Photovoltaic Properties of Boron-Incorporated Amorphous Carbon on n-Si Heterojunction Grown by Radio Frequency Plasma-Enhanced Chemical Vapor Deposition Using Trimethylboron

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概要

• 論文の詳細を見る
• Japan Society of Applied Physicsの論文
• 2003-03-15

著者

• Shirata T.

  名古屋工業大学極微構造デバイス研究センター

• SOGA Tetsuo

  Department of Frontier Materials, Nagoya Institute of Technology

• JIMBO Takashi

  Department of Environmental Technology & Urban Planning, Nagoya Institute of Technology

• Jimbo T

  Research Center For Nano-device And System Nagoya Institute Of Technology

• 神保 孝志

  名古屋工業大学都市循環システム工学専攻

• Jimbo Takashi

  Department Of Environmental Technology And Urban Planning Nagoya Institute Of Technology:research Ce

• Soga Tetsuo

  Department Of Electronics Faculty Of Engineering Nagoya University

• Jimbo Takashi

  Department Of Electrical And Computer Engineering Nagoya Institute Of Technology

• HAYASHI Ysuhiko

  Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology

• Soga T

  Nagoya Inst. Technol. Nagoya Jpn

• Jimbo T

  Nagoya Inst. Technology Nagoya Jpn

• Shirata T.

  Department Of Environment Technology And Urban Planning Nagoya Institute Of Technology

• Jimbo T

  Nagoya Inst. Technol. Nagoya Jpn

• Jimbo T

  Department Of Environmental Technology And Urban Planning Nagoya Institute Of Technology

• Hayashi Ysuhiko

  Department Of Environmental Technology And Urban Planning Nagoya Institute Of Technology

• Hayashi Yasuhiko

  Department Of Cardiology Cardiovascular Center Tsuchiya General Hospital

• Soga Tetsuo

  Department of Electrical and Computer Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466

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