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Hayashi Yasuhiko
Department Of Cardiovascular Physiology And Medicine Hiroshima University Graduate School Of Biomedi
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SOGA Tetsuo
Department of Frontier Materials, Nagoya Institute of Technology
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UMENO Masayoshi
Department of electrical and Computer Engineering, Nagoya Institute of Technology
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Hayashi Y
Hadepartment Of Environmental Technology And Urban Planning Nagoya Institute Of Technology
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JIMBO Takashi
Department of Environmental Technology & Urban Planning, Nagoya Institute of Technology
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AGATA Yasunori
Department of Electrical and Computer Engineering, Nagoya Institute of Technology
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SATO Nobuhiko
ELTRAN Project, R&D Headquarters, Canon Inc.
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Umeno M
Department Of Electronic Engineering Chubu University
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Umeno Masayoshi
Department Of Electronic And Computer Engineering Nagoya Institute Of Technology
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Umeno Masayoshi
Department Of Electric And Computer Engineering Nagoya Institute Of Technology
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Umeno Masayoshi
Department Of Electronic Mechanical Engineering Nagoya University
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Soga T
Department Of Environment Technology And Urban Planning Nagoya Institute Of Technology
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Soga Tetsuo
Department Of Electronics Faculty Of Engineering Nagoya University
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Agata Y
Nagoya Inst. Technol. Nagoya Jpn
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Agata Yasunori
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology
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Umeno M
Fukui Univ. Technol. Fukui Jpn
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Jimbo Takashi
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology
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Umeno Masataka
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Umeno Masataka
Graduate School Of Engineering Osaka University
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Soga T
Nagoya Inst. Technol. Nagoya Jpn
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Sato Nobuhiko
Eltran Business Center Canon Inc.
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Sato Nobuhiko
Eltran Project R&d Headquarters Canon Inc.
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Yonehara Takao
Eltran Business Center Canon Inc.
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Soga Takashi
Central Research Laboratory Hitachi Limited
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Hasegawa Y
Asahi Technical Lab. Co. Shizuoka Jpn
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Umeno M
Department Of Management And Information Science Faculty Of Engineering Fukui University Of Technolo
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Hayashi Yasuhiko
Department Of Cardiology Tsuchiya General Hospital
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Umeno M
Nagoya Inst. Technology
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Hayashi Yasuhiko
Department Of Cardiology Cardiovascular Center Tsuchiya General Hospital
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Sato Nobuhiko
Device Development Center, R&D Headquarters, Canon Inc. 6770 Tamura, Hiratsuka, Kanagawa 254, Japan
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Soga Tetsuo
Department of Electrical and Computer Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466
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